JPS5293640A - Plasm etching method - Google Patents

Plasm etching method

Info

Publication number
JPS5293640A
JPS5293640A JP1052776A JP1052776A JPS5293640A JP S5293640 A JPS5293640 A JP S5293640A JP 1052776 A JP1052776 A JP 1052776A JP 1052776 A JP1052776 A JP 1052776A JP S5293640 A JPS5293640 A JP S5293640A
Authority
JP
Japan
Prior art keywords
etching method
plasm
plasm etching
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1052776A
Other languages
English (en)
Other versions
JPS5643113B2 (ja
Inventor
Haruhiko Abe
Kiyuusaku Nishioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP1052776A priority Critical patent/JPS5293640A/ja
Publication of JPS5293640A publication Critical patent/JPS5293640A/ja
Publication of JPS5643113B2 publication Critical patent/JPS5643113B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP1052776A 1976-02-03 1976-02-03 Plasm etching method Granted JPS5293640A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1052776A JPS5293640A (en) 1976-02-03 1976-02-03 Plasm etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1052776A JPS5293640A (en) 1976-02-03 1976-02-03 Plasm etching method

Publications (2)

Publication Number Publication Date
JPS5293640A true JPS5293640A (en) 1977-08-06
JPS5643113B2 JPS5643113B2 (ja) 1981-10-09

Family

ID=11752714

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1052776A Granted JPS5293640A (en) 1976-02-03 1976-02-03 Plasm etching method

Country Status (1)

Country Link
JP (1) JPS5293640A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6086285A (ja) * 1983-08-02 1985-05-15 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション 銅のドライ・エツチング法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6086285A (ja) * 1983-08-02 1985-05-15 インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション 銅のドライ・エツチング法
JPS6140757B2 (ja) * 1983-08-02 1986-09-10 Intaanashonaru Bijinesu Mashiinzu Corp

Also Published As

Publication number Publication date
JPS5643113B2 (ja) 1981-10-09

Similar Documents

Publication Publication Date Title
JPS5487646A (en) Selective etching method
JPS533773A (en) Method of etching substrate
JPS569372A (en) Etching method
JPS5455174A (en) Etching method
JPS532361A (en) Etching method
JPS52125431A (en) Dry etching method
GB1522059A (en) Plasma etching
JPS5290436A (en) Plasm etching method
JPS52114444A (en) Plasma etching method
JPS5377848A (en) Etching method that prevent side etch
JPS52123938A (en) Spatter etching method
JPS5328378A (en) Method of plasma etching
JPS5368642A (en) Plasma etching method
JPS536239A (en) Plasma etching method
JPS5285035A (en) Method of partially etching semiiconductors
JPS5293640A (en) Plasm etching method
JPS52148305A (en) Etching method
JPS52108349A (en) Etching method
JPS5323843A (en) Plasma etching method
JPS5328616A (en) Method of etching glasssferrite composite
JPS5293639A (en) Plasm etching method
JPS5319315A (en) Method of etching
JPS52141444A (en) Method of etching aluminum
JPS52133043A (en) Method of etching aluminum
JPS52120004A (en) Etching method