JPS53113782A - Forming apparatus for film deposited evaporation having no pin hole - Google Patents

Forming apparatus for film deposited evaporation having no pin hole

Info

Publication number
JPS53113782A
JPS53113782A JP2807577A JP2807577A JPS53113782A JP S53113782 A JPS53113782 A JP S53113782A JP 2807577 A JP2807577 A JP 2807577A JP 2807577 A JP2807577 A JP 2807577A JP S53113782 A JPS53113782 A JP S53113782A
Authority
JP
Japan
Prior art keywords
pin hole
film deposited
forming apparatus
evaporation
vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2807577A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5548108B2 (enExample
Inventor
Chikara Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP2807577A priority Critical patent/JPS53113782A/ja
Publication of JPS53113782A publication Critical patent/JPS53113782A/ja
Publication of JPS5548108B2 publication Critical patent/JPS5548108B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP2807577A 1977-03-16 1977-03-16 Forming apparatus for film deposited evaporation having no pin hole Granted JPS53113782A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2807577A JPS53113782A (en) 1977-03-16 1977-03-16 Forming apparatus for film deposited evaporation having no pin hole

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2807577A JPS53113782A (en) 1977-03-16 1977-03-16 Forming apparatus for film deposited evaporation having no pin hole

Publications (2)

Publication Number Publication Date
JPS53113782A true JPS53113782A (en) 1978-10-04
JPS5548108B2 JPS5548108B2 (enExample) 1980-12-04

Family

ID=12238643

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2807577A Granted JPS53113782A (en) 1977-03-16 1977-03-16 Forming apparatus for film deposited evaporation having no pin hole

Country Status (1)

Country Link
JP (1) JPS53113782A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4940447B2 (ja) * 2006-12-29 2012-05-30 クックヒョン シム, パーマ用ロッドおよびパーマ用ロッドに熱を効果的に伝えるための加熱装置
JP2013016491A (ja) * 2011-07-04 2013-01-24 Samsung Display Co Ltd 有機層蒸着装置及びこれを用いる有機発光表示装置の製造方法
CN104451585A (zh) * 2013-09-12 2015-03-25 三星显示有限公司 沉积源运送装置
US9624580B2 (en) 2009-09-01 2017-04-18 Samsung Display Co., Ltd. Thin film deposition apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6068541A (ja) * 1983-09-21 1985-04-19 Toyota Central Res & Dev Lab Inc 擬似動態画像の撮影方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4940447B2 (ja) * 2006-12-29 2012-05-30 クックヒョン シム, パーマ用ロッドおよびパーマ用ロッドに熱を効果的に伝えるための加熱装置
US9624580B2 (en) 2009-09-01 2017-04-18 Samsung Display Co., Ltd. Thin film deposition apparatus
JP2013016491A (ja) * 2011-07-04 2013-01-24 Samsung Display Co Ltd 有機層蒸着装置及びこれを用いる有機発光表示装置の製造方法
US9777364B2 (en) 2011-07-04 2017-10-03 Samsung Display Co., Ltd. Organic layer deposition apparatus and method of manufacturing organic light-emitting display device by using the same
CN104451585A (zh) * 2013-09-12 2015-03-25 三星显示有限公司 沉积源运送装置

Also Published As

Publication number Publication date
JPS5548108B2 (enExample) 1980-12-04

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