JPS53149333A - Radiation sensitive composition - Google Patents
Radiation sensitive compositionInfo
- Publication number
- JPS53149333A JPS53149333A JP6508277A JP6508277A JPS53149333A JP S53149333 A JPS53149333 A JP S53149333A JP 6508277 A JP6508277 A JP 6508277A JP 6508277 A JP6508277 A JP 6508277A JP S53149333 A JPS53149333 A JP S53149333A
- Authority
- JP
- Japan
- Prior art keywords
- radiation sensitive
- sensitive composition
- radical
- stopping
- realized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Abstract
PURPOSE:To prevent the reaction which continues even after stopping of radiation exposure and enable fine fabrication to be realized in a negative type resist without any large errors from the initial set value by containing a radical uptaking agent in a specific high polymeric material.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6508277A JPS53149333A (en) | 1977-06-01 | 1977-06-01 | Radiation sensitive composition |
US06/059,845 US4279986A (en) | 1977-06-01 | 1979-07-23 | Negative resist and radical scavenger composition with capability of preventing post-irradiation polymerization |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6508277A JPS53149333A (en) | 1977-06-01 | 1977-06-01 | Radiation sensitive composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53149333A true JPS53149333A (en) | 1978-12-26 |
JPS6113575B2 JPS6113575B2 (en) | 1986-04-14 |
Family
ID=13276655
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6508277A Granted JPS53149333A (en) | 1977-06-01 | 1977-06-01 | Radiation sensitive composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53149333A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58502169A (en) * | 1981-12-21 | 1983-12-15 | インステイテユ−ト ヒミイ アカデミイ ナウク エスエスエスア−ル | Photo- and electron beam resist |
-
1977
- 1977-06-01 JP JP6508277A patent/JPS53149333A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58502169A (en) * | 1981-12-21 | 1983-12-15 | インステイテユ−ト ヒミイ アカデミイ ナウク エスエスエスア−ル | Photo- and electron beam resist |
Also Published As
Publication number | Publication date |
---|---|
JPS6113575B2 (en) | 1986-04-14 |
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