JPS526378A - Vessel for powder target - Google Patents
Vessel for powder targetInfo
- Publication number
- JPS526378A JPS526378A JP8299475A JP8299475A JPS526378A JP S526378 A JPS526378 A JP S526378A JP 8299475 A JP8299475 A JP 8299475A JP 8299475 A JP8299475 A JP 8299475A JP S526378 A JPS526378 A JP S526378A
- Authority
- JP
- Japan
- Prior art keywords
- vessel
- powder target
- target
- powder
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:A vessel for target of high frequency sputtering which does not contaminate sputtering filM.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8299475A JPS526378A (en) | 1975-07-04 | 1975-07-04 | Vessel for powder target |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8299475A JPS526378A (en) | 1975-07-04 | 1975-07-04 | Vessel for powder target |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS526378A true JPS526378A (en) | 1977-01-18 |
Family
ID=13789764
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8299475A Pending JPS526378A (en) | 1975-07-04 | 1975-07-04 | Vessel for powder target |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS526378A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5459046U (en) * | 1977-09-30 | 1979-04-24 | ||
JPS62149866A (en) * | 1985-12-23 | 1987-07-03 | Matsushita Electric Ind Co Ltd | Target for sputtering |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4825401U (en) * | 1971-08-02 | 1973-03-26 | ||
JPS4940682U (en) * | 1972-07-13 | 1974-04-10 |
-
1975
- 1975-07-04 JP JP8299475A patent/JPS526378A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4825401U (en) * | 1971-08-02 | 1973-03-26 | ||
JPS4940682U (en) * | 1972-07-13 | 1974-04-10 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5459046U (en) * | 1977-09-30 | 1979-04-24 | ||
JPS62149866A (en) * | 1985-12-23 | 1987-07-03 | Matsushita Electric Ind Co Ltd | Target for sputtering |
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