JPS5255864A - Dry etching device - Google Patents

Dry etching device

Info

Publication number
JPS5255864A
JPS5255864A JP13136675A JP13136675A JPS5255864A JP S5255864 A JPS5255864 A JP S5255864A JP 13136675 A JP13136675 A JP 13136675A JP 13136675 A JP13136675 A JP 13136675A JP S5255864 A JPS5255864 A JP S5255864A
Authority
JP
Japan
Prior art keywords
dry etching
etching device
wafer
plae
plasmas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13136675A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5324782B2 (enExample
Inventor
Yasuhiro Horiike
Masahiro Shibagaki
Yoshio Tabei
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP13136675A priority Critical patent/JPS5255864A/ja
Publication of JPS5255864A publication Critical patent/JPS5255864A/ja
Publication of JPS5324782B2 publication Critical patent/JPS5324782B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
JP13136675A 1975-11-04 1975-11-04 Dry etching device Granted JPS5255864A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13136675A JPS5255864A (en) 1975-11-04 1975-11-04 Dry etching device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13136675A JPS5255864A (en) 1975-11-04 1975-11-04 Dry etching device

Publications (2)

Publication Number Publication Date
JPS5255864A true JPS5255864A (en) 1977-05-07
JPS5324782B2 JPS5324782B2 (enExample) 1978-07-22

Family

ID=15056235

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13136675A Granted JPS5255864A (en) 1975-11-04 1975-11-04 Dry etching device

Country Status (1)

Country Link
JP (1) JPS5255864A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5948928A (ja) * 1982-08-12 1984-03-21 コンパニ−・アンデユストリエル・デ・テレコミユニカシオン・セイテ−アルカテル 弱吸収性の薄膜の厚みの調節デバイス
JPS60132327A (ja) * 1983-11-21 1985-07-15 コンパニー・アンデユストリエル・デ・テレコミユニカシオン・セイテ‐アルカテル 薄膜の膜厚モニタデバイス
JPS6415931A (en) * 1987-06-04 1989-01-19 Philips Nv Manufacture of semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5948928A (ja) * 1982-08-12 1984-03-21 コンパニ−・アンデユストリエル・デ・テレコミユニカシオン・セイテ−アルカテル 弱吸収性の薄膜の厚みの調節デバイス
JPS60132327A (ja) * 1983-11-21 1985-07-15 コンパニー・アンデユストリエル・デ・テレコミユニカシオン・セイテ‐アルカテル 薄膜の膜厚モニタデバイス
JPS6415931A (en) * 1987-06-04 1989-01-19 Philips Nv Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS5324782B2 (enExample) 1978-07-22

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