JPS53117982A - Nnchannel fet memory - Google Patents

Nnchannel fet memory

Info

Publication number
JPS53117982A
JPS53117982A JP1582978A JP1582978A JPS53117982A JP S53117982 A JPS53117982 A JP S53117982A JP 1582978 A JP1582978 A JP 1582978A JP 1582978 A JP1582978 A JP 1582978A JP S53117982 A JPS53117982 A JP S53117982A
Authority
JP
Japan
Prior art keywords
nnchannel
fet memory
fet
memory
nnchannel fet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1582978A
Other languages
English (en)
Inventor
Resuraa Berunbuaruto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of JPS53117982A publication Critical patent/JPS53117982A/ja
Priority to US06/104,817 priority Critical patent/US4287667A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/7801DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
    • H01L29/7816Lateral DMOS transistors, i.e. LDMOS transistors
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0408Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
    • G11C16/0416Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing a single floating gate transistor and no select transistor, e.g. UV EPROM
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/7801DMOS transistors, i.e. MISFETs with a channel accommodating body or base region adjoining a drain drift region
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/788Field effect transistors with field effect produced by an insulated gate with floating gate
    • H01L29/7881Programmable transistors with only two possible levels of programmation
    • H01L29/7884Programmable transistors with only two possible levels of programmation charging by hot carrier injection
    • H01L29/7885Hot carrier injection from the channel

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Non-Volatile Memory (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Read Only Memory (AREA)
JP1582978A 1977-02-14 1978-02-14 Nnchannel fet memory Pending JPS53117982A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US06/104,817 US4287667A (en) 1978-02-14 1979-12-18 Method of mounting an electrical component

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772706205 DE2706205A1 (de) 1977-02-14 1977-02-14 N-kanal-speicher-fet

Publications (1)

Publication Number Publication Date
JPS53117982A true JPS53117982A (en) 1978-10-14

Family

ID=6001161

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1582978A Pending JPS53117982A (en) 1977-02-14 1978-02-14 Nnchannel fet memory

Country Status (3)

Country Link
JP (1) JPS53117982A (ja)
DE (1) DE2706205A1 (ja)
GB (1) GB1568501A (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS582439B2 (ja) * 1978-11-27 1983-01-17 富士通株式会社 ブ−トストラツプ回路
DE3435355A1 (de) * 1984-09-26 1986-04-03 Siemens AG, 1000 Berlin und 8000 München Speicheranordnung mit speicherzellen vom floating-gate-typ

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4832444A (ja) * 1971-08-31 1973-04-28
JPS49110250A (ja) * 1973-02-21 1974-10-21
JPS5164338A (ja) * 1975-09-01 1976-06-03 Tokyo Shibaura Electric Co
JPS51102477A (ja) * 1976-02-02 1976-09-09 Tdk Electronics Co Ltd Handotaimemorisochi

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4832444A (ja) * 1971-08-31 1973-04-28
JPS49110250A (ja) * 1973-02-21 1974-10-21
JPS5164338A (ja) * 1975-09-01 1976-06-03 Tokyo Shibaura Electric Co
JPS51102477A (ja) * 1976-02-02 1976-09-09 Tdk Electronics Co Ltd Handotaimemorisochi

Also Published As

Publication number Publication date
GB1568501A (en) 1980-05-29
DE2706205A1 (de) 1978-08-17

Similar Documents

Publication Publication Date Title
GB2034942B (en) Errorcorrecting memory
GB2007246B (en) Anitumour substance
JPS53148928A (en) Memory system
JPS53124085A (en) Semiconductor memory
JPS53126282A (en) Fet transistor
JPS5472922A (en) Memory
JPS53102054A (en) Horogram memory device
GB2004432B (en) Semiconductor memory
JPS5342685A (en) Nnchannel fet memory
JPS5396782A (en) Semiconductor memory
JPS5426672A (en) Semiconductor memory
JPS5469974A (en) Fet transistor memory
JPS5342686A (en) Nnchannel fet memory
JPS5474684A (en) Nnchannel mos memory
JPS5438776A (en) Fet
JPS53105986A (en) Semiconductor memory
JPS5394139A (en) Memory
JPS53117982A (en) Nnchannel fet memory
JPS53148286A (en) Semiconductor memory
JPS5470778A (en) Fet transistor
JPS53121528A (en) Semiconductor memory
JPS5393737A (en) Memory unit
JPS53101985A (en) Reversible fet transistor
JPS53107244A (en) Memory system
JPS5418284A (en) Semiconductor memory