JPS52117985A - Photosensitive polymer composition - Google Patents

Photosensitive polymer composition

Info

Publication number
JPS52117985A
JPS52117985A JP3544276A JP3544276A JPS52117985A JP S52117985 A JPS52117985 A JP S52117985A JP 3544276 A JP3544276 A JP 3544276A JP 3544276 A JP3544276 A JP 3544276A JP S52117985 A JPS52117985 A JP S52117985A
Authority
JP
Japan
Prior art keywords
polymer composition
photosensitive polymer
photosensitizer
resists
solder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3544276A
Other languages
English (en)
Other versions
JPS5344346B2 (ja
Inventor
Katsushige Tsukada
Nobuyuki Hayashi
Hideo Yamada
Toshiaki Ishimaru
Hajime Kakumaru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP3544276A priority Critical patent/JPS52117985A/ja
Priority to US05/782,378 priority patent/US4272607A/en
Priority to DE2714218A priority patent/DE2714218C3/de
Priority to FR7709586A priority patent/FR2346743A1/fr
Publication of JPS52117985A publication Critical patent/JPS52117985A/ja
Publication of JPS5344346B2 publication Critical patent/JPS5344346B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP3544276A 1976-03-30 1976-03-30 Photosensitive polymer composition Granted JPS52117985A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP3544276A JPS52117985A (en) 1976-03-30 1976-03-30 Photosensitive polymer composition
US05/782,378 US4272607A (en) 1976-03-30 1977-03-29 Photosensitive resin composition
DE2714218A DE2714218C3 (de) 1976-03-30 1977-03-30 Lichthärtbare Masse
FR7709586A FR2346743A1 (fr) 1976-03-30 1977-03-30 Composition de resine photosensible

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3544276A JPS52117985A (en) 1976-03-30 1976-03-30 Photosensitive polymer composition

Publications (2)

Publication Number Publication Date
JPS52117985A true JPS52117985A (en) 1977-10-03
JPS5344346B2 JPS5344346B2 (ja) 1978-11-28

Family

ID=12441942

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3544276A Granted JPS52117985A (en) 1976-03-30 1976-03-30 Photosensitive polymer composition

Country Status (4)

Country Link
US (1) US4272607A (ja)
JP (1) JPS52117985A (ja)
DE (1) DE2714218C3 (ja)
FR (1) FR2346743A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6076519A (ja) * 1983-10-03 1985-05-01 Uchiyama Mfg Corp 加硫可能なアクリルエラストマ−の製造方法
JPH03200967A (ja) * 1989-09-14 1991-09-02 Toppan Printing Co Ltd 感光性樹脂組成物
US5196296A (en) * 1989-10-06 1993-03-23 Nippon Steel Corporation Epoxy acrylate resins and photosensitive resin compositions therefrom
US8847595B2 (en) 2010-05-18 2014-09-30 Bruker Biospin Ag Temperature control device for an NMR sample tube

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO159729C (no) * 1978-11-01 1989-02-01 Coates Brothers & Co Fremgangsmaate for fremstilling av et moenster av loddemetall paa et lag elektrisk ledende metall baaret av et ikke-ledende underlag.
JPS5764734A (en) * 1980-10-08 1982-04-20 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element
US4438190A (en) * 1981-03-04 1984-03-20 Hitachi Chemical Company, Ltd. Photosensitive resin composition containing unsaturated monomers and unsaturated phosphates
DE3120052A1 (de) * 1981-05-20 1982-12-09 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und damit hergestelltes kopiermaterial
JPS58142894U (ja) * 1982-03-19 1983-09-26 松下電器産業株式会社 複合調理器
JPS6019193U (ja) * 1983-07-15 1985-02-08 松下電器産業株式会社 高周波加熱装置
JPS6032292A (ja) * 1983-08-02 1985-02-19 松下電器産業株式会社 高周波加熱装置
US4882245A (en) * 1985-10-28 1989-11-21 International Business Machines Corporation Photoresist composition and printed circuit boards and packages made therewith
DE3833437A1 (de) * 1988-10-01 1990-04-05 Basf Ag Strahlungsempfindliche gemische und deren verwendung
US6303278B1 (en) 1997-01-31 2001-10-16 Cuptronic Ab Method of applying metal layers in distinct patterns
SE508280C2 (sv) * 1997-01-31 1998-09-21 Cuptronic Ab Förfarande för att öka vidhäftningsförmågan hos ledande material till ytskikt av polymermaterial
ATE496875T1 (de) * 2007-10-29 2011-02-15 Sika Technology Ag Dispergiermittel für hydraulisch abbindende systeme
EP2065350B1 (de) * 2007-10-29 2011-02-23 Sika Technology AG Dispergiermittel für hydraulisch abbindende Systeme
CN103649788B (zh) * 2012-06-08 2017-05-10 Dic株式会社 滤色器用有机颜料组合物、其制造方法以及滤色器

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE903529C (de) * 1951-09-01 1954-02-08 Kalle & Co Ag Lichtempfindliche Schichten
JPS5121336B1 (ja) * 1970-12-29 1976-07-01
US3795640A (en) * 1971-01-07 1974-03-05 Powers Chemco Inc Furfuryl,allyl and methylol acrylamide esters of polymeric acids
US3738973A (en) * 1971-01-07 1973-06-12 Powers Chemco Inc Furoic acid esters of hydroxycontaining polymers
US3881935A (en) * 1971-01-07 1975-05-06 Powers Chemco Inc Photosensitive polymer composition
JPS5018401B1 (ja) * 1971-06-23 1975-06-28
US3859099A (en) * 1972-12-22 1975-01-07 Eastman Kodak Co Positive plate incorporating diazoquinone
US4025348A (en) * 1974-05-10 1977-05-24 Hitachi Chemical Company, Ltd. Photosensitive resin compositions
GB1516847A (en) * 1974-11-12 1978-07-05 Agfa Gevaert Free-radical photographic material

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6076519A (ja) * 1983-10-03 1985-05-01 Uchiyama Mfg Corp 加硫可能なアクリルエラストマ−の製造方法
JPH0421688B2 (ja) * 1983-10-03 1992-04-13 Uchama Kogyo Kk
JPH03200967A (ja) * 1989-09-14 1991-09-02 Toppan Printing Co Ltd 感光性樹脂組成物
US5196296A (en) * 1989-10-06 1993-03-23 Nippon Steel Corporation Epoxy acrylate resins and photosensitive resin compositions therefrom
US8847595B2 (en) 2010-05-18 2014-09-30 Bruker Biospin Ag Temperature control device for an NMR sample tube

Also Published As

Publication number Publication date
DE2714218A1 (de) 1977-10-27
DE2714218B2 (de) 1979-08-23
FR2346743B1 (ja) 1981-01-02
US4272607A (en) 1981-06-09
JPS5344346B2 (ja) 1978-11-28
DE2714218C3 (de) 1980-04-30
FR2346743A1 (fr) 1977-10-28

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