JPS53149333A - Radiation sensitive composition - Google Patents

Radiation sensitive composition

Info

Publication number
JPS53149333A
JPS53149333A JP6508277A JP6508277A JPS53149333A JP S53149333 A JPS53149333 A JP S53149333A JP 6508277 A JP6508277 A JP 6508277A JP 6508277 A JP6508277 A JP 6508277A JP S53149333 A JPS53149333 A JP S53149333A
Authority
JP
Japan
Prior art keywords
radiation sensitive
sensitive composition
radical
stopping
realized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6508277A
Other languages
Japanese (ja)
Other versions
JPS6113575B2 (en
Inventor
Yoshitake Onishi
Masaki Ito
Kenji Mizuno
Hiroshi Goseki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP6508277A priority Critical patent/JPS53149333A/en
Publication of JPS53149333A publication Critical patent/JPS53149333A/en
Priority to US06/059,845 priority patent/US4279986A/en
Publication of JPS6113575B2 publication Critical patent/JPS6113575B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)

Abstract

PURPOSE:To prevent the reaction which continues even after stopping of radiation exposure and enable fine fabrication to be realized in a negative type resist without any large errors from the initial set value by containing a radical uptaking agent in a specific high polymeric material.
JP6508277A 1977-06-01 1977-06-01 Radiation sensitive composition Granted JPS53149333A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP6508277A JPS53149333A (en) 1977-06-01 1977-06-01 Radiation sensitive composition
US06/059,845 US4279986A (en) 1977-06-01 1979-07-23 Negative resist and radical scavenger composition with capability of preventing post-irradiation polymerization

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6508277A JPS53149333A (en) 1977-06-01 1977-06-01 Radiation sensitive composition

Publications (2)

Publication Number Publication Date
JPS53149333A true JPS53149333A (en) 1978-12-26
JPS6113575B2 JPS6113575B2 (en) 1986-04-14

Family

ID=13276655

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6508277A Granted JPS53149333A (en) 1977-06-01 1977-06-01 Radiation sensitive composition

Country Status (1)

Country Link
JP (1) JPS53149333A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58502169A (en) * 1981-12-21 1983-12-15 インステイテユ−ト　ヒミイ　アカデミイ　ナウク　エスエスエスア−ル Photo- and electron beam resist

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58502169A (en) * 1981-12-21 1983-12-15 インステイテユ−ト　ヒミイ　アカデミイ　ナウク　エスエスエスア−ル Photo- and electron beam resist

Also Published As

Publication number Publication date
JPS6113575B2 (en) 1986-04-14

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