JPS5075367A - - Google Patents
Info
- Publication number
- JPS5075367A JPS5075367A JP49123248A JP12324874A JPS5075367A JP S5075367 A JPS5075367 A JP S5075367A JP 49123248 A JP49123248 A JP 49123248A JP 12324874 A JP12324874 A JP 12324874A JP S5075367 A JPS5075367 A JP S5075367A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P30/00—Ion implantation into wafers, substrates or parts of devices
- H10P30/20—Ion implantation into wafers, substrates or parts of devices into semiconductor materials, e.g. for doping
- H10P30/22—Ion implantation into wafers, substrates or parts of devices into semiconductor materials, e.g. for doping using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- H10P76/40—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising inorganic materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/085—Isolated-integrated
Landscapes
- Bipolar Transistors (AREA)
- Element Separation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US409903A US3928081A (en) | 1973-10-26 | 1973-10-26 | Method for fabricating semiconductor devices using composite mask and ion implantation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5075367A true JPS5075367A (https=) | 1975-06-20 |
| JPS5342663B2 JPS5342663B2 (https=) | 1978-11-14 |
Family
ID=23622431
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12324874A Expired JPS5342663B2 (https=) | 1973-10-26 | 1974-10-25 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3928081A (https=) |
| JP (1) | JPS5342663B2 (https=) |
| CA (1) | CA1087322A (https=) |
| DE (1) | DE2450881A1 (https=) |
| FR (1) | FR2249435B1 (https=) |
| GB (1) | GB1457169A (https=) |
| NL (1) | NL7414007A (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5239370A (en) * | 1975-09-22 | 1977-03-26 | Signetics Corp | Method of making semicondudctor devices |
| JPS6353970A (ja) * | 1986-08-22 | 1988-03-08 | Sanken Electric Co Ltd | 半導体装置の製造方法 |
| JPH0271514A (ja) * | 1988-09-06 | 1990-03-12 | Fuji Electric Co Ltd | 半導体装置の製造方法 |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2453134C3 (de) * | 1974-11-08 | 1983-02-10 | Deutsche Itt Industries Gmbh, 7800 Freiburg | Planardiffusionsverfahren |
| US4153487A (en) * | 1974-12-27 | 1979-05-08 | Tokyo Shibaura Electric Co., Ltd. | Method of manufacturing intergrated injection logic semiconductor devices utilizing self-aligned double-diffusion techniques |
| US4151019A (en) * | 1974-12-27 | 1979-04-24 | Tokyo Shibaura Electric Co., Ltd. | Method of manufacturing integrated injection logic semiconductor devices utilizing self-aligned double-diffusion techniques |
| JPS51127682A (en) * | 1975-04-30 | 1976-11-06 | Fujitsu Ltd | Manufacturing process of semiconductor device |
| USRE30282E (en) * | 1976-06-28 | 1980-05-27 | Motorola, Inc. | Double master mask process for integrated circuit manufacture |
| US4110126A (en) * | 1977-08-31 | 1978-08-29 | International Business Machines Corporation | NPN/PNP Fabrication process with improved alignment |
| US4219369A (en) * | 1977-09-30 | 1980-08-26 | Hitachi, Ltd. | Method of making semiconductor integrated circuit device |
| US4215418A (en) * | 1978-06-30 | 1980-07-29 | Trw Inc. | Integrated digital multiplier circuit using current mode logic |
| US4244752A (en) * | 1979-03-06 | 1981-01-13 | Burroughs Corporation | Single mask method of fabricating complementary integrated circuits |
| US4243435A (en) * | 1979-06-22 | 1981-01-06 | International Business Machines Corporation | Bipolar transistor fabrication process with an ion implanted emitter |
| DE2945854A1 (de) * | 1979-11-13 | 1981-05-21 | Deutsche Itt Industries Gmbh, 7800 Freiburg | Ionenimplantationsverfahren |
| JPS56135121A (en) * | 1980-03-27 | 1981-10-22 | Nec Corp | Electronic integration-type flow meter with auxiliary pipe |
| US4335504A (en) * | 1980-09-24 | 1982-06-22 | Rockwell International Corporation | Method of making CMOS devices |
| JPS5786718A (en) * | 1980-11-19 | 1982-05-29 | Ricoh Co Ltd | Integrating flowmeter with electronic auxiliary pipe |
| DE3115029A1 (de) * | 1981-04-14 | 1982-11-04 | Deutsche Itt Industries Gmbh, 7800 Freiburg | "verfahren zur herstellung eines integrierten bipolaren planartransistors" |
| EP0062725B1 (de) * | 1981-04-14 | 1984-09-12 | Deutsche ITT Industries GmbH | Verfahren zum Herstellen eines integrierten Planartransistors |
| DE3136731A1 (de) * | 1981-09-16 | 1983-03-31 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verfahren zum herstellen einer halbleiteranordnung |
| DE3137813A1 (de) * | 1981-09-23 | 1983-03-31 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verfahren zum herstellen einer halbleiteranordnung |
| JPS58127374A (ja) * | 1982-01-25 | 1983-07-29 | Hitachi Ltd | 半導体装置の製造方法 |
| US4450021A (en) * | 1982-02-22 | 1984-05-22 | American Microsystems, Incorporated | Mask diffusion process for forming Zener diode or complementary field effect transistors |
| GB2237445B (en) * | 1989-10-04 | 1994-01-12 | Seagate Microelectron Ltd | A semiconductor device fabrication process |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1150834A (en) * | 1966-10-05 | 1969-05-07 | Rca Corp | Method of fabricating semiconductor devices |
| DE2032838A1 (de) * | 1970-07-02 | 1972-01-13 | Licentia Gmbh | Verfahren zum Herstellen einer Halb leiterzone durch Diffusion |
| US3756861A (en) * | 1972-03-13 | 1973-09-04 | Bell Telephone Labor Inc | Bipolar transistors and method of manufacture |
-
1973
- 1973-10-26 US US409903A patent/US3928081A/en not_active Expired - Lifetime
-
1974
- 1974-10-01 GB GB4261074A patent/GB1457169A/en not_active Expired
- 1974-10-02 CA CA210,560A patent/CA1087322A/en not_active Expired
- 1974-10-25 JP JP12324874A patent/JPS5342663B2/ja not_active Expired
- 1974-10-25 NL NL7414007A patent/NL7414007A/xx not_active Application Discontinuation
- 1974-10-25 FR FR7435903A patent/FR2249435B1/fr not_active Expired
- 1974-10-25 DE DE19742450881 patent/DE2450881A1/de not_active Ceased
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5239370A (en) * | 1975-09-22 | 1977-03-26 | Signetics Corp | Method of making semicondudctor devices |
| JPS6353970A (ja) * | 1986-08-22 | 1988-03-08 | Sanken Electric Co Ltd | 半導体装置の製造方法 |
| JPH0271514A (ja) * | 1988-09-06 | 1990-03-12 | Fuji Electric Co Ltd | 半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2249435B1 (https=) | 1978-06-16 |
| CA1087322A (en) | 1980-10-07 |
| FR2249435A1 (https=) | 1975-05-23 |
| US3928081A (en) | 1975-12-23 |
| DE2450881A1 (de) | 1975-04-30 |
| GB1457169A (en) | 1976-12-01 |
| NL7414007A (nl) | 1975-04-29 |
| JPS5342663B2 (https=) | 1978-11-14 |