GB1548439A - Dot-etchable photopoymerisable elements and image reproductionprocess - Google Patents

Dot-etchable photopoymerisable elements and image reproductionprocess

Info

Publication number
GB1548439A
GB1548439A GB47954/76A GB4795476A GB1548439A GB 1548439 A GB1548439 A GB 1548439A GB 47954/76 A GB47954/76 A GB 47954/76A GB 4795476 A GB4795476 A GB 4795476A GB 1548439 A GB1548439 A GB 1548439A
Authority
GB
United Kingdom
Prior art keywords
reproductionprocess
photopoymerisable
etchable
dot
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB47954/76A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Priority to US06/037,947 priority Critical patent/US4229517A/en
Publication of GB1548439A publication Critical patent/GB1548439A/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F5/00Screening processes; Screens therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
GB47954/76A 1975-11-17 1976-11-17 Dot-etchable photopoymerisable elements and image reproductionprocess Expired GB1548439A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US06/037,947 US4229517A (en) 1976-11-13 1979-05-10 Dot-etchable photopolymerizable elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US63272675A 1975-11-17 1975-11-17

Publications (1)

Publication Number Publication Date
GB1548439A true GB1548439A (en) 1979-07-18

Family

ID=24536688

Family Applications (1)

Application Number Title Priority Date Filing Date
GB47954/76A Expired GB1548439A (en) 1975-11-17 1976-11-17 Dot-etchable photopoymerisable elements and image reproductionprocess

Country Status (8)

Country Link
JP (4) JPS5262427A (en)
AU (1) AU506292B2 (en)
BE (1) BE848409A (en)
BR (1) BR7607672A (en)
CA (1) CA1079565A (en)
DE (3) DE2651864B2 (en)
FR (1) FR2331813A1 (en)
GB (1) GB1548439A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4515877A (en) * 1982-11-27 1985-05-07 Basf Aktiengesellschaft Image-recording materials and image-recording carried out using these to produce an optical mask

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2651864B2 (en) * 1975-11-17 1980-02-07 E.I. Du Pont De Nemours And Co., Wilmington, Del. (V.St.A.) Photopolymerizable recording material and methods for reproducing images
US4311784A (en) 1978-05-09 1982-01-19 E. I. Du Pont De Nemours And Company Multilayer photosensitive solvent-processable litho element
JPS55114370A (en) * 1979-02-28 1980-09-03 Fuji Photo Film Co Ltd Treatment of plate
JPS5630129A (en) * 1979-08-21 1981-03-26 Agency Of Ind Science & Technol Manufacture of photomask
DE3150637C2 (en) * 1981-12-21 1983-11-10 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Etching solution for etching photopolymer films and method for point etching
JPS59154442A (en) * 1983-02-22 1984-09-03 Oji Paper Co Ltd Photosensitive film for forming picture image
JPS62231245A (en) * 1986-03-31 1987-10-09 Nippon Zeon Co Ltd Photosensitive polymer composition
JPH01282543A (en) * 1988-05-09 1989-11-14 Fuji Photo Film Co Ltd Picture forming material
US5372437A (en) * 1992-04-24 1994-12-13 Citizen Watch Co., Ltd. Print head of wire-dot printer and production method thereof
JP2003107697A (en) * 2001-09-28 2003-04-09 Fuji Photo Film Co Ltd Photosensitive transfer material, photomask material, photomask and method for manufacturing the photomask
JP5203575B2 (en) * 2005-05-04 2013-06-05 ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. Coating composition
JP4820640B2 (en) * 2005-12-20 2011-11-24 富士フイルム株式会社 Preparation method of lithographic printing plate
JP4979368B2 (en) * 2005-12-27 2012-07-18 関西ペイント株式会社 Active energy ray-curable resin composition and resist pattern forming method
TWI717193B (en) * 2015-03-30 2021-01-21 日商富士軟片股份有限公司 Colored photosensitive composition, cured film, pattern forming method, infrared cut filter with light shielding film, solid-state imaging element, image display device, and infrared sensor

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL87862C (en) * 1951-08-20
US3149975A (en) * 1962-07-06 1964-09-22 Du Pont Photopolymerizable compositions and elements
US3380831A (en) * 1964-05-26 1968-04-30 Du Pont Photopolymerizable compositions and elements
US3353955A (en) * 1964-06-16 1967-11-21 Du Pont Stratum transfer process based on adhesive properties of photopolymerizable layer
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists
US3698904A (en) * 1969-07-23 1972-10-17 Asahi Chemical Ind Composition for developing photopolymerizable lithographic plate elements comprising a developer base agent,an ink-receptivity-affording agent and a desensitizer
BE759041A (en) * 1969-11-18 1971-05-17 Du Pont PHOTOPOLYMERISABLE COMPOSITIONS CONTAINING AMINOPHENYLCETONES AND ADJUVANTS
CA993709A (en) * 1971-01-21 1976-07-27 Leo Roos Composite, mask-forming photohardenable elements
BE787932A (en) * 1971-09-13 1973-02-26 Bristol Myers Co PRODUCTS SUCH AS BUFFERS, FOR CLEANING OR OTHER USES AND LIQUID COMPOSITIONS FOR PREPARING THESE PRODUCTS
JPS4877438A (en) * 1972-01-19 1973-10-18
JPS4893337A (en) * 1972-03-11 1973-12-03
BE788560A (en) * 1972-06-09 1973-03-08 Du Pont PROTECTION AGAINST HALO IN IMAGE FORMING IN MULTI-LAYER PHOTOPOLYMERS
JPS51139041A (en) * 1975-05-23 1976-12-01 Kayaba Industry Co Ltd Disk brake for eccentric retention suspension mechanism
DE2651864B2 (en) * 1975-11-17 1980-02-07 E.I. Du Pont De Nemours And Co., Wilmington, Del. (V.St.A.) Photopolymerizable recording material and methods for reproducing images

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4515877A (en) * 1982-11-27 1985-05-07 Basf Aktiengesellschaft Image-recording materials and image-recording carried out using these to produce an optical mask

Also Published As

Publication number Publication date
BR7607672A (en) 1977-09-27
JPS5762048A (en) 1982-04-14
JPS5722372B2 (en) 1982-05-12
DE2660921A1 (en) 1984-07-19
DE2651864A1 (en) 1977-05-18
AU1966676A (en) 1978-05-25
FR2331813B1 (en) 1981-10-02
JPS6132661B2 (en) 1986-07-28
AU506292B2 (en) 1979-12-20
FR2331813A1 (en) 1977-06-10
DE2651864B2 (en) 1980-02-07
CA1079565A (en) 1980-06-17
BE848409A (en) 1977-05-17
DE2651864C3 (en) 1987-09-10
JPS5638046A (en) 1981-04-13
JPS5638047A (en) 1981-04-13
DE2660921C3 (en) 1987-07-30
DE2660103C3 (en) 1987-10-22
JPS5262427A (en) 1977-05-23
DE2660103B1 (en) 1981-02-12

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Legal Events

Date Code Title Description
PS Patent sealed
PE20 Patent expired after termination of 20 years

Effective date: 19961116