JPS526378A - Vessel for powder target - Google Patents

Vessel for powder target

Info

Publication number
JPS526378A
JPS526378A JP8299475A JP8299475A JPS526378A JP S526378 A JPS526378 A JP S526378A JP 8299475 A JP8299475 A JP 8299475A JP 8299475 A JP8299475 A JP 8299475A JP S526378 A JPS526378 A JP S526378A
Authority
JP
Japan
Prior art keywords
vessel
powder target
target
powder
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8299475A
Other languages
Japanese (ja)
Inventor
Takeshi Nagai
Kiyotaka Wasa
Shigeru Hayakawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP8299475A priority Critical patent/JPS526378A/en
Publication of JPS526378A publication Critical patent/JPS526378A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:A vessel for target of high frequency sputtering which does not contaminate sputtering filM.
JP8299475A 1975-07-04 1975-07-04 Vessel for powder target Pending JPS526378A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8299475A JPS526378A (en) 1975-07-04 1975-07-04 Vessel for powder target

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8299475A JPS526378A (en) 1975-07-04 1975-07-04 Vessel for powder target

Publications (1)

Publication Number Publication Date
JPS526378A true JPS526378A (en) 1977-01-18

Family

ID=13789764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8299475A Pending JPS526378A (en) 1975-07-04 1975-07-04 Vessel for powder target

Country Status (1)

Country Link
JP (1) JPS526378A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5459046U (en) * 1977-09-30 1979-04-24
JPS62149866A (en) * 1985-12-23 1987-07-03 Matsushita Electric Ind Co Ltd Target for sputtering

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4825401U (en) * 1971-08-02 1973-03-26
JPS4940682U (en) * 1972-07-13 1974-04-10

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4825401U (en) * 1971-08-02 1973-03-26
JPS4940682U (en) * 1972-07-13 1974-04-10

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5459046U (en) * 1977-09-30 1979-04-24
JPS62149866A (en) * 1985-12-23 1987-07-03 Matsushita Electric Ind Co Ltd Target for sputtering

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