JPS53112237A - Etching method for metal or meral oxide thin film - Google Patents
Etching method for metal or meral oxide thin filmInfo
- Publication number
- JPS53112237A JPS53112237A JP16028776A JP16028776A JPS53112237A JP S53112237 A JPS53112237 A JP S53112237A JP 16028776 A JP16028776 A JP 16028776A JP 16028776 A JP16028776 A JP 16028776A JP S53112237 A JPS53112237 A JP S53112237A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- meral
- metal
- etching method
- oxide thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/26—Acidic compositions for etching refractory metals
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16028776A JPS53112237A (en) | 1976-12-29 | 1976-12-29 | Etching method for metal or meral oxide thin film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16028776A JPS53112237A (en) | 1976-12-29 | 1976-12-29 | Etching method for metal or meral oxide thin film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS53112237A true JPS53112237A (en) | 1978-09-30 |
JPS5428383B2 JPS5428383B2 (enrdf_load_html_response) | 1979-09-17 |
Family
ID=15711713
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16028776A Granted JPS53112237A (en) | 1976-12-29 | 1976-12-29 | Etching method for metal or meral oxide thin film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53112237A (enrdf_load_html_response) |
-
1976
- 1976-12-29 JP JP16028776A patent/JPS53112237A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5428383B2 (enrdf_load_html_response) | 1979-09-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB1418278A (en) | Integrated circuit devices | |
GB1522580A (en) | Metallizing a substrate | |
JPS53112237A (en) | Etching method for metal or meral oxide thin film | |
JPS5352072A (en) | Pattern for alignment | |
JPS5331964A (en) | Production of semiconductor substrates | |
JPS5441681A (en) | Manufacture for high frequency transistor | |
JPS5656632A (en) | Manufacture of semiconductor element | |
JPS52123633A (en) | Magnetic sheet of thermal record type | |
DK140429B (da) | Fremgangsmåde til dannelse af en metaloxidbelægning på et i det mindste delvis glasagtigt underlag. | |
JPS5461478A (en) | Chromium plate | |
JPS56155551A (en) | Semiconductor device | |
JPS5372473A (en) | Manufacture of mis type semicondctor device | |
JPS5421272A (en) | Metal photo mask | |
JPS5256901A (en) | Formation of raised and recessed patterns | |
JPS5534673A (en) | Etching method for cobalt base metallic film | |
JPS52154365A (en) | Selective etching method | |
JPS5384465A (en) | Manufacture of semiconductor device | |
JPS5315766A (en) | Selective etching method of platinum layer | |
JPS51127181A (en) | Films having selective transmittance for light | |
JPS5671943A (en) | Oxide film coating of compound semiconductor device | |
JPS56148824A (en) | Formation of electrode | |
JPS5378195A (en) | Manufacture of electrode panel for display | |
JPS52117559A (en) | Mask formation method | |
JPS546782A (en) | Semiconductor device and its manufacture | |
JPS56130750A (en) | Manufacture of mask |