JPS52149476A - Liquid phase epitaxial growth apparatus - Google Patents

Liquid phase epitaxial growth apparatus

Info

Publication number
JPS52149476A
JPS52149476A JP6631376A JP6631376A JPS52149476A JP S52149476 A JPS52149476 A JP S52149476A JP 6631376 A JP6631376 A JP 6631376A JP 6631376 A JP6631376 A JP 6631376A JP S52149476 A JPS52149476 A JP S52149476A
Authority
JP
Japan
Prior art keywords
liquid phase
phase epitaxial
epitaxial growth
growth apparatus
single crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6631376A
Other languages
Japanese (ja)
Inventor
Tsuneo Furukawa
Kazumi Unno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP6631376A priority Critical patent/JPS52149476A/en
Publication of JPS52149476A publication Critical patent/JPS52149476A/en
Pending legal-status Critical Current

Links

Landscapes

  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE: To eliminate residual solution on single crystal wafers and obtain goodquality liquid phase epitaxial grown layers by obliquely disposing single crystal wafer holding plates and arranging said plates so as to permit desired adjustment of their inclination angle.
COPYRIGHT: (C)1977,JPO&Japio
JP6631376A 1976-06-07 1976-06-07 Liquid phase epitaxial growth apparatus Pending JPS52149476A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6631376A JPS52149476A (en) 1976-06-07 1976-06-07 Liquid phase epitaxial growth apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6631376A JPS52149476A (en) 1976-06-07 1976-06-07 Liquid phase epitaxial growth apparatus

Publications (1)

Publication Number Publication Date
JPS52149476A true JPS52149476A (en) 1977-12-12

Family

ID=13312201

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6631376A Pending JPS52149476A (en) 1976-06-07 1976-06-07 Liquid phase epitaxial growth apparatus

Country Status (1)

Country Link
JP (1) JPS52149476A (en)

Similar Documents

Publication Publication Date Title
JPS52115185A (en) Vapor phase growing apparatus
JPS51111476A (en) Method of liquid phase epitaxial crystal growth
JPS52149476A (en) Liquid phase epitaxial growth apparatus
JPS5286059A (en) Process for production and apparatus used for process of semiconductor device
JPS5333055A (en) Vapor phase growing apparatus of semiconductor crystals
JPS53104162A (en) Forming method for epitaxial layer on semiconductor wafer
JPS5320763A (en) Crystal growing method and apparatus
JPS5249989A (en) Growth method of liquid phase epitaxial
JPS52146554A (en) Multilayer epitaxial growth and its apparatus
JPS53147684A (en) Method of and apparatus for liquid phase epitaxial growth
JPS5261958A (en) Method and device for liquid phase crystal crowth
JPS52109866A (en) Liquid epitaxial growing method
JPS52117062A (en) Liquid phase epitaxial growth process
JPS53144474A (en) Apparatus for producing crystal semiconductor
JPS5228476A (en) Liquid phase growth apparatus
JPS5267571A (en) Crystallization method for semiconductor
JPS5328374A (en) Wafer production
JPS52154347A (en) Low temperature single crystal thin film growth method
JPS5387985A (en) Gaseous phase epitaxial growth method for compound semiconductor crystal
JPS51141577A (en) Method and apparatus for epitaxial growth in the liquid phase
JPS533063A (en) Liquid phase epitaxial growth
JPS533062A (en) Semiconductor crystal growth apparatus
JPS5323560A (en) Liquid phase epitaxial growth method
JPS5228865A (en) Process for multilayer epitaxial growth in liquid phase
JPS51111057A (en) Crystal growing device