JPS53102668A - Manufacture for semiconductor device - Google Patents
Manufacture for semiconductor deviceInfo
- Publication number
- JPS53102668A JPS53102668A JP1680077A JP1680077A JPS53102668A JP S53102668 A JPS53102668 A JP S53102668A JP 1680077 A JP1680077 A JP 1680077A JP 1680077 A JP1680077 A JP 1680077A JP S53102668 A JPS53102668 A JP S53102668A
- Authority
- JP
- Japan
- Prior art keywords
- manufacture
- semiconductor device
- volatge
- breakdown
- improve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1680077A JPS53102668A (en) | 1977-02-18 | 1977-02-18 | Manufacture for semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1680077A JPS53102668A (en) | 1977-02-18 | 1977-02-18 | Manufacture for semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53102668A true JPS53102668A (en) | 1978-09-07 |
Family
ID=11926219
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1680077A Pending JPS53102668A (en) | 1977-02-18 | 1977-02-18 | Manufacture for semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53102668A (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5543337A (en) * | 1994-06-15 | 1996-08-06 | Lsi Logic Corporation | Method for fabricating field effect transistor structure using symmetrical high tilt angle punchthrough implants |
US5933733A (en) * | 1994-06-23 | 1999-08-03 | Sgs-Thomson Microelectronics, S.R.L. | Zero thermal budget manufacturing process for MOS-technology power devices |
-
1977
- 1977-02-18 JP JP1680077A patent/JPS53102668A/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5543337A (en) * | 1994-06-15 | 1996-08-06 | Lsi Logic Corporation | Method for fabricating field effect transistor structure using symmetrical high tilt angle punchthrough implants |
US5933733A (en) * | 1994-06-23 | 1999-08-03 | Sgs-Thomson Microelectronics, S.R.L. | Zero thermal budget manufacturing process for MOS-technology power devices |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5224478A (en) | Semiconductor device manufacturing process | |
JPS5395571A (en) | Semiconductor device | |
JPS53102668A (en) | Manufacture for semiconductor device | |
JPS5230167A (en) | Method for production of semiconductor device | |
JPS5242384A (en) | Semiconductor device | |
JPS525273A (en) | Transistor | |
JPS51143633A (en) | Process for preparation of novel epoxy compounds | |
JPS53102669A (en) | Manufacture for semiconductor device | |
JPS5242365A (en) | Tool for semiconductors | |
JPS5220770A (en) | Semi-conductor unit | |
JPS524175A (en) | Groups iii-v compounds semiconductor device | |
JPS51123534A (en) | Data processing unit | |
JPS51151073A (en) | Method to adjust the position of an mask for an integrated circuit | |
JPS51118968A (en) | Electron beam exposure device | |
JPS5270778A (en) | Semiconductor device | |
JPS52155968A (en) | Semiconductor wafer and its production | |
JPS5413273A (en) | Semiconductor device | |
JPS52141565A (en) | Manufacture of semiconductor unit | |
JPS53123083A (en) | Production of semiconductor device | |
JPS5279664A (en) | Forming method for electrodes of semiconductor devices | |
JPS51135465A (en) | Semi-conductor unit | |
JPS526470A (en) | Semiconductor integrated circuit | |
JPS5245274A (en) | Method for inspection before perfection of transistor | |
JPS5227368A (en) | Selection etching method | |
JPS5382181A (en) | Manufacture for semiconductor device |