JPS5279875A - Oxidation of silicon wafer - Google Patents

Oxidation of silicon wafer

Info

Publication number
JPS5279875A
JPS5279875A JP50158896A JP15889675A JPS5279875A JP S5279875 A JPS5279875 A JP S5279875A JP 50158896 A JP50158896 A JP 50158896A JP 15889675 A JP15889675 A JP 15889675A JP S5279875 A JPS5279875 A JP S5279875A
Authority
JP
Japan
Prior art keywords
oxidation
silicon wafer
halogen element
wafer
flaws
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50158896A
Other languages
Japanese (ja)
Inventor
Hiromitsu Shiraki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP50158896A priority Critical patent/JPS5279875A/en
Publication of JPS5279875A publication Critical patent/JPS5279875A/en
Pending legal-status Critical Current

Links

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Abstract

PURPOSE:To obtain an oxidation method without causing stacking flaws by dividing the oxidation process of an Si wafer in two processes, performing first preliminary oxidation in a dry O2 atmosphere containing a halogen element or H2 compound of halogen element, and second oxidation by ordinary method.
JP50158896A 1975-12-26 1975-12-26 Oxidation of silicon wafer Pending JPS5279875A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP50158896A JPS5279875A (en) 1975-12-26 1975-12-26 Oxidation of silicon wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP50158896A JPS5279875A (en) 1975-12-26 1975-12-26 Oxidation of silicon wafer

Publications (1)

Publication Number Publication Date
JPS5279875A true JPS5279875A (en) 1977-07-05

Family

ID=15681730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50158896A Pending JPS5279875A (en) 1975-12-26 1975-12-26 Oxidation of silicon wafer

Country Status (1)

Country Link
JP (1) JPS5279875A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61220338A (en) * 1985-03-26 1986-09-30 Toshiba Corp Manufacture of semiconductor device
JPH02248040A (en) * 1989-03-20 1990-10-03 Kokusai Electric Co Ltd Wafer pretreatment method in pyro-oxidation or phosphorus diffusion

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61220338A (en) * 1985-03-26 1986-09-30 Toshiba Corp Manufacture of semiconductor device
JPH02248040A (en) * 1989-03-20 1990-10-03 Kokusai Electric Co Ltd Wafer pretreatment method in pyro-oxidation or phosphorus diffusion

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