Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Hitachi Ltd
Original Assignee
Hitachi Ltd
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Filing date
Publication date
Application filed by Hitachi LtdfiledCriticalHitachi Ltd
Priority to JP1323376ApriorityCriticalpatent/JPS5297674A/en
Publication of JPS5297674ApublicationCriticalpatent/JPS5297674A/en
PURPOSE: To form a surface protecting film of high reliability by laminating a SiO2 film formed thicker than the Si3N4 film formed by a plasma CVD method, on said Si3N4 film by a sputtering method.
COPYRIGHT: (C)1977,JPO&Japio
JP1323376A1976-02-121976-02-12Surface protecting film of electronic parts
PendingJPS5297674A
(en)