JPS53106576A - Ion etching device - Google Patents

Ion etching device

Info

Publication number
JPS53106576A
JPS53106576A JP2125577A JP2125577A JPS53106576A JP S53106576 A JPS53106576 A JP S53106576A JP 2125577 A JP2125577 A JP 2125577A JP 2125577 A JP2125577 A JP 2125577A JP S53106576 A JPS53106576 A JP S53106576A
Authority
JP
Japan
Prior art keywords
ion etching
etching device
specimen
base
specimen base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2125577A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6136376B2 (enrdf_load_stackoverflow
Inventor
Hiroshi Gokan
Sotaro Edokoro
Yoshimasa Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP2125577A priority Critical patent/JPS53106576A/ja
Publication of JPS53106576A publication Critical patent/JPS53106576A/ja
Publication of JPS6136376B2 publication Critical patent/JPS6136376B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP2125577A 1977-02-28 1977-02-28 Ion etching device Granted JPS53106576A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2125577A JPS53106576A (en) 1977-02-28 1977-02-28 Ion etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2125577A JPS53106576A (en) 1977-02-28 1977-02-28 Ion etching device

Publications (2)

Publication Number Publication Date
JPS53106576A true JPS53106576A (en) 1978-09-16
JPS6136376B2 JPS6136376B2 (enrdf_load_stackoverflow) 1986-08-18

Family

ID=12049964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2125577A Granted JPS53106576A (en) 1977-02-28 1977-02-28 Ion etching device

Country Status (1)

Country Link
JP (1) JPS53106576A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58137225A (ja) * 1982-02-09 1983-08-15 Anelva Corp 基板着脱機構
JPS62147340U (enrdf_load_stackoverflow) * 1987-02-10 1987-09-17
JPS6473724A (en) * 1987-09-16 1989-03-20 Hitachi Ltd Fixation of wafer

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58137225A (ja) * 1982-02-09 1983-08-15 Anelva Corp 基板着脱機構
JPS62147340U (enrdf_load_stackoverflow) * 1987-02-10 1987-09-17
JPS6473724A (en) * 1987-09-16 1989-03-20 Hitachi Ltd Fixation of wafer

Also Published As

Publication number Publication date
JPS6136376B2 (enrdf_load_stackoverflow) 1986-08-18

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