JPS5274536A - Process and apparatus for selectively plating metals - Google Patents

Process and apparatus for selectively plating metals

Info

Publication number
JPS5274536A
JPS5274536A JP51138273A JP13827376A JPS5274536A JP S5274536 A JPS5274536 A JP S5274536A JP 51138273 A JP51138273 A JP 51138273A JP 13827376 A JP13827376 A JP 13827376A JP S5274536 A JPS5274536 A JP S5274536A
Authority
JP
Japan
Prior art keywords
selectively plating
plating metals
metals
selectively
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP51138273A
Other languages
English (en)
Japanese (ja)
Inventor
Detsutoke Manfureeto
Buaisuhauputo Borufuganku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bayer Pharma AG
Original Assignee
Schering AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schering AG filed Critical Schering AG
Publication of JPS5274536A publication Critical patent/JPS5274536A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
JP51138273A 1975-11-17 1976-11-17 Process and apparatus for selectively plating metals Pending JPS5274536A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19752551988 DE2551988A1 (de) 1975-11-17 1975-11-17 Verfahren zur selektiven galvanischen abscheidung von metallen sowie vorrichtung zur durchfuehrung des verfahrens

Publications (1)

Publication Number Publication Date
JPS5274536A true JPS5274536A (en) 1977-06-22

Family

ID=5962145

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51138273A Pending JPS5274536A (en) 1975-11-17 1976-11-17 Process and apparatus for selectively plating metals

Country Status (12)

Country Link
JP (1) JPS5274536A (enrdf_load_stackoverflow)
BE (1) BE848442A (enrdf_load_stackoverflow)
CH (1) CH623850A5 (enrdf_load_stackoverflow)
DE (1) DE2551988A1 (enrdf_load_stackoverflow)
DK (1) DK296976A (enrdf_load_stackoverflow)
FR (1) FR2331629A1 (enrdf_load_stackoverflow)
GB (1) GB1569994A (enrdf_load_stackoverflow)
IE (1) IE44205B1 (enrdf_load_stackoverflow)
IT (1) IT1063937B (enrdf_load_stackoverflow)
LU (1) LU76198A1 (enrdf_load_stackoverflow)
NL (1) NL7612774A (enrdf_load_stackoverflow)
SE (1) SE7612738L (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS579894A (en) * 1980-06-18 1982-01-19 Osaki Kinzoku:Kk Partial plating method
JPS5837190A (ja) * 1981-08-26 1983-03-04 Sonitsukusu:Kk 部分メツキ方法及びその装置
JPS5887294A (ja) * 1981-11-18 1983-05-25 Sonitsukusu:Kk 微小部分表面処理方法及びその装置
JPS59107094A (ja) * 1982-12-13 1984-06-21 Sonitsukusu:Kk 部分メツキ処理方法及びその装置
WO2006068097A1 (ja) * 2004-12-20 2006-06-29 Nsk Ltd. ハブの電着塗装方法

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2448585A1 (fr) * 1979-02-08 1980-09-05 Souriau & Cie Procede et dispositif pour effectuer des depots electrolytiques selectifs d'un revetement metallique sur une piece conductrice
DE3015282C2 (de) 1980-04-21 1986-07-17 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zum partiellen Galvanisieren von leitenden oder leitend gemachten Oberflächen
DE3108358C2 (de) 1981-03-05 1985-08-29 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zum partiellen Galvanisieren von zu elektrisch leitenden Bändern, Streifen oder dgl. zusammengefaßten Teilen im Durchlaufverfahren
DE3148788C2 (de) * 1981-12-09 1986-08-21 Siemens AG, 1000 Berlin und 8000 München Wäßriges Bad und Verfahren zum galvanischen Abscheiden von glänzenden und rißfreien Palladiumschichten sowie Verfahren zur Herstellung des Bades
NL8300916A (nl) * 1983-03-14 1984-10-01 Philips Nv Werkwijze voor het galvanisch neerslaan van een homogeen dikke metaallaag, aldus verkregen metaallaag en toepassing van de aldus verkregen metaallaag, inrichting voor het uitvoeren van de werkwijze en verkregen matrijs.
FR2592895B1 (fr) * 1986-01-16 1990-11-16 Selectrons France Installation pour la realisation de traitements electrolytiques localises de surfaces.
GB8802393D0 (en) * 1988-02-03 1988-03-02 Gen Electric Co Plc Apparatus for selectively coating part of member
EP0327298A3 (en) * 1988-02-03 1990-06-27 THE GENERAL ELECTRIC COMPANY, p.l.c. Apparatus for selectively coating part of a member
FR2688804A1 (fr) * 1992-03-20 1993-09-24 Souriau & Cie Procede de depot electrolytique selectif d'un metal notamment d'un metal noble tel que l'or sur la face interne de corps creux en forme de douille notamment d'elements de contact de connecteur machine pour la mise en óoeuvre du procede, produit obtenu.
DE10149733A1 (de) * 2001-10-09 2003-04-24 Bosch Gmbh Robert Verfahren und Vorrichtung zum Herstellen einer Galvanikschicht auf einer Substratfläche

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5030337U (enrdf_load_stackoverflow) * 1973-06-19 1975-04-04

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1360811A (fr) * 1963-04-03 1964-05-15 Microdécapeur
DE2010139A1 (en) * 1970-03-04 1971-09-23 Inovan Stroebe Selective electro plating of metal strip
US3810829A (en) * 1972-06-28 1974-05-14 Nasa Scanning nozzle plating system

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5030337U (enrdf_load_stackoverflow) * 1973-06-19 1975-04-04

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS579894A (en) * 1980-06-18 1982-01-19 Osaki Kinzoku:Kk Partial plating method
JPS5837190A (ja) * 1981-08-26 1983-03-04 Sonitsukusu:Kk 部分メツキ方法及びその装置
JPS5887294A (ja) * 1981-11-18 1983-05-25 Sonitsukusu:Kk 微小部分表面処理方法及びその装置
JPS59107094A (ja) * 1982-12-13 1984-06-21 Sonitsukusu:Kk 部分メツキ処理方法及びその装置
WO2006068097A1 (ja) * 2004-12-20 2006-06-29 Nsk Ltd. ハブの電着塗装方法
GB2435600A (en) * 2004-12-20 2007-08-29 Nsk Ltd Method of electrodepositing hub

Also Published As

Publication number Publication date
FR2331629B1 (enrdf_load_stackoverflow) 1980-03-07
LU76198A1 (enrdf_load_stackoverflow) 1977-05-23
IT1063937B (it) 1985-02-18
GB1569994A (en) 1980-06-25
DK296976A (da) 1977-05-18
BE848442A (fr) 1977-05-17
DE2551988A1 (de) 1977-05-26
FR2331629A1 (fr) 1977-06-10
IE44205L (en) 1977-05-17
CH623850A5 (en) 1981-06-30
NL7612774A (nl) 1977-05-20
SE7612738L (sv) 1977-05-18
IE44205B1 (en) 1981-09-09

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