JPS51103880A - - Google Patents

Info

Publication number
JPS51103880A
JPS51103880A JP51011800A JP1180076A JPS51103880A JP S51103880 A JPS51103880 A JP S51103880A JP 51011800 A JP51011800 A JP 51011800A JP 1180076 A JP1180076 A JP 1180076A JP S51103880 A JPS51103880 A JP S51103880A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP51011800A
Inventor
Aaru Andaason Emitsuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of JPS51103880A publication Critical patent/JPS51103880A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/006—Apparatus
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/169—Vacuum deposition, e.g. including molecular beam epitaxy
JP51011800A 1975-02-06 1976-02-05 Pending JPS51103880A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US54771775A 1975-02-06 1975-02-06

Publications (1)

Publication Number Publication Date
JPS51103880A true JPS51103880A (ja) 1976-09-14

Family

ID=24185849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51011800A Pending JPS51103880A (ja) 1975-02-06 1976-02-05

Country Status (6)

Country Link
US (1) US4061800A (ja)
JP (1) JPS51103880A (ja)
DE (1) DE2604295B2 (ja)
FR (1) FR2299907A1 (ja)
GB (1) GB1543442A (ja)
NL (1) NL7601187A (ja)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0008807A1 (de) * 1978-09-13 1980-03-19 Elektroschmelzwerk Kempten GmbH Vorrichtung und Verfahren zum diskontinuierlichen oder kontinuierlichen thermischen Bedampfen von Formteilen oder Bandmaterial
US4421786A (en) * 1981-01-23 1983-12-20 Western Electric Co. Chemical vapor deposition reactor for silicon epitaxial processes
US4390571A (en) * 1981-06-30 1983-06-28 International Business Machines Corporation Boatless point source evaporation method
CH651592A5 (de) * 1982-10-26 1985-09-30 Balzers Hochvakuum Dampfquelle fuer vakuumbedampfungsanlagen.
FR2549857B1 (fr) * 1983-07-26 1985-10-04 Allovon Michel Dispositif d'evaporation sous vide
CH654596A5 (de) * 1983-09-05 1986-02-28 Balzers Hochvakuum Verdampferzelle.
JPS60251273A (ja) * 1984-05-28 1985-12-11 Mitsubishi Heavy Ind Ltd 真空蒸発装置の蒸発量制御方法
US4679007A (en) * 1985-05-20 1987-07-07 Advanced Energy, Inc. Matching circuit for delivering radio frequency electromagnetic energy to a variable impedance load
US4876114A (en) * 1987-09-23 1989-10-24 International Business Machines Corporation Process for the self fractionation deposition of a metallic layer on a workpiece
US5031229A (en) * 1989-09-13 1991-07-09 Chow Loren A Deposition heaters
US5157240A (en) * 1989-09-13 1992-10-20 Chow Loren A Deposition heaters
DE4222500A1 (de) * 1992-07-09 1994-01-13 Heinz Dr Selic Verfahren zur Herstellung von Bauteilen aus Metall und/oder von Bauteilen mit dichtereduzierter Metallbeschichtung im Vakuum, insbesondere im Weltall
US5695568A (en) * 1993-04-05 1997-12-09 Applied Materials, Inc. Chemical vapor deposition chamber
JP3336747B2 (ja) * 1994-06-09 2002-10-21 ソニー株式会社 絶縁膜の形成方法、並びに半導体装置の作製方法及び半導体装置
US20040035360A1 (en) * 2002-05-17 2004-02-26 Semiconductor Energy Laboratory Co., Ltd. Manufacturing apparatus
US6797337B2 (en) * 2002-08-19 2004-09-28 Micron Technology, Inc. Method for delivering precursors
US20050051097A1 (en) * 2003-09-08 2005-03-10 Jan Koninckx Covering assembly for crucible used for evaporation of raw materials
JP4787170B2 (ja) * 2004-10-21 2011-10-05 双葉電子工業株式会社 蒸発源装置
JP2007039791A (ja) * 2005-06-29 2007-02-15 Fujifilm Corp リフレクタ、それを備えた加熱用るつぼおよび放射線像変換パネルの製造方法
DE102005030862B4 (de) * 2005-07-01 2009-12-24 Sintec Keramik Gmbh Erstbenetzungshilfsmaterial für einen Verdampferkörper, seine Verwendung zum Herrichten der Verdampferfläche eines Verdampferkörpers und ein elektrisch beheizbarer keramischer Verdampferkörper
US20080241367A1 (en) * 2007-03-29 2008-10-02 Intevac Corporation Apparatus for and method of applying lubricant coatings to magnetic disks via a vapor flow path including a selectively opened and closed shutter
US20090047417A1 (en) * 2007-03-30 2009-02-19 Barnes Michael S Method and system for vapor phase application of lubricant in disk media manufacturing process
US20100285218A1 (en) * 2008-12-18 2010-11-11 Veeco Instruments Inc. Linear Deposition Source
US20100159132A1 (en) * 2008-12-18 2010-06-24 Veeco Instruments, Inc. Linear Deposition Source
WO2011065998A1 (en) * 2008-12-18 2011-06-03 Veeco Instruments Inc. Linear deposition source
CN104018121A (zh) * 2014-05-14 2014-09-03 深圳市华星光电技术有限公司 防止高温金属材料泄漏的加热容器及其制造方法
CN105177507B (zh) * 2015-09-08 2017-08-11 京东方科技集团股份有限公司 蒸镀坩埚及蒸镀设备
US11404254B2 (en) * 2018-09-19 2022-08-02 Varian Semiconductor Equipment Associates, Inc. Insertable target holder for solid dopant materials
US11170973B2 (en) 2019-10-09 2021-11-09 Applied Materials, Inc. Temperature control for insertable target holder for solid dopant materials
US11854760B2 (en) 2021-06-21 2023-12-26 Applied Materials, Inc. Crucible design for liquid metal in an ion source

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4029775Y1 (ja) * 1965-06-11 1965-10-18

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2440135A (en) * 1944-08-04 1948-04-20 Alexander Paul Method of and apparatus for depositing substances by thermal evaporation in vacuum chambers
US2584660A (en) * 1949-09-24 1952-02-05 Eastman Kodak Co Vacuum coating process and apparatus therefor
US2910039A (en) * 1956-06-21 1959-10-27 Nat Res Corp Apparatus for coating metal onto metal by vaporizing the coating
US3281517A (en) * 1963-11-19 1966-10-25 Melpar Inc Vacuum furnace
US3446936A (en) * 1966-01-03 1969-05-27 Sperry Rand Corp Evaporant source
US3574650A (en) * 1969-03-13 1971-04-13 United Aircraft Corp Vacuum vapor deposition with control of elevation of metal melt
GB1263582A (en) * 1969-09-19 1972-02-09 Barr & Stroud Ltd Improvements in or relating to thin film deposition
US3690933A (en) * 1970-05-21 1972-09-12 Republic Steel Corp Apparatus and method for continuously condensing metal vapor upon a substrate
JP2827941B2 (ja) * 1994-12-27 1998-11-25 ヤマハ株式会社 フィードサーチ装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4029775Y1 (ja) * 1965-06-11 1965-10-18

Also Published As

Publication number Publication date
DE2604295C3 (ja) 1978-07-13
DE2604295B2 (de) 1977-11-17
FR2299907A1 (fr) 1976-09-03
US4061800A (en) 1977-12-06
DE2604295A1 (de) 1976-08-26
GB1543442A (en) 1979-04-04
NL7601187A (nl) 1976-08-10

Similar Documents

Publication Publication Date Title
JPS575281B2 (ja)
JPS51103880A (ja)
JPS51108923A (ja)
JPS5251918U (ja)
JPS5239256Y2 (ja)
JPS5635053Y2 (ja)
DE2533823A1 (ja)
JPS51126817U (ja)
JPS5230758U (ja)
JPS5272232U (ja)
CH591719B5 (ja)
CH596827A5 (ja)
CH593359A5 (ja)
CH592365A5 (ja)
CH594166A5 (ja)
CH594456A5 (ja)
CH591022A5 (ja)
CH583885A5 (ja)
CH583815A (ja)
CH582505A5 (ja)
BG23133A1 (ja)
CH595193A5 (ja)
BG22886A1 (ja)
CH595825A5 (ja)
BG22160A1 (ja)