JPS5158072A - Handotaisochinoseizohoho - Google Patents

Handotaisochinoseizohoho

Info

Publication number
JPS5158072A
JPS5158072A JP49132983A JP13298374A JPS5158072A JP S5158072 A JPS5158072 A JP S5158072A JP 49132983 A JP49132983 A JP 49132983A JP 13298374 A JP13298374 A JP 13298374A JP S5158072 A JPS5158072 A JP S5158072A
Authority
JP
Japan
Prior art keywords
handotaisochinoseizohoho
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49132983A
Other languages
English (en)
Japanese (ja)
Inventor
Takashi Oosone
Satoru Kuroda
Kazuhiko Tsuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP49132983A priority Critical patent/JPS5158072A/ja
Publication of JPS5158072A publication Critical patent/JPS5158072A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)
JP49132983A 1974-11-18 1974-11-18 Handotaisochinoseizohoho Pending JPS5158072A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP49132983A JPS5158072A (en) 1974-11-18 1974-11-18 Handotaisochinoseizohoho

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP49132983A JPS5158072A (en) 1974-11-18 1974-11-18 Handotaisochinoseizohoho

Publications (1)

Publication Number Publication Date
JPS5158072A true JPS5158072A (en) 1976-05-21

Family

ID=15094032

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49132983A Pending JPS5158072A (en) 1974-11-18 1974-11-18 Handotaisochinoseizohoho

Country Status (1)

Country Link
JP (1) JPS5158072A (enrdf_load_stackoverflow)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54150080A (en) * 1978-05-17 1979-11-24 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS55140229A (en) * 1979-04-20 1980-11-01 Hitachi Ltd Method for formation of fine pattern
JPS564236A (en) * 1979-06-25 1981-01-17 Nec Corp Manufacture of photoresist film pattern
JPS5680130A (en) * 1979-12-05 1981-07-01 Toshiba Corp Manufacture of semiconductor device
JPS5680133A (en) * 1979-12-06 1981-07-01 Chiyou Lsi Gijutsu Kenkyu Kumiai Formation of pattern
JPS5694738A (en) * 1979-12-28 1981-07-31 Fujitsu Ltd Manufacturing method of semiconductor device
JPS57136321A (en) * 1981-02-18 1982-08-23 Hitachi Ltd Manufacture of resist stencil mask for lift-off
JPS5812328A (ja) * 1981-07-16 1983-01-24 Fujitsu Ltd 半導体装置の製造方法
JPS5851515A (ja) * 1981-09-22 1983-03-26 Fujitsu Ltd レジスト膜の露光方法
JPS58149045A (ja) * 1982-02-26 1983-09-05 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 光学的リソグラフイ方法
JPS596540A (ja) * 1982-07-05 1984-01-13 Toshiba Corp 半導体装置の製造方法
JPS59154027A (ja) * 1983-02-21 1984-09-03 Mitsubishi Electric Corp 金属パタ−ンの形成方法
JPS6199351A (ja) * 1984-10-19 1986-05-17 Sumitomo Chem Co Ltd 配線パタ−ン形成方法
JPH01243521A (ja) * 1988-03-25 1989-09-28 Sony Corp レジスト膜の露光方法
JPH0346331A (ja) * 1989-07-14 1991-02-27 Oki Electric Ind Co Ltd 配線パターンの形成方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498182A (enrdf_load_stackoverflow) * 1972-05-10 1974-01-24

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS498182A (enrdf_load_stackoverflow) * 1972-05-10 1974-01-24

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54150080A (en) * 1978-05-17 1979-11-24 Matsushita Electric Ind Co Ltd Manufacture of semiconductor device
JPS55140229A (en) * 1979-04-20 1980-11-01 Hitachi Ltd Method for formation of fine pattern
JPS564236A (en) * 1979-06-25 1981-01-17 Nec Corp Manufacture of photoresist film pattern
JPS5680130A (en) * 1979-12-05 1981-07-01 Toshiba Corp Manufacture of semiconductor device
JPS5680133A (en) * 1979-12-06 1981-07-01 Chiyou Lsi Gijutsu Kenkyu Kumiai Formation of pattern
JPS5694738A (en) * 1979-12-28 1981-07-31 Fujitsu Ltd Manufacturing method of semiconductor device
JPS57136321A (en) * 1981-02-18 1982-08-23 Hitachi Ltd Manufacture of resist stencil mask for lift-off
JPS5812328A (ja) * 1981-07-16 1983-01-24 Fujitsu Ltd 半導体装置の製造方法
JPS5851515A (ja) * 1981-09-22 1983-03-26 Fujitsu Ltd レジスト膜の露光方法
JPS58149045A (ja) * 1982-02-26 1983-09-05 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 光学的リソグラフイ方法
JPS596540A (ja) * 1982-07-05 1984-01-13 Toshiba Corp 半導体装置の製造方法
JPS59154027A (ja) * 1983-02-21 1984-09-03 Mitsubishi Electric Corp 金属パタ−ンの形成方法
JPS6199351A (ja) * 1984-10-19 1986-05-17 Sumitomo Chem Co Ltd 配線パタ−ン形成方法
JPH01243521A (ja) * 1988-03-25 1989-09-28 Sony Corp レジスト膜の露光方法
JPH0346331A (ja) * 1989-07-14 1991-02-27 Oki Electric Ind Co Ltd 配線パターンの形成方法

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