JPS5762048A - Photopolymerizable element - Google Patents

Photopolymerizable element

Info

Publication number
JPS5762048A
JPS5762048A JP56108067A JP10806781A JPS5762048A JP S5762048 A JPS5762048 A JP S5762048A JP 56108067 A JP56108067 A JP 56108067A JP 10806781 A JP10806781 A JP 10806781A JP S5762048 A JPS5762048 A JP S5762048A
Authority
JP
Japan
Prior art keywords
photopolymerizable element
photopolymerizable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56108067A
Other languages
Japanese (ja)
Other versions
JPS6132661B2 (en
Inventor
Danieru Buratsuto Maachin
Baanaado Kooen Aburahamu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JPS5762048A publication Critical patent/JPS5762048A/en
Publication of JPS6132661B2 publication Critical patent/JPS6132661B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F5/00—Screening processes; Screens therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Materials For Photolithography (AREA)
JP56108067A 1975-11-17 1981-07-10 Photopolymerizable element Granted JPS5762048A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US63272675A 1975-11-17 1975-11-17

Publications (2)

Publication Number Publication Date
JPS5762048A true JPS5762048A (en) 1982-04-14
JPS6132661B2 JPS6132661B2 (en) 1986-07-28

Family

ID=24536688

Family Applications (4)

Application Number Title Priority Date Filing Date
JP51139041A Granted JPS5262427A (en) 1975-11-17 1976-11-17 Photopolymer element and method of duplicating image
JP7653980A Pending JPS5638046A (en) 1975-11-17 1980-06-06 Colorrproof system
JP7653880A Pending JPS5638047A (en) 1975-11-17 1980-06-06 Mask capable of net point etching
JP56108067A Granted JPS5762048A (en) 1975-11-17 1981-07-10 Photopolymerizable element

Family Applications Before (3)

Application Number Title Priority Date Filing Date
JP51139041A Granted JPS5262427A (en) 1975-11-17 1976-11-17 Photopolymer element and method of duplicating image
JP7653980A Pending JPS5638046A (en) 1975-11-17 1980-06-06 Colorrproof system
JP7653880A Pending JPS5638047A (en) 1975-11-17 1980-06-06 Mask capable of net point etching

Country Status (8)

Country Link
JP (4) JPS5262427A (en)
AU (1) AU506292B2 (en)
BE (1) BE848409A (en)
BR (1) BR7607672A (en)
CA (1) CA1079565A (en)
DE (3) DE2660921C3 (en)
FR (1) FR2331813A1 (en)
GB (1) GB1548439A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59154442A (en) * 1983-02-22 1984-09-03 Oji Paper Co Ltd Photosensitive film for forming picture image
JPH01282543A (en) * 1988-05-09 1989-11-14 Fuji Photo Film Co Ltd Picture forming material
US5372437A (en) * 1992-04-24 1994-12-13 Citizen Watch Co., Ltd. Print head of wire-dot printer and production method thereof
JP2007199695A (en) * 2005-12-27 2007-08-09 Kansai Paint Co Ltd Active energy ray curable resin composition and method for forming resist pattern
JPWO2016158114A1 (en) * 2015-03-30 2018-01-18 富士フイルム株式会社 Colored photosensitive composition, cured film, pattern forming method, infrared light cut filter with light-shielding film, solid-state imaging device, image display device, and infrared sensor

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2660921C3 (en) * 1975-11-17 1987-07-30 E.I. Du Pont De Nemours And Co., Wilmington, Del. Method for producing point-etched masks
US4311784A (en) 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element
JPS55114370A (en) * 1979-02-28 1980-09-03 Fuji Photo Film Co Ltd Treatment of plate
JPS5630129A (en) * 1979-08-21 1981-03-26 Agency Of Ind Science & Technol Manufacture of photomask
DE3150637C2 (en) * 1981-12-21 1983-11-10 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Etching solution for etching photopolymer films and method for point etching
US4515877A (en) * 1982-11-27 1985-05-07 Basf Aktiengesellschaft Image-recording materials and image-recording carried out using these to produce an optical mask
JPS62231245A (en) * 1986-03-31 1987-10-09 Nippon Zeon Co Ltd Photosensitive polymer composition
JP2003107697A (en) * 2001-09-28 2003-04-09 Fuji Photo Film Co Ltd Photosensitive transfer material, photomask material, photomask and method for manufacturing the photomask
JP5203575B2 (en) * 2005-05-04 2013-06-05 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． Coating composition
JP4820640B2 (en) * 2005-12-20 2011-11-24 富士フイルム株式会社 Preparation method of lithographic printing plate

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL101499C (en) * 1951-08-20
US3149975A (en) * 1962-07-06 1964-09-22 Du Pont Photopolymerizable compositions and elements
US3380831A (en) * 1964-05-26 1968-04-30 Du Pont Photopolymerizable compositions and elements
US3353955A (en) * 1964-06-16 1967-11-21 Du Pont Stratum transfer process based on adhesive properties of photopolymerizable layer
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
US3698904A (en) * 1969-07-23 1972-10-17 Asahi Chemical Ind Composition for developing photopolymerizable lithographic plate elements comprising a developer base agent,an ink-receptivity-affording agent and a desensitizer
BE759041A (en) * 1969-11-18 1971-05-17 Du Pont PHOTOPOLYMERISABLE COMPOSITIONS CONTAINING AMINOPHENYLCETONES AND ADJUVANTS
CA993709A (en) * 1971-01-21 1976-07-27 Leo Roos Composite, mask-forming photohardenable elements
BE787932A (en) * 1971-09-13 1973-02-26 Bristol Myers Co PRODUCTS SUCH AS BUFFERS, FOR CLEANING OR OTHER USES AND LIQUID COMPOSITIONS FOR PREPARING THESE PRODUCTS
JPS4877438A (en) * 1972-01-19 1973-10-18
JPS4893337A (en) * 1972-03-11 1973-12-03
BE788560A (en) * 1972-06-09 1973-03-08 Du Pont PROTECTION AGAINST HALO IN IMAGE FORMING IN MULTI-LAYER PHOTOPOLYMERS
JPS51139041A (en) * 1975-05-23 1976-12-01 Kayaba Industry Co Ltd Disk brake for eccentric retention suspension mechanism
DE2660921C3 (en) * 1975-11-17 1987-07-30 E.I. Du Pont De Nemours And Co., Wilmington, Del. Method for producing point-etched masks

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59154442A (en) * 1983-02-22 1984-09-03 Oji Paper Co Ltd Photosensitive film for forming picture image
JPH01282543A (en) * 1988-05-09 1989-11-14 Fuji Photo Film Co Ltd Picture forming material
US5372437A (en) * 1992-04-24 1994-12-13 Citizen Watch Co., Ltd. Print head of wire-dot printer and production method thereof
JP2007199695A (en) * 2005-12-27 2007-08-09 Kansai Paint Co Ltd Active energy ray curable resin composition and method for forming resist pattern
JPWO2016158114A1 (en) * 2015-03-30 2018-01-18 富士フイルム株式会社 Colored photosensitive composition, cured film, pattern forming method, infrared light cut filter with light-shielding film, solid-state imaging device, image display device, and infrared sensor

Also Published As

Publication number Publication date
JPS5722372B2 (en) 1982-05-12
DE2660921A1 (en) 1984-07-19
FR2331813B1 (en) 1981-10-02
DE2660921C3 (en) 1987-07-30
GB1548439A (en) 1979-07-18
DE2660103C3 (en) 1987-10-22
JPS5638046A (en) 1981-04-13
JPS6132661B2 (en) 1986-07-28
AU1966676A (en) 1978-05-25
BE848409A (en) 1977-05-17
DE2651864C3 (en) 1987-09-10
JPS5638047A (en) 1981-04-13
DE2651864B2 (en) 1980-02-07
DE2660103B1 (en) 1981-02-12
AU506292B2 (en) 1979-12-20
FR2331813A1 (en) 1977-06-10
JPS5262427A (en) 1977-05-23
CA1079565A (en) 1980-06-17
BR7607672A (en) 1977-09-27
DE2651864A1 (en) 1977-05-18

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