JPS62147340U - - Google Patents

Info

Publication number
JPS62147340U
JPS62147340U JP1806587U JP1806587U JPS62147340U JP S62147340 U JPS62147340 U JP S62147340U JP 1806587 U JP1806587 U JP 1806587U JP 1806587 U JP1806587 U JP 1806587U JP S62147340 U JPS62147340 U JP S62147340U
Authority
JP
Japan
Prior art keywords
utility
model registration
substrate
detachment mechanism
mechanism described
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1806587U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1806587U priority Critical patent/JPS62147340U/ja
Publication of JPS62147340U publication Critical patent/JPS62147340U/ja
Pending legal-status Critical Current

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Landscapes

  • Drying Of Semiconductors (AREA)
JP1806587U 1987-02-10 1987-02-10 Pending JPS62147340U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1806587U JPS62147340U (enrdf_load_stackoverflow) 1987-02-10 1987-02-10

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1806587U JPS62147340U (enrdf_load_stackoverflow) 1987-02-10 1987-02-10

Publications (1)

Publication Number Publication Date
JPS62147340U true JPS62147340U (enrdf_load_stackoverflow) 1987-09-17

Family

ID=30811403

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1806587U Pending JPS62147340U (enrdf_load_stackoverflow) 1987-02-10 1987-02-10

Country Status (1)

Country Link
JP (1) JPS62147340U (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH021951A (ja) * 1988-06-09 1990-01-08 Nissin Electric Co Ltd 真空内処理における板状処理物の冷却方法
JPH09195037A (ja) * 1996-01-09 1997-07-29 Ulvac Japan Ltd 加熱冷却装置及びこれを用いた真空処理装置
JP2009200241A (ja) * 2008-02-21 2009-09-03 Ulvac Japan Ltd 基板保持装置、基板ホルダ、真空処理装置、基板の温度制御方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53106576A (en) * 1977-02-28 1978-09-16 Nec Corp Ion etching device
JPS56131930A (en) * 1980-03-19 1981-10-15 Hitachi Ltd Controlling device of wafer temperature
JPS5713738A (en) * 1980-06-27 1982-01-23 Mitsubishi Electric Corp Vapor-phase growing apparatus
JPS57145321A (en) * 1981-03-03 1982-09-08 Nec Corp Dry etching device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53106576A (en) * 1977-02-28 1978-09-16 Nec Corp Ion etching device
JPS56131930A (en) * 1980-03-19 1981-10-15 Hitachi Ltd Controlling device of wafer temperature
JPS5713738A (en) * 1980-06-27 1982-01-23 Mitsubishi Electric Corp Vapor-phase growing apparatus
JPS57145321A (en) * 1981-03-03 1982-09-08 Nec Corp Dry etching device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH021951A (ja) * 1988-06-09 1990-01-08 Nissin Electric Co Ltd 真空内処理における板状処理物の冷却方法
JPH09195037A (ja) * 1996-01-09 1997-07-29 Ulvac Japan Ltd 加熱冷却装置及びこれを用いた真空処理装置
JP2009200241A (ja) * 2008-02-21 2009-09-03 Ulvac Japan Ltd 基板保持装置、基板ホルダ、真空処理装置、基板の温度制御方法

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