JPS52128890A - Production of thin film by decompression gas phase growth process - Google Patents
Production of thin film by decompression gas phase growth processInfo
- Publication number
- JPS52128890A JPS52128890A JP4492376A JP4492376A JPS52128890A JP S52128890 A JPS52128890 A JP S52128890A JP 4492376 A JP4492376 A JP 4492376A JP 4492376 A JP4492376 A JP 4492376A JP S52128890 A JPS52128890 A JP S52128890A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- gas phase
- growth process
- phase growth
- production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
PURPOSE:To form the thin film, having uniform thickness, on the surface of wafer with gas phase growth process, by arranging the dimension of space, prescribed by the inner face of reactor and the outer circumference of wafer, so as to be constant along the whole outer circumference.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4492376A JPS52128890A (en) | 1976-04-22 | 1976-04-22 | Production of thin film by decompression gas phase growth process |
SE7704276A SE432162B (en) | 1976-04-22 | 1977-04-14 | PROCEDURE TO MAKE A THIN FILM TO GROW OUT |
US05/787,495 US4179326A (en) | 1976-04-22 | 1977-04-14 | Process for the vapor growth of a thin film |
GB16011/77A GB1575578A (en) | 1976-04-22 | 1977-04-18 | Process for the vapour deposition of a thin film |
IT22668/77A IT1114781B (en) | 1976-04-22 | 1977-04-20 | PROCESS FOR THE INCREASE, FROM STEAM PHASE, OF A THIN FILM |
DE2718026A DE2718026C3 (en) | 1976-04-22 | 1977-04-22 | Process for coating semiconductor wafers from the vapor phase and their application |
FR7712288A FR2348983A1 (en) | 1976-04-22 | 1977-04-22 | PROCESS FOR DEPOSITING A THIN LAYER IN STEAM FORM |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4492376A JPS52128890A (en) | 1976-04-22 | 1976-04-22 | Production of thin film by decompression gas phase growth process |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52128890A true JPS52128890A (en) | 1977-10-28 |
JPS544712B2 JPS544712B2 (en) | 1979-03-09 |
Family
ID=12704980
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4492376A Granted JPS52128890A (en) | 1976-04-22 | 1976-04-22 | Production of thin film by decompression gas phase growth process |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52128890A (en) |
-
1976
- 1976-04-22 JP JP4492376A patent/JPS52128890A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS544712B2 (en) | 1979-03-09 |
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