JPS5241151B2 - - Google Patents

Info

Publication number
JPS5241151B2
JPS5241151B2 JP48144569A JP14456973A JPS5241151B2 JP S5241151 B2 JPS5241151 B2 JP S5241151B2 JP 48144569 A JP48144569 A JP 48144569A JP 14456973 A JP14456973 A JP 14456973A JP S5241151 B2 JPS5241151 B2 JP S5241151B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP48144569A
Other versions
JPS49118382A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS49118382A publication Critical patent/JPS49118382A/ja
Publication of JPS5241151B2 publication Critical patent/JPS5241151B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/30DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H10B12/37DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells the capacitor being at least partially in a trench in the substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/225Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
    • H01L21/2251Diffusion into or out of group IV semiconductors
    • H01L21/2254Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
    • H01L21/2255Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides the applied layer comprising oxides only, e.g. P2O5, PSG, H3BO3, doped oxides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/043Dual dielectric
JP48144569A 1973-01-02 1973-12-27 Expired JPS5241151B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00320395A US3811076A (en) 1973-01-02 1973-01-02 Field effect transistor integrated circuit and memory

Publications (2)

Publication Number Publication Date
JPS49118382A JPS49118382A (ja) 1974-11-12
JPS5241151B2 true JPS5241151B2 (ja) 1977-10-17

Family

ID=23246222

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48144569A Expired JPS5241151B2 (ja) 1973-01-02 1973-12-27

Country Status (7)

Country Link
US (1) US3811076A (ja)
JP (1) JPS5241151B2 (ja)
BE (1) BE809264A (ja)
CA (1) CA1009752A (ja)
FR (1) FR2212651B1 (ja)
GB (1) GB1448588A (ja)
SE (1) SE395786B (ja)

Families Citing this family (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3916390A (en) * 1974-12-31 1975-10-28 Ibm Dynamic memory with non-volatile back-up mode
US3975220A (en) * 1975-09-05 1976-08-17 International Business Machines Corporation Diffusion control for controlling parasitic capacitor effects in single FET structure arrays
US4015159A (en) * 1975-09-15 1977-03-29 Bell Telephone Laboratories, Incorporated Semiconductor integrated circuit transistor detector array for channel electron multiplier
US4051273A (en) * 1975-11-26 1977-09-27 Ibm Corporation Field effect transistor structure and method of making same
US4225945A (en) * 1976-01-12 1980-09-30 Texas Instruments Incorporated Random access MOS memory cell using double level polysilicon
US4075045A (en) * 1976-02-09 1978-02-21 International Business Machines Corporation Method for fabricating FET one-device memory cells with two layers of polycrystalline silicon and fabrication of integrated circuits containing arrays of the memory cells charge storage capacitors utilizing five basic pattern deliberating steps
JPS5853512B2 (ja) * 1976-02-13 1983-11-29 株式会社東芝 半導体記憶装置の製造方法
US4060738A (en) * 1976-03-03 1977-11-29 Texas Instruments Incorporated Charge coupled device random access memory
FR2351502A1 (fr) * 1976-05-14 1977-12-09 Ibm Procede de fabrication de transistors a effet de champ a porte en silicium polycristallin auto-alignee avec les regions source et drain ainsi qu'avec les regions d'isolation de champ encastrees
US4398207A (en) * 1976-08-24 1983-08-09 Intel Corporation MOS Digital-to-analog converter with resistor chain using compensating "dummy" metal contacts
JPS5334968U (ja) * 1976-08-31 1978-03-27
US4827448A (en) * 1976-09-13 1989-05-02 Texas Instruments Incorporated Random access memory cell with implanted capacitor region
US5434438A (en) * 1976-09-13 1995-07-18 Texas Instruments Inc. Random access memory cell with a capacitor
GB1602361A (en) * 1977-02-21 1981-11-11 Zaidan Hojin Handotai Kenkyu Semiconductor memory devices
US4219834A (en) * 1977-11-11 1980-08-26 International Business Machines Corporation One-device monolithic random access memory and method of fabricating same
JPS5927102B2 (ja) * 1979-12-24 1984-07-03 富士通株式会社 半導体記憶装置
JPS5696854A (en) * 1979-12-29 1981-08-05 Fujitsu Ltd Semiconductor memory device
US4335450A (en) * 1980-01-30 1982-06-15 International Business Machines Corporation Non-destructive read out field effect transistor memory cell system
US4240845A (en) * 1980-02-04 1980-12-23 International Business Machines Corporation Method of fabricating random access memory device
US4287576A (en) * 1980-03-26 1981-09-01 International Business Machines Corporation Sense amplifying system for memories with small cells
US4345364A (en) * 1980-04-07 1982-08-24 Texas Instruments Incorporated Method of making a dynamic memory array
US4301519A (en) * 1980-05-02 1981-11-17 International Business Machines Corporation Sensing technique for memories with small cells
US4358326A (en) * 1980-11-03 1982-11-09 International Business Machines Corporation Epitaxially extended polycrystalline structures utilizing a predeposit of amorphous silicon with subsequent annealing
US4399449A (en) * 1980-11-17 1983-08-16 International Rectifier Corporation Composite metal and polysilicon field plate structure for high voltage semiconductor devices
US4363110A (en) * 1980-12-22 1982-12-07 International Business Machines Corp. Non-volatile dynamic RAM cell
US4511911A (en) * 1981-07-22 1985-04-16 International Business Machines Corporation Dense dynamic memory cell structure and process
DE3137914A1 (de) * 1981-09-23 1983-04-07 Siemens AG, 1000 Berlin und 8000 München Anordnung zur kompensation von korrosionseffekten inintegrierten halbleiterschaltkreisen
US4445201A (en) * 1981-11-30 1984-04-24 International Business Machines Corporation Simple amplifying system for a dense memory array
US4432072A (en) * 1981-12-31 1984-02-14 International Business Machines Corporation Non-volatile dynamic RAM cell
US4471471A (en) * 1981-12-31 1984-09-11 International Business Machines Corporation Non-volatile RAM device
US4446535A (en) * 1981-12-31 1984-05-01 International Business Machines Corporation Non-inverting non-volatile dynamic RAM cell
JPS58137245A (ja) * 1982-02-10 1983-08-15 Hitachi Ltd 大規模半導体メモリ
EP0096096B1 (de) * 1982-06-14 1987-09-16 Ibm Deutschland Gmbh Verfahren zur Einstellung des Kantenwinkels in Polysilicium
JPS602784B2 (ja) * 1982-12-20 1985-01-23 富士通株式会社 半導体記憶装置
US4649406A (en) * 1982-12-20 1987-03-10 Fujitsu Limited Semiconductor memory device having stacked capacitor-type memory cells
US4542340A (en) * 1982-12-30 1985-09-17 Ibm Corporation Testing method and structure for leakage current characterization in the manufacture of dynamic RAM cells
US4833521A (en) * 1983-12-13 1989-05-23 Fairchild Camera & Instrument Corp. Means for reducing signal propagation losses in very large scale integrated circuits
US4891747A (en) * 1984-06-25 1990-01-02 Texas Instruments Incorporated Lightly-doped drain transistor structure in contactless DRAM cell with buried source/drain
JPH0640574B2 (ja) * 1984-06-29 1994-05-25 富士通株式会社 半導体記憶装置
US4609429A (en) * 1984-07-02 1986-09-02 International Business Machines Corporation Process for making a small dynamic memory cell structure
US5087591A (en) * 1985-01-22 1992-02-11 Texas Instruments Incorporated Contact etch process
US4675982A (en) * 1985-10-31 1987-06-30 International Business Machines Corporation Method of making self-aligned recessed oxide isolation regions
US4751558A (en) * 1985-10-31 1988-06-14 International Business Machines Corporation High density memory with field shield
US5306648A (en) * 1986-01-24 1994-04-26 Canon Kabushiki Kaisha Method of making photoelectric conversion device
US4811067A (en) * 1986-05-02 1989-03-07 International Business Machines Corporation High density vertically structured memory
US4769786A (en) * 1986-07-15 1988-09-06 International Business Machines Corporation Two square memory cells
USRE33972E (en) * 1986-07-15 1992-06-23 International Business Machines Corporation Two square memory cells
JPS6344759A (ja) * 1986-08-12 1988-02-25 Canon Inc 光電変換装置
JP2584774B2 (ja) * 1987-06-12 1997-02-26 キヤノン株式会社 密着型光電変換装置
US6069393A (en) * 1987-06-26 2000-05-30 Canon Kabushiki Kaisha Photoelectric converter
JPH0744226B2 (ja) * 1988-01-21 1995-05-15 富士通株式会社 半導体装置及びその製造方法
US4881106A (en) * 1988-05-23 1989-11-14 Ixys Corporation DV/DT of power MOSFETS
JPH02172253A (ja) * 1988-12-24 1990-07-03 Mitsubishi Electric Corp 半導体装置およびその製造方法
US5001525A (en) * 1989-03-27 1991-03-19 International Business Machines Corporation Two square memory cells having highly conductive word lines
JP2746730B2 (ja) * 1990-05-17 1998-05-06 富士通株式会社 半導体記憶装置
US5510638A (en) * 1992-11-02 1996-04-23 Nvx Corporation Field shield isolated EPROM
JP3035188B2 (ja) * 1995-05-10 2000-04-17 日本ファウンドリー株式会社 半導体装置
JP3217326B2 (ja) 1999-03-19 2001-10-09 富士通株式会社 電磁波シールド構造を有する強誘電体メモリ
US8072834B2 (en) * 2005-08-25 2011-12-06 Cypress Semiconductor Corporation Line driver circuit and method with standby mode of operation
US7859925B1 (en) 2006-03-31 2010-12-28 Cypress Semiconductor Corporation Anti-fuse latch self-test circuit and method
US8648403B2 (en) * 2006-04-21 2014-02-11 International Business Machines Corporation Dynamic memory cell structures
US7859906B1 (en) 2007-03-30 2010-12-28 Cypress Semiconductor Corporation Circuit and method to increase read margin in non-volatile memories using a differential sensing circuit
US8036032B2 (en) * 2007-12-31 2011-10-11 Cypress Semiconductor Corporation 5T high density NVDRAM cell
US8059458B2 (en) * 2007-12-31 2011-11-15 Cypress Semiconductor Corporation 3T high density nvDRAM cell
US8064255B2 (en) * 2007-12-31 2011-11-22 Cypress Semiconductor Corporation Architecture of a nvDRAM array and its sense regime
AU2010226940C1 (en) * 2010-10-02 2011-07-14 Bui, Dac Thong Mr Auto switch MOS-FET

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3387286A (en) * 1967-07-14 1968-06-04 Ibm Field-effect transistor memory
US3602782A (en) * 1969-12-05 1971-08-31 Thomas Klein Conductor-insulator-semiconductor fieldeffect transistor with semiconductor layer embedded in dielectric underneath interconnection layer
US3720922A (en) * 1971-03-17 1973-03-13 Rca Corp Charge coupled memory

Also Published As

Publication number Publication date
SE395786B (sv) 1977-08-22
FR2212651B1 (ja) 1977-09-09
BE809264A (fr) 1974-04-16
CA1009752A (en) 1977-05-03
US3811076A (en) 1974-05-14
JPS49118382A (ja) 1974-11-12
FR2212651A1 (ja) 1974-07-26
GB1448588A (en) 1976-09-08

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