JPS52128890A - Production of thin film by decompression gas phase growth process - Google Patents

Production of thin film by decompression gas phase growth process

Info

Publication number
JPS52128890A
JPS52128890A JP4492376A JP4492376A JPS52128890A JP S52128890 A JPS52128890 A JP S52128890A JP 4492376 A JP4492376 A JP 4492376A JP 4492376 A JP4492376 A JP 4492376A JP S52128890 A JPS52128890 A JP S52128890A
Authority
JP
Japan
Prior art keywords
thin film
gas phase
growth process
phase growth
production
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4492376A
Other languages
English (en)
Japanese (ja)
Other versions
JPS544712B2 (enExample
Inventor
Daijiro Kudo
Kazuo Maeda
Yoshiki Tanigawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4492376A priority Critical patent/JPS52128890A/ja
Priority to US05/787,495 priority patent/US4179326A/en
Priority to SE7704276A priority patent/SE432162B/xx
Priority to GB16011/77A priority patent/GB1575578A/en
Priority to IT22668/77A priority patent/IT1114781B/it
Priority to DE2718026A priority patent/DE2718026C3/de
Priority to FR7712288A priority patent/FR2348983A1/fr
Publication of JPS52128890A publication Critical patent/JPS52128890A/ja
Publication of JPS544712B2 publication Critical patent/JPS544712B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
JP4492376A 1976-04-22 1976-04-22 Production of thin film by decompression gas phase growth process Granted JPS52128890A (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP4492376A JPS52128890A (en) 1976-04-22 1976-04-22 Production of thin film by decompression gas phase growth process
US05/787,495 US4179326A (en) 1976-04-22 1977-04-14 Process for the vapor growth of a thin film
SE7704276A SE432162B (sv) 1976-04-22 1977-04-14 Forfarande for att utifran en anga bringa en tunn film att tillvexa
GB16011/77A GB1575578A (en) 1976-04-22 1977-04-18 Process for the vapour deposition of a thin film
IT22668/77A IT1114781B (it) 1976-04-22 1977-04-20 Processo per l'accresciemento,da fase vapore,di una sottile pellicola
DE2718026A DE2718026C3 (de) 1976-04-22 1977-04-22 Verfahren zum Beschichten von Halbleiterplättchen aus der Dampfphase und deren Anwendung
FR7712288A FR2348983A1 (fr) 1976-04-22 1977-04-22 Procede de depot d'une couche mince sous forme vapeur

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4492376A JPS52128890A (en) 1976-04-22 1976-04-22 Production of thin film by decompression gas phase growth process

Publications (2)

Publication Number Publication Date
JPS52128890A true JPS52128890A (en) 1977-10-28
JPS544712B2 JPS544712B2 (enExample) 1979-03-09

Family

ID=12704980

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4492376A Granted JPS52128890A (en) 1976-04-22 1976-04-22 Production of thin film by decompression gas phase growth process

Country Status (1)

Country Link
JP (1) JPS52128890A (enExample)

Also Published As

Publication number Publication date
JPS544712B2 (enExample) 1979-03-09

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