JPS5310884B2 - - Google Patents
Info
- Publication number
- JPS5310884B2 JPS5310884B2 JP12205073A JP12205073A JPS5310884B2 JP S5310884 B2 JPS5310884 B2 JP S5310884B2 JP 12205073 A JP12205073 A JP 12205073A JP 12205073 A JP12205073 A JP 12205073A JP S5310884 B2 JPS5310884 B2 JP S5310884B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Projection-Type Copiers In General (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Projection Apparatus (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12205073A JPS5310884B2 (ja) | 1973-10-30 | 1973-10-30 | |
DE19742449766 DE2449766C3 (de) | 1973-10-30 | 1974-10-19 | Optisches Projektionssystem, insbesondere für einen Lichtzeichner |
US05/519,256 US3984845A (en) | 1973-10-30 | 1974-10-30 | Projecting optical system for photodrawing machine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12205073A JPS5310884B2 (ja) | 1973-10-30 | 1973-10-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5072721A JPS5072721A (ja) | 1975-06-16 |
JPS5310884B2 true JPS5310884B2 (ja) | 1978-04-18 |
Family
ID=14826355
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12205073A Expired JPS5310884B2 (ja) | 1973-10-30 | 1973-10-30 |
Country Status (2)
Country | Link |
---|---|
US (1) | US3984845A (ja) |
JP (1) | JPS5310884B2 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5849298A (ja) * | 1981-09-18 | 1983-03-23 | 旭光学工業株式会社 | フォト自動製図機における自動合焦装置 |
JP3548277B2 (ja) * | 1995-05-17 | 2004-07-28 | ペンタックス株式会社 | マルチビーム記録装置およびマルチビーム記録装置の開口板製作方法 |
US5745296A (en) * | 1995-05-17 | 1998-04-28 | Asahi Kogaku Kogyo Kabushiki Kaisha | Multibeam recording device |
JP3705512B2 (ja) * | 1996-05-23 | 2005-10-12 | ペンタックス株式会社 | マルチビーム作画装置、ならびにマルチビーム作画装置における光量計測方法および光量補正方法 |
CN105805577B (zh) * | 2016-05-07 | 2019-04-02 | 浙江大学 | 对被照面进行可控间歇均匀照明的照明系统 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH465891A (de) * | 1967-08-25 | 1968-11-30 | Conradi G Ag | Einrichtung zur automatischen Regulierung der Beleuchtung einer am Arbeitswagen einer automatischen, photoelektrischen Zeichenmaschine angeordneten Lochblende, deren Loch zum Ziehen von Strichen auf eine photographische Schicht abgebildet wird |
US3464330A (en) * | 1967-11-24 | 1969-09-02 | California Computer Products | Optical writing device |
DE1761170B1 (de) * | 1968-04-10 | 1971-05-13 | Licentia Gmbh | Foto-Zeichenkopf mit Symbolen zur Belichtung einer fotoempfindlichen Zeichenunterlage |
US3535995A (en) * | 1968-06-10 | 1970-10-27 | Us Army | Ball shutter |
US3610119A (en) * | 1969-04-25 | 1971-10-05 | Gerber Scientific Instr Co | Photoexposure device |
-
1973
- 1973-10-30 JP JP12205073A patent/JPS5310884B2/ja not_active Expired
-
1974
- 1974-10-30 US US05/519,256 patent/US3984845A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US3984845A (en) | 1976-10-05 |
DE2449766A1 (de) | 1975-05-07 |
DE2449766B2 (de) | 1976-07-29 |
JPS5072721A (ja) | 1975-06-16 |