JPS5046074A - - Google Patents
Info
- Publication number
- JPS5046074A JPS5046074A JP9630373A JP9630373A JPS5046074A JP S5046074 A JPS5046074 A JP S5046074A JP 9630373 A JP9630373 A JP 9630373A JP 9630373 A JP9630373 A JP 9630373A JP S5046074 A JPS5046074 A JP S5046074A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9630373A JPS5329476B2 (en) | 1973-08-28 | 1973-08-28 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9630373A JPS5329476B2 (en) | 1973-08-28 | 1973-08-28 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5390379A Division JPS5523085A (en) | 1979-04-27 | 1979-04-27 | Production of silicon film |
JP5390479A Division JPS553378A (en) | 1979-04-27 | 1979-04-27 | Production of silicon film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5046074A true JPS5046074A (en) | 1975-04-24 |
JPS5329476B2 JPS5329476B2 (en) | 1978-08-21 |
Family
ID=14161250
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9630373A Expired JPS5329476B2 (en) | 1973-08-28 | 1973-08-28 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5329476B2 (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS51131428A (en) * | 1975-05-12 | 1976-11-15 | Fujitsu Ltd | Method of growing aluminum in gassphase |
JPS5673428A (en) * | 1979-11-21 | 1981-06-18 | Canon Inc | Method of forming film |
JPS5683033A (en) * | 1980-04-18 | 1981-07-07 | Matsushita Electronics Corp | Manufacture of semiconductor device |
JPS5742118A (en) * | 1980-08-27 | 1982-03-09 | Mitsubishi Electric Corp | Plasma cvd device |
JPS5745224A (en) * | 1980-08-29 | 1982-03-15 | Canon Inc | Manufacture of deposited film |
JPS5748226A (en) * | 1980-09-05 | 1982-03-19 | Matsushita Electronics Corp | Plasma processing method and device for the same |
JPS5780715A (en) * | 1980-11-07 | 1982-05-20 | Matsushita Electric Ind Co Ltd | Dc glow discharge device |
JPS57123969A (en) * | 1981-01-26 | 1982-08-02 | Semiconductor Energy Lab Co Ltd | Formation of zinc oxide film by vapor phase method using plasma |
JPS57184213A (en) * | 1981-05-08 | 1982-11-12 | Kokusai Electric Co Ltd | Vapor growth device for semiconductor |
JPS5821323A (en) * | 1981-07-28 | 1983-02-08 | Toshiba Corp | Vapor phase growing unit under vacuum |
JPS58206119A (en) * | 1982-05-27 | 1983-12-01 | Agency Of Ind Science & Technol | Thin-film producing apparatus |
-
1973
- 1973-08-28 JP JP9630373A patent/JPS5329476B2/ja not_active Expired
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5847464B2 (en) * | 1975-05-12 | 1983-10-22 | 富士通株式会社 | Aluminum tree |
JPS51131428A (en) * | 1975-05-12 | 1976-11-15 | Fujitsu Ltd | Method of growing aluminum in gassphase |
JPS5673428A (en) * | 1979-11-21 | 1981-06-18 | Canon Inc | Method of forming film |
JPH0127569B2 (en) * | 1979-11-21 | 1989-05-30 | Canon Kk | |
JPS5683033A (en) * | 1980-04-18 | 1981-07-07 | Matsushita Electronics Corp | Manufacture of semiconductor device |
JPS5742118A (en) * | 1980-08-27 | 1982-03-09 | Mitsubishi Electric Corp | Plasma cvd device |
JPS5745224A (en) * | 1980-08-29 | 1982-03-15 | Canon Inc | Manufacture of deposited film |
JPS5748226A (en) * | 1980-09-05 | 1982-03-19 | Matsushita Electronics Corp | Plasma processing method and device for the same |
JPS5780715A (en) * | 1980-11-07 | 1982-05-20 | Matsushita Electric Ind Co Ltd | Dc glow discharge device |
JPS57123969A (en) * | 1981-01-26 | 1982-08-02 | Semiconductor Energy Lab Co Ltd | Formation of zinc oxide film by vapor phase method using plasma |
JPS57184213A (en) * | 1981-05-08 | 1982-11-12 | Kokusai Electric Co Ltd | Vapor growth device for semiconductor |
JPS5821323A (en) * | 1981-07-28 | 1983-02-08 | Toshiba Corp | Vapor phase growing unit under vacuum |
JPS58206119A (en) * | 1982-05-27 | 1983-12-01 | Agency Of Ind Science & Technol | Thin-film producing apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPS5329476B2 (en) | 1978-08-21 |