JPS5319762A - Mask device for x-ray exposure - Google Patents
Mask device for x-ray exposureInfo
- Publication number
- JPS5319762A JPS5319762A JP9515476A JP9515476A JPS5319762A JP S5319762 A JPS5319762 A JP S5319762A JP 9515476 A JP9515476 A JP 9515476A JP 9515476 A JP9515476 A JP 9515476A JP S5319762 A JPS5319762 A JP S5319762A
- Authority
- JP
- Japan
- Prior art keywords
- ray exposure
- mask device
- mask
- make
- render
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To make use of a thin film of a material composed mainly of a boron compound as a mask-supporting substrate to thereby make a reduction in the absorption loss of X-rays, improve the exposure efficiency and render the film transparent by a visible ray so as to permit easy alignment.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9515476A JPS5319762A (en) | 1976-08-09 | 1976-08-09 | Mask device for x-ray exposure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9515476A JPS5319762A (en) | 1976-08-09 | 1976-08-09 | Mask device for x-ray exposure |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5319762A true JPS5319762A (en) | 1978-02-23 |
Family
ID=14129866
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9515476A Pending JPS5319762A (en) | 1976-08-09 | 1976-08-09 | Mask device for x-ray exposure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5319762A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55101945A (en) * | 1979-01-31 | 1980-08-04 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Mask for exposure |
-
1976
- 1976-08-09 JP JP9515476A patent/JPS5319762A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55101945A (en) * | 1979-01-31 | 1980-08-04 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Mask for exposure |
JPS6054671B2 (en) * | 1979-01-31 | 1985-11-30 | 超エル・エス・アイ技術研究組合 | exposure mask |
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