JPS5153539A - Hikarijugoseisoseibutsuoyobi hikarijugohoho - Google Patents

Hikarijugoseisoseibutsuoyobi hikarijugohoho

Info

Publication number
JPS5153539A
JPS5153539A JP49114623A JP11462374A JPS5153539A JP S5153539 A JPS5153539 A JP S5153539A JP 49114623 A JP49114623 A JP 49114623A JP 11462374 A JP11462374 A JP 11462374A JP S5153539 A JPS5153539 A JP S5153539A
Authority
JP
Japan
Prior art keywords
hikarijugoseisoseibutsuoyobi
hikarijugohoho
hikarijugoseisoseibutsuoyobi hikarijugohoho
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP49114623A
Other languages
English (en)
Other versions
JPS525528B2 (ja
Inventor
Danieru Makuginisu Binsento
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SCM Corp
Original Assignee
SCM Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to US00346351A priority Critical patent/US3847771A/en
Priority to US346350A priority patent/US3915824A/en
Priority to CA195,828A priority patent/CA1020904A/en
Priority to US485594A priority patent/US3878075A/en
Application filed by SCM Corp filed Critical SCM Corp
Priority to JP49114623A priority patent/JPS5153539A/ja
Publication of JPS5153539A publication Critical patent/JPS5153539A/ja
Publication of JPS525528B2 publication Critical patent/JPS525528B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/10—Block or graft copolymers containing polysiloxane sequences
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0486—Operating the coating or treatment in a controlled atmosphere
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065—After-treatment
    • B05D3/067—Curing or cross-linking the coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S525/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S525/922—Polyepoxide polymer having been reacted to yield terminal ethylenic unsaturation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
JP49114623A 1973-03-30 1974-10-04 Hikarijugoseisoseibutsuoyobi hikarijugohoho Granted JPS5153539A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US00346351A US3847771A (en) 1973-03-30 1973-03-30 Uv and laser curing of pigmented polymerizable binders
US346350A US3915824A (en) 1973-03-30 1973-03-30 Uv and laser curing of the polymerizable binder
CA195,828A CA1020904A (en) 1973-03-30 1974-03-25 Uv and laser curing of the polymerizable binder
US485594A US3878075A (en) 1973-03-30 1974-07-03 Photopolymerization of pigmented binders using combinations of organic carbonyls and halogenated naphthalenes
JP49114623A JPS5153539A (en) 1973-03-30 1974-10-04 Hikarijugoseisoseibutsuoyobi hikarijugohoho

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US00346351A US3847771A (en) 1973-03-30 1973-03-30 Uv and laser curing of pigmented polymerizable binders
US346350A US3915824A (en) 1973-03-30 1973-03-30 Uv and laser curing of the polymerizable binder
JP49114623A JPS5153539A (en) 1973-03-30 1974-10-04 Hikarijugoseisoseibutsuoyobi hikarijugohoho

Publications (2)

Publication Number Publication Date
JPS5153539A true JPS5153539A (en) 1976-05-12
JPS525528B2 JPS525528B2 (ja) 1977-02-15

Family

ID=27312779

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49114623A Granted JPS5153539A (en) 1973-03-30 1974-10-04 Hikarijugoseisoseibutsuoyobi hikarijugohoho

Country Status (3)

Country Link
US (2) US3915824A (ja)
JP (1) JPS5153539A (ja)
CA (1) CA1020904A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54100483A (en) * 1977-12-31 1979-08-08 Basf Ag Photoinitiator and organic halogen compounddcontaining photopolymerizable coating material * recording material

Families Citing this family (80)

* Cited by examiner, † Cited by third party
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US4056665A (en) * 1972-10-26 1977-11-01 Owens-Illinois, Inc. Composition and process
US4083725A (en) * 1973-06-02 1978-04-11 Mitsubishi Chemical Industries Ltd. Photosensitive composition
NL7309060A (ja) * 1973-06-29 1974-12-31
GB1451623A (en) * 1973-10-01 1976-10-06 Mullard Ltd Method of prov8ding a patterned layer of silicon-containing oxide on a substrate
DE2352272C3 (de) * 1973-10-18 1979-07-19 Teroson Gmbh, 6900 Heidelberg Wärmeveraetzbare Dichtungsmassen
US4072592A (en) * 1974-05-20 1978-02-07 Mobil Oil Corporation Radiation curable coating
US4315998A (en) * 1974-06-12 1982-02-16 Research Corporation Polymer-bound photosensitizing catalysts
US4113593A (en) * 1974-12-10 1978-09-12 Basf Aktiengesellschaft Benzophenone-containing photopolymerizable binders for printing inks and coating compositions
GB1538436A (en) * 1975-05-12 1979-01-17 Ucb Sa Halogenated photopolymerisable compositions
GB1538211A (en) * 1975-05-12 1979-01-10 Ucb Sa Halogenated photopolymerisable adhesives
US4052280A (en) * 1975-11-06 1977-10-04 Scm Corporation Uv curing of polymerizable binders
US4064026A (en) * 1976-04-12 1977-12-20 Mobil Oil Corporation Polyepoxide ether polyacrylate mixtures
US4039720A (en) * 1976-05-03 1977-08-02 Ppg Industries, Inc. Laminated windshield with improved innerlayer
US4229517A (en) * 1976-11-13 1980-10-21 E. I. Du Pont De Nemours And Company Dot-etchable photopolymerizable elements
US4054719A (en) * 1976-11-23 1977-10-18 American Cyanamid Company Phenacyl ester photosensitizers for radiation-curable coatings
JPS6052183B2 (ja) * 1977-02-23 1985-11-18 三菱レイヨン株式会社 塗料組成物
US4168981A (en) * 1977-04-14 1979-09-25 E. I. Du Pont De Nemours And Company Bis(substituted amino)sulfides as reversible inhibitor sources for photopolymerization
EP0002321B1 (en) * 1977-11-29 1981-10-28 Bexford Limited Photopolymerisable elements and a process for the production of printing plates therefrom
JPS54139527A (en) * 1978-04-21 1979-10-30 Mamiya Camera Diaphragm mechanism for singleelens reflex camera
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
JPS5590516A (en) * 1978-12-28 1980-07-09 Mitsubishi Rayon Co Ltd Coating composition with excellent functionality
US4282309A (en) * 1979-01-24 1981-08-04 Agfa-Gevaert, N.V. Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer
US4229274A (en) * 1979-02-26 1980-10-21 Ppg Industries, Inc. Ultraviolet light curable compositions for producing coatings of low gloss
US4483759A (en) * 1982-07-02 1984-11-20 Thermedics, Inc. Actinic radiation cured polyurethane acrylic copolymer
US4533975A (en) * 1983-12-27 1985-08-06 North American Philips Corporation Radiation hardenable coating and electronic components coated therewith
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EP0202803A3 (en) * 1985-05-14 1987-06-03 Commonwealth Of Australia Department Of Industry Technology And Commerce Laser curing of coatings and inks
US4983419A (en) * 1988-08-05 1991-01-08 Siemens Aktiengesellschaft Method for generating thin layers on a silicone base
US5153323A (en) * 1988-09-07 1992-10-06 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a photoinitiator moiety
US5230982A (en) * 1989-03-09 1993-07-27 The Mead Corporation Photoinitiator compositions containing disulfides and photohardenable compositions containing the same
GB9123070D0 (en) † 1991-10-30 1991-12-18 Domino Printing Sciences Plc Ink
JP3277633B2 (ja) * 1992-08-26 2002-04-22 株式会社スリーボンド 電気伝導性およびイオン伝導性の網目状重合組成物とその調整方法
JPH08509642A (ja) * 1993-04-28 1996-10-15 フォーカル，インコーポレイテッド 管腔内フォトサーモフォーミングの装置およびその方法
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
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US5721287A (en) 1993-08-05 1998-02-24 Kimberly-Clark Worldwide, Inc. Method of mutating a colorant by irradiation
US5773182A (en) 1993-08-05 1998-06-30 Kimberly-Clark Worldwide, Inc. Method of light stabilizing a colorant
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
US5700850A (en) 1993-08-05 1997-12-23 Kimberly-Clark Worldwide Colorant compositions and colorant stabilizers
US5681380A (en) 1995-06-05 1997-10-28 Kimberly-Clark Worldwide, Inc. Ink for ink jet printers
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US5643356A (en) 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
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US5739174A (en) * 1993-12-15 1998-04-14 Minnesota Mining And Manufacturing Company Epoxysilicone photocurable composition comprising a sulfolene or isatin photosensitizer
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US5798015A (en) 1995-06-05 1998-08-25 Kimberly-Clark Worldwide, Inc. Method of laminating a structure with adhesive containing a photoreactor composition
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US6368395B1 (en) 1999-05-24 2002-04-09 Kimberly-Clark Worldwide, Inc. Subphthalocyanine colorants, ink compositions, and method of making the same
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US9657191B2 (en) 2014-01-03 2017-05-23 Dur-A-Flex, Inc. Low odor reactive methacrylate composition for fast room temperature curing floor coating formulations
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US3326710A (en) * 1964-04-16 1967-06-20 Sherwin Williams Co Method of curing polyester compositions and coatings containing synergistic combination of photosensitizers and compositions thereof
GB1090142A (en) * 1965-02-26 1967-11-08 Agfa Gevaert Nv Photochemical insolubilisation of polymers
US3615452A (en) * 1968-09-09 1971-10-26 Gaf Corp Dye-sensitized photopolymerization process
BE759041A (fr) * 1969-11-18 1971-05-17 Du Pont Compositions photopolymerisables contenant des aminophenylcetones et des adjuvants
US3637375A (en) * 1970-05-25 1972-01-25 Steven Levinos Photopolymerization utilizing diazosulfonates and photoreducible dyes
US3673140A (en) * 1971-01-06 1972-06-27 Inmont Corp Actinic radiation curing compositions and method of coating and printing using same
US3787212A (en) * 1972-08-04 1974-01-22 Monsanto Co Polymeric photosensitive compositions and methods using same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54100483A (en) * 1977-12-31 1979-08-08 Basf Ag Photoinitiator and organic halogen compounddcontaining photopolymerizable coating material * recording material
JPS6331484B2 (ja) * 1977-12-31 1988-06-24 Basf Ag

Also Published As

Publication number Publication date
JPS525528B2 (ja) 1977-02-15
USB346350I5 (ja) 1975-01-28
US3847771A (en) 1974-11-12
CA1020904A (en) 1977-11-15
US3915824A (en) 1975-10-28

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