JPS5087576A - - Google Patents

Info

Publication number
JPS5087576A
JPS5087576A JP49135641A JP13564174A JPS5087576A JP S5087576 A JPS5087576 A JP S5087576A JP 49135641 A JP49135641 A JP 49135641A JP 13564174 A JP13564174 A JP 13564174A JP S5087576 A JPS5087576 A JP S5087576A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP49135641A
Other languages
Japanese (ja)
Other versions
JPS5325718B2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5087576A publication Critical patent/JPS5087576A/ja
Publication of JPS5325718B2 publication Critical patent/JPS5325718B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP13564174A 1973-12-03 1974-11-27 Expired JPS5325718B2 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00421020A US3853091A (en) 1973-12-03 1973-12-03 Thin film coating apparatus

Publications (2)

Publication Number Publication Date
JPS5087576A true JPS5087576A (enrdf_load_stackoverflow) 1975-07-14
JPS5325718B2 JPS5325718B2 (enrdf_load_stackoverflow) 1978-07-28

Family

ID=23668864

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13564174A Expired JPS5325718B2 (enrdf_load_stackoverflow) 1973-12-03 1974-11-27

Country Status (11)

Country Link
US (1) US3853091A (enrdf_load_stackoverflow)
JP (1) JPS5325718B2 (enrdf_load_stackoverflow)
CA (1) CA1035255A (enrdf_load_stackoverflow)
CH (1) CH606479A5 (enrdf_load_stackoverflow)
DE (1) DE2448023B2 (enrdf_load_stackoverflow)
ES (1) ES432508A1 (enrdf_load_stackoverflow)
FR (1) FR2253270B1 (enrdf_load_stackoverflow)
GB (1) GB1474927A (enrdf_load_stackoverflow)
IT (1) IT1022786B (enrdf_load_stackoverflow)
NL (1) NL7415450A (enrdf_load_stackoverflow)
SE (1) SE397435B (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5266756U (enrdf_load_stackoverflow) * 1975-11-13 1977-05-17
JPS5727032A (en) * 1980-07-25 1982-02-13 Hitachi Ltd Plasma cvd device
JP2002532626A (ja) * 1998-12-15 2002-10-02 ユナキス・バルツェルス・アクチェンゲゼルシャフト 遊星システム工作物キャリヤおよび工作物の表面処理方法

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH580990A5 (enrdf_load_stackoverflow) * 1974-03-04 1976-10-29 Ebauches Sa
US4010710A (en) * 1974-09-20 1977-03-08 Rockwell International Corporation Apparatus for coating substrates
US4022939A (en) * 1975-12-18 1977-05-10 Western Electric Company, Inc. Synchronous shielding in vacuum deposition system
US3983838A (en) * 1975-12-31 1976-10-05 International Business Machines Corporation Planetary evaporator
US4222345A (en) * 1978-11-30 1980-09-16 Optical Coating Laboratory, Inc. Vacuum coating apparatus with rotary motion assembly
US4241698A (en) * 1979-02-09 1980-12-30 Mca Discovision, Inc. Vacuum evaporation system for the deposition of a thin evaporated layer having a high degree of uniformity
DE2917841A1 (de) * 1979-05-03 1980-11-13 Leybold Heraeus Gmbh & Co Kg Verdampfer fuer vakuumaufdampfanlagen
US4284033A (en) * 1979-10-31 1981-08-18 Rca Corporation Means to orbit and rotate target wafers supported on planet member
DE3306870A1 (de) * 1983-02-26 1984-08-30 Leybold-Heraeus GmbH, 5000 Köln Vorrichtung zum herstellen von schichten mit rotationssymmetrischem dickenprofil durch katodenzerstaeubung
DE3310044A1 (de) * 1983-03-19 1984-09-20 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren und anordnung zur beschichtung eines substrates
DE3422718A1 (de) * 1984-06-19 1986-01-09 Plasmainvent AG, Zug Vakuum-plasma-beschichtungsanlage
US4640846A (en) * 1984-09-25 1987-02-03 Yue Kuo Semiconductor spin coating method
JPS61227165A (ja) * 1985-03-29 1986-10-09 Mitsubishi Electric Corp 蒸着装置
US4662310A (en) * 1986-07-09 1987-05-05 Deco Tools, Inc. Robotic paint masking machine
DE3702775A1 (de) * 1987-01-30 1988-08-11 Leybold Ag Vorrichtung zum quasi-kontinuierlichen behandeln von substraten
DE3705592A1 (de) * 1987-02-21 1988-09-01 Convac Gmbh Geraete Zur Halble Vorrichtung zur duennen beschichtung (belackung) scheibenfoermiger substrate fuer elektronische anwendungszwecke, bspw. leiterplatten, compact disks etc.
DE3705945A1 (de) * 1987-02-25 1988-09-08 Krupp Corpoplast Masch Vorrichtung zum herstellen von hohlkoerpern aus thermoplastischem kunststoff
DE3705946A1 (de) * 1987-02-25 1988-09-08 Krupp Corpoplast Masch Vorrichtung zum behandeln von formlingen aus kunststoff
US5002011A (en) * 1987-04-14 1991-03-26 Kabushiki Kaisha Toshiba Vapor deposition apparatus
JPH01143211A (ja) * 1987-11-27 1989-06-05 Takatori Haitetsuku:Kk ウエハーに対する保護テープの貼付け切り抜き方法および装置
EP0362418A1 (en) * 1988-10-03 1990-04-11 International Business Machines Corporation Improved method and system for the angled exposition of a surface portion to an emission impinging obliquely thereon, and semiconductor wafers having facets exposed according to said method
DE4025659A1 (de) * 1990-08-14 1992-02-20 Leybold Ag Umlaufraedergetriebe mit einem raedersatz, insbesondere fuer vorrichtungen zum beschichten von substraten
JPH0828333B2 (ja) * 1992-11-30 1996-03-21 株式会社半導体プロセス研究所 半導体装置の製造装置
US5472592A (en) * 1994-07-19 1995-12-05 American Plating Systems Electrolytic plating apparatus and method
GB2291889B (en) * 1994-07-27 1998-02-25 Gec Marconi Avionics Holdings Depositing coatings of materials on a substrate
FR2733253B1 (fr) * 1995-04-24 1997-06-13 Commissariat Energie Atomique Dispositif pour deposer un materiau par evaporation sur des substrats de grande surface
US5702532A (en) * 1995-05-31 1997-12-30 Hughes Aircraft Company MOCVD reactor system for indium antimonide epitaxial material
US5776256A (en) * 1996-10-01 1998-07-07 The United States Of America As Represented By The Secretary Of The Air Force Coating chamber planetary gear mirror rotating system
DE19738234C1 (de) * 1997-09-02 1998-10-22 Fraunhofer Ges Forschung Einrichtung zum Aufstäuben von Hartstoffschichten
JPH11200017A (ja) * 1998-01-20 1999-07-27 Nikon Corp 光学薄膜成膜装置およびこの光学薄膜成膜装置により成膜された光学素子
US6203619B1 (en) 1998-10-26 2001-03-20 Symetrix Corporation Multiple station apparatus for liquid source fabrication of thin films
US7081166B2 (en) 1999-12-15 2006-07-25 Unaxis Balzers Aktiengesellschaft Planetary system workpiece support and method for surface treatment of workpieces
US6749764B1 (en) 2000-11-14 2004-06-15 Tru-Si Technologies, Inc. Plasma processing comprising three rotational motions of an article being processed
DE102004027989B4 (de) * 2004-06-09 2007-05-10 Esser, Stefan, Dr.-Ing. Werkstückträgervorrichtung zum Halten von Werkstücken
CN104641016A (zh) * 2012-06-18 2015-05-20 欧瑞康先进科技股份公司 用于定向材料沉积的pvd设备、方法和工件
JP6019310B1 (ja) * 2015-04-16 2016-11-02 ナルックス株式会社 蒸着装置及び蒸着装置による成膜工程を含む製造方法
DE102018126862A1 (de) * 2018-10-26 2020-04-30 Oerlikon Surface Solutions Ag, Pfäffikon Werkstückträgereinrichtung und Beschichtungsanordnung

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3598083A (en) * 1969-10-27 1971-08-10 Varian Associates Complex motion mechanism for thin film coating apparatuses

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2351537A (en) * 1942-03-05 1944-06-13 Spencer Lens Co Apparatus for treating surfaces
US3023727A (en) * 1959-09-10 1962-03-06 Ibm Substrate processing apparatus
US3352282A (en) * 1965-07-23 1967-11-14 Bendix Corp Vacuum deposit device including means to register and manipulate mask and substrate elements

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3598083A (en) * 1969-10-27 1971-08-10 Varian Associates Complex motion mechanism for thin film coating apparatuses

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5266756U (enrdf_load_stackoverflow) * 1975-11-13 1977-05-17
JPS5727032A (en) * 1980-07-25 1982-02-13 Hitachi Ltd Plasma cvd device
JP2002532626A (ja) * 1998-12-15 2002-10-02 ユナキス・バルツェルス・アクチェンゲゼルシャフト 遊星システム工作物キャリヤおよび工作物の表面処理方法
JP2010265552A (ja) * 1998-12-15 2010-11-25 Oerlikon Trading Ag Truebbach 真空処理遊星システム工作物キャリヤ

Also Published As

Publication number Publication date
FR2253270B1 (enrdf_load_stackoverflow) 1977-03-25
GB1474927A (en) 1977-05-25
DE2448023A1 (de) 1975-06-05
ES432508A1 (es) 1977-03-01
NL7415450A (nl) 1975-06-05
FR2253270A1 (enrdf_load_stackoverflow) 1975-06-27
CA1035255A (en) 1978-07-25
IT1022786B (it) 1978-04-20
CH606479A5 (enrdf_load_stackoverflow) 1978-10-31
SE397435B (sv) 1977-10-31
SE7414445L (enrdf_load_stackoverflow) 1975-06-04
DE2448023B2 (de) 1976-11-04
JPS5325718B2 (enrdf_load_stackoverflow) 1978-07-28
US3853091A (en) 1974-12-10

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