JPS5279875A - Oxidation of silicon wafer - Google Patents
Oxidation of silicon waferInfo
- Publication number
- JPS5279875A JPS5279875A JP50158896A JP15889675A JPS5279875A JP S5279875 A JPS5279875 A JP S5279875A JP 50158896 A JP50158896 A JP 50158896A JP 15889675 A JP15889675 A JP 15889675A JP S5279875 A JPS5279875 A JP S5279875A
- Authority
- JP
- Japan
- Prior art keywords
- oxidation
- silicon wafer
- halogen element
- wafer
- flaws
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Formation Of Insulating Films (AREA)
- Solid State Image Pick-Up Elements (AREA)
Abstract
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50158896A JPS5279875A (en) | 1975-12-26 | 1975-12-26 | Oxidation of silicon wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP50158896A JPS5279875A (en) | 1975-12-26 | 1975-12-26 | Oxidation of silicon wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5279875A true JPS5279875A (en) | 1977-07-05 |
Family
ID=15681730
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50158896A Pending JPS5279875A (en) | 1975-12-26 | 1975-12-26 | Oxidation of silicon wafer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5279875A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61220338A (en) * | 1985-03-26 | 1986-09-30 | Toshiba Corp | Manufacture of semiconductor device |
JPH02248040A (en) * | 1989-03-20 | 1990-10-03 | Kokusai Electric Co Ltd | Wafer pretreatment method in pyro-oxidation or phosphorus diffusion |
-
1975
- 1975-12-26 JP JP50158896A patent/JPS5279875A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61220338A (en) * | 1985-03-26 | 1986-09-30 | Toshiba Corp | Manufacture of semiconductor device |
JPH02248040A (en) * | 1989-03-20 | 1990-10-03 | Kokusai Electric Co Ltd | Wafer pretreatment method in pyro-oxidation or phosphorus diffusion |
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