JPS5262427A - Photopolymer element and method of duplicating image - Google Patents

Photopolymer element and method of duplicating image

Info

Publication number
JPS5262427A
JPS5262427A JP51139041A JP13904176A JPS5262427A JP S5262427 A JPS5262427 A JP S5262427A JP 51139041 A JP51139041 A JP 51139041A JP 13904176 A JP13904176 A JP 13904176A JP S5262427 A JPS5262427 A JP S5262427A
Authority
JP
Japan
Prior art keywords
duplicating image
photopolymer element
photopolymer
duplicating
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP51139041A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5722372B2 (de
Inventor
Danieru Buratsuto Maachin
Baanaado Kooen Aburahamu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JPS5262427A publication Critical patent/JPS5262427A/ja
Priority to US06/037,947 priority Critical patent/US4229517A/en
Publication of JPS5722372B2 publication Critical patent/JPS5722372B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F5/00—Screening processes; Screens therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polymerisation Methods In General (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Materials For Photolithography (AREA)
JP51139041A 1975-11-17 1976-11-17 Photopolymer element and method of duplicating image Granted JPS5262427A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US06/037,947 US4229517A (en) 1976-11-13 1979-05-10 Dot-etchable photopolymerizable elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US63272675A 1975-11-17 1975-11-17

Publications (2)

Publication Number Publication Date
JPS5262427A true JPS5262427A (en) 1977-05-23
JPS5722372B2 JPS5722372B2 (de) 1982-05-12

Family

ID=24536688

Family Applications (4)

Application Number Title Priority Date Filing Date
JP51139041A Granted JPS5262427A (en) 1975-11-17 1976-11-17 Photopolymer element and method of duplicating image
JP7653980A Pending JPS5638046A (en) 1975-11-17 1980-06-06 Colorrproof system
JP7653880A Pending JPS5638047A (en) 1975-11-17 1980-06-06 Mask capable of net point etching
JP56108067A Granted JPS5762048A (en) 1975-11-17 1981-07-10 Photopolymerizable element

Family Applications After (3)

Application Number Title Priority Date Filing Date
JP7653980A Pending JPS5638046A (en) 1975-11-17 1980-06-06 Colorrproof system
JP7653880A Pending JPS5638047A (en) 1975-11-17 1980-06-06 Mask capable of net point etching
JP56108067A Granted JPS5762048A (en) 1975-11-17 1981-07-10 Photopolymerizable element

Country Status (8)

Country Link
JP (4) JPS5262427A (de)
AU (1) AU506292B2 (de)
BE (1) BE848409A (de)
BR (1) BR7607672A (de)
CA (1) CA1079565A (de)
DE (3) DE2660921C3 (de)
FR (1) FR2331813A1 (de)
GB (1) GB1548439A (de)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55114370A (en) * 1979-02-28 1980-09-03 Fuji Photo Film Co Ltd Treatment of plate
JPS5630129A (en) * 1979-08-21 1981-03-26 Agency Of Ind Science & Technol Manufacture of photomask
JPS5638046A (en) * 1975-11-17 1981-04-13 Du Pont Colorrproof system
JPS62231245A (ja) * 1986-03-31 1987-10-09 Nippon Zeon Co Ltd 感光性フレキソ版
JP2003107697A (ja) * 2001-09-28 2003-04-09 Fuji Photo Film Co Ltd 感光性転写材料、フォトマスク材料、フォトマスクおよびフォトマスクの製造方法
JP2006337996A (ja) * 2005-05-04 2006-12-14 Rohm & Haas Electronic Materials Llc コーティング組成物
JP2007171406A (ja) * 2005-12-20 2007-07-05 Fujifilm Corp 平版印刷版の作製方法および平版印刷版原版

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4311784A (en) 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element
DE3150637C2 (de) * 1981-12-21 1983-11-10 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Ätzlösung zum Ätzen von Photopolymerfilmen und Verfahren zum Punktätzen
US4515877A (en) * 1982-11-27 1985-05-07 Basf Aktiengesellschaft Image-recording materials and image-recording carried out using these to produce an optical mask
JPS59154442A (ja) * 1983-02-22 1984-09-03 Oji Paper Co Ltd 画像形成用感光性フイルム
JPH01282543A (ja) * 1988-05-09 1989-11-14 Fuji Photo Film Co Ltd 画像形成材料
US5372437A (en) * 1992-04-24 1994-12-13 Citizen Watch Co., Ltd. Print head of wire-dot printer and production method thereof
JP4979368B2 (ja) * 2005-12-27 2012-07-18 関西ペイント株式会社 活性エネルギー線硬化型樹脂組成物及びレジストパターン形成方法
TWI763186B (zh) * 2015-03-30 2022-05-01 日商富士軟片股份有限公司 著色感光性組成物、硬化膜、圖案形成方法、帶遮光膜的紅外線截止濾光片、固體攝像元件、圖像顯示裝置及紅外感測器

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4837378A (de) * 1971-09-13 1973-06-01
JPS4877438A (de) * 1972-01-19 1973-10-18
JPS4893337A (de) * 1972-03-11 1973-12-03

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL87862C (de) * 1951-08-20
US3149975A (en) * 1962-07-06 1964-09-22 Du Pont Photopolymerizable compositions and elements
US3380831A (en) * 1964-05-26 1968-04-30 Du Pont Photopolymerizable compositions and elements
US3353955A (en) * 1964-06-16 1967-11-21 Du Pont Stratum transfer process based on adhesive properties of photopolymerizable layer
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
US3698904A (en) * 1969-07-23 1972-10-17 Asahi Chemical Ind Composition for developing photopolymerizable lithographic plate elements comprising a developer base agent,an ink-receptivity-affording agent and a desensitizer
BE759041A (fr) * 1969-11-18 1971-05-17 Du Pont Compositions photopolymerisables contenant des aminophenylcetones et des adjuvants
CA993709A (en) * 1971-01-21 1976-07-27 Leo Roos Composite, mask-forming photohardenable elements
BE788560A (fr) * 1972-06-09 1973-03-08 Du Pont Protection contre le halo dans la formation d'images dans des photopolymeres en couches multiples
JPS51139041A (en) * 1975-05-23 1976-12-01 Kayaba Industry Co Ltd Disk brake for eccentric retention suspension mechanism
DE2660921C3 (de) * 1975-11-17 1987-07-30 E.I. Du Pont De Nemours And Co., Wilmington, Del. Verfahren zur Herstellung von punktgeätzten Masken

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4837378A (de) * 1971-09-13 1973-06-01
JPS4877438A (de) * 1972-01-19 1973-10-18
JPS4893337A (de) * 1972-03-11 1973-12-03

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5638046A (en) * 1975-11-17 1981-04-13 Du Pont Colorrproof system
JPS5638047A (en) * 1975-11-17 1981-04-13 Du Pont Mask capable of net point etching
JPS55114370A (en) * 1979-02-28 1980-09-03 Fuji Photo Film Co Ltd Treatment of plate
JPS6234429B2 (de) * 1979-02-28 1987-07-27 Fuji Photo Film Co Ltd
JPS5630129A (en) * 1979-08-21 1981-03-26 Agency Of Ind Science & Technol Manufacture of photomask
JPS62231245A (ja) * 1986-03-31 1987-10-09 Nippon Zeon Co Ltd 感光性フレキソ版
JPH0547092B2 (de) * 1986-03-31 1993-07-15 Nippon Zeon Co
JP2003107697A (ja) * 2001-09-28 2003-04-09 Fuji Photo Film Co Ltd 感光性転写材料、フォトマスク材料、フォトマスクおよびフォトマスクの製造方法
JP2006337996A (ja) * 2005-05-04 2006-12-14 Rohm & Haas Electronic Materials Llc コーティング組成物
JP2007171406A (ja) * 2005-12-20 2007-07-05 Fujifilm Corp 平版印刷版の作製方法および平版印刷版原版

Also Published As

Publication number Publication date
DE2660103B1 (de) 1981-02-12
DE2660103C3 (de) 1987-10-22
AU1966676A (en) 1978-05-25
FR2331813A1 (fr) 1977-06-10
DE2660921A1 (de) 1984-07-19
CA1079565A (en) 1980-06-17
JPS6132661B2 (de) 1986-07-28
AU506292B2 (en) 1979-12-20
BR7607672A (pt) 1977-09-27
JPS5722372B2 (de) 1982-05-12
DE2660921C3 (de) 1987-07-30
BE848409A (fr) 1977-05-17
DE2651864C3 (de) 1987-09-10
DE2651864A1 (de) 1977-05-18
GB1548439A (en) 1979-07-18
JPS5638046A (en) 1981-04-13
FR2331813B1 (de) 1981-10-02
DE2651864B2 (de) 1980-02-07
JPS5638047A (en) 1981-04-13
JPS5762048A (en) 1982-04-14

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