JPS50151976A - - Google Patents
Info
- Publication number
- JPS50151976A JPS50151976A JP50052113A JP5211375A JPS50151976A JP S50151976 A JPS50151976 A JP S50151976A JP 50052113 A JP50052113 A JP 50052113A JP 5211375 A JP5211375 A JP 5211375A JP S50151976 A JPS50151976 A JP S50151976A
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/22—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed
- B32B5/24—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer
- B32B5/26—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being a fibrous or filamentary layer another layer next to it also being fibrous or filamentary
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
- B32B2260/02—Composition of the impregnated, bonded or embedded layer
- B32B2260/021—Fibrous or filamentary layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2260/00—Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
- B32B2260/04—Impregnation, embedding, or binder material
- B32B2260/046—Synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2262/00—Composition or structural features of fibres which form a fibrous or filamentary layer or are present as additives
- B32B2262/10—Inorganic fibres
- B32B2262/101—Glass fibres
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Polymerization Catalysts (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Paints Or Removers (AREA)
- Polyethers (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Laminated Bodies (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US46637374A | 1974-05-02 | 1974-05-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS50151976A true JPS50151976A (ja) | 1975-12-06 |
JPS5332831B2 JPS5332831B2 (ja) | 1978-09-11 |
Family
ID=23851505
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5211375A Expired JPS5332831B2 (ja) | 1974-05-02 | 1975-05-01 | |
JP1994978A Pending JPS53124416A (en) | 1974-05-02 | 1978-02-24 | Method of forming image |
JP1994878A Pending JPS53124590A (en) | 1974-05-02 | 1978-02-24 | Cationic polymerization |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1994978A Pending JPS53124416A (en) | 1974-05-02 | 1978-02-24 | Method of forming image |
JP1994878A Pending JPS53124590A (en) | 1974-05-02 | 1978-02-24 | Cationic polymerization |
Country Status (5)
Country | Link |
---|---|
US (1) | US4161405A (ja) |
JP (3) | JPS5332831B2 (ja) |
DE (2) | DE2518749C2 (ja) |
FR (1) | FR2269538B1 (ja) |
GB (1) | GB1518141A (ja) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53124590A (en) * | 1974-05-02 | 1978-10-31 | Gen Electric | Cationic polymerization |
JPS5453181A (en) * | 1977-09-14 | 1979-04-26 | Gen Electric | Photoopolymerization initiator |
JPS5495686A (en) * | 1977-08-05 | 1979-07-28 | Gen Electric | Photocurable composition and curing method |
JP2006008823A (ja) * | 2004-06-25 | 2006-01-12 | Toyo Ink Mfg Co Ltd | 硬化型粘接着材料 |
WO2011040531A1 (ja) | 2009-10-01 | 2011-04-07 | 日立化成工業株式会社 | 有機エレクトロニクス用材料、有機エレクトロニクス素子、有機エレクトロルミネセンス素子、及びそれを用いた表示素子、照明装置、表示装置 |
WO2011132702A1 (ja) | 2010-04-22 | 2011-10-27 | 日立化成工業株式会社 | 有機エレクトロニクス材料、重合開始剤及び熱重合開始剤、インク組成物、有機薄膜及びその製造方法、有機エレクトロニクス素子、有機エレクトロルミネセンス素子、照明装置、表示素子、並びに表示装置 |
WO2014136900A1 (ja) | 2013-03-08 | 2014-09-12 | 日立化成株式会社 | イオン性化合物を含有する処理液、有機エレクトロニクス素子、及び有機エレクトロニクス素子の製造方法 |
WO2022168632A1 (ja) * | 2021-02-03 | 2022-08-11 | サンアプロ株式会社 | 光酸発生剤及びフォトリソグラフィー用樹脂組成物 |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4291114A (en) * | 1978-10-18 | 1981-09-22 | Minnesota Mining And Manufacturing Co. | Imageable, composite-dry transfer sheet and process of using same |
FR2441634A1 (fr) * | 1978-11-14 | 1980-06-13 | Thomson Csf | Resine a cycle thietane reticulable par irradiation electronique ou photonique et son utilisation pour la fabrication de composants electroniques et de couches de protection |
US4230814A (en) * | 1979-02-12 | 1980-10-28 | General Electric Company | Heat curable compositions |
US4299938A (en) * | 1979-06-19 | 1981-11-10 | Ciba-Geigy Corporation | Photopolymerizable and thermally polymerizable compositions |
DE3071197D1 (en) * | 1979-08-17 | 1985-11-28 | Minnesota Mining & Mfg | Imageable, composite dry-transfer sheet |
FR2472768A1 (fr) * | 1979-12-27 | 1981-07-03 | Thomson Csf | Composition photopolymerisable comportant un cycle thiirane, procede de revetement d'une fibre optique utilisant une telle composition, et fibre ainsi revetue |
US4339567A (en) * | 1980-03-07 | 1982-07-13 | Ciba-Geigy Corporation | Photopolymerization by means of sulphoxonium salts |
US4367251A (en) * | 1980-04-21 | 1983-01-04 | General Electric Company | UV Curable compositions and substrates treated therewith |
US4319974A (en) * | 1980-04-21 | 1982-03-16 | General Electric Company | UV Curable compositions and substrates treated therewith |
US4383025A (en) * | 1980-07-10 | 1983-05-10 | Ciba-Geigy Corporation | Photopolymerization by means of sulfoxonium salts |
US4398014A (en) * | 1980-11-04 | 1983-08-09 | Ciba-Geigy Corporation | Sulfoxonium salts and their use as polymerization catalysts |
US4572890A (en) * | 1983-05-11 | 1986-02-25 | Ciba-Geigy Corporation | Process for the production of images |
JPS6037548A (ja) * | 1983-06-27 | 1985-02-26 | テキサス インスツルメンツ インコ−ポレイテツド | 照射線反応ネガレジストの形成方法 |
US4657844A (en) * | 1983-06-27 | 1987-04-14 | Texas Instruments Incorporated | Plasma developable negative resist compositions for electron beam, X-ray and optical lithography |
US5399596A (en) * | 1988-03-03 | 1995-03-21 | Sanshin Kagaku Kogyo Co., Ltd. | Polyfluoride sulfonium compounds and polymerization initiator thereof |
WO1991005756A1 (en) * | 1989-10-20 | 1991-05-02 | Gaf Chemicals Corporation | Trivinyl ethers of polyols |
US5281261A (en) * | 1990-08-31 | 1994-01-25 | Xerox Corporation | Ink compositions containing modified pigment particles |
ES2247745T3 (es) * | 1992-06-04 | 2006-03-01 | Idemitsu Kosan Co., Ltd. | Compuesto de poli (eter de vinilo) y procedimiento de preparacion. |
US5466845A (en) * | 1992-06-12 | 1995-11-14 | Wacker-Chemie Gmbh | Sulfonium salts and process for their preparation |
GB9309275D0 (en) * | 1993-05-05 | 1993-06-16 | Smith & Nephew | Orthopaedic material |
GB2292087B (en) * | 1993-05-05 | 1997-04-02 | Smith & Nephew | Orthopaedic material |
JP3767676B2 (ja) * | 2000-09-12 | 2006-04-19 | 信越化学工業株式会社 | オルガノシロキサン系高分子化合物及び光硬化性樹脂組成物並びにパターン形成方法及び基板保護用皮膜 |
DE10120676B4 (de) * | 2001-04-27 | 2005-06-16 | Infineon Technologies Ag | Verfahren zur Strukturierung einer Photolackschicht |
DE10120660B8 (de) * | 2001-04-27 | 2006-09-28 | Infineon Technologies Ag | Verfahren zur Strukturierung einer Photolackschicht |
TWI573782B (zh) | 2012-12-07 | 2017-03-11 | Dsp五協食品&化學品股份有限公司 | 新穎鋶鹽化合物、其製造方法及光酸產生劑 |
JP2015134904A (ja) * | 2013-11-18 | 2015-07-27 | 東洋合成工業株式会社 | 化学種発生向上化合物 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3347676A (en) * | 1964-04-30 | 1967-10-17 | Du Pont | Photopolymerizable compositions and process |
US3373221A (en) * | 1964-11-04 | 1968-03-12 | Shell Oil Co | Reaction products of unsaturated esters of polyepoxides and unsaturated carboxylic acids, and polyisocyanates |
US3458311A (en) * | 1966-06-27 | 1969-07-29 | Du Pont | Photopolymerizable elements with solvent removable protective layers |
ZA6801224B (ja) * | 1967-03-08 | |||
US3579339A (en) * | 1967-05-23 | 1971-05-18 | Du Pont | Photopolymerizable dispersions and elements containing nonmigratory photoreducible dyes |
US3567453A (en) * | 1967-12-26 | 1971-03-02 | Eastman Kodak Co | Light sensitive compositions for photoresists and lithography |
US3627656A (en) * | 1969-04-03 | 1971-12-14 | Hughes Aircraft Co | Catalyst systems for photo-chemical polymerization |
US3729313A (en) * | 1971-12-06 | 1973-04-24 | Minnesota Mining & Mfg | Novel photosensitive systems comprising diaryliodonium compounds and their use |
US3901705A (en) * | 1973-09-06 | 1975-08-26 | Du Pont | Method of using variable depth photopolymerization imaging systems |
GB1518141A (en) * | 1974-05-02 | 1978-07-19 | Gen Electric | Polymerizable compositions |
-
1975
- 1975-04-16 GB GB15702/75A patent/GB1518141A/en not_active Expired
- 1975-04-26 DE DE2518749A patent/DE2518749C2/de not_active Expired
- 1975-04-26 DE DE2559492A patent/DE2559492C2/de not_active Expired
- 1975-04-30 FR FR7513518A patent/FR2269538B1/fr not_active Expired
- 1975-05-01 JP JP5211375A patent/JPS5332831B2/ja not_active Expired
-
1977
- 1977-08-05 US US05/822,150 patent/US4161405A/en not_active Expired - Lifetime
-
1978
- 1978-02-24 JP JP1994978A patent/JPS53124416A/ja active Pending
- 1978-02-24 JP JP1994878A patent/JPS53124590A/ja active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53124590A (en) * | 1974-05-02 | 1978-10-31 | Gen Electric | Cationic polymerization |
JPS5495686A (en) * | 1977-08-05 | 1979-07-28 | Gen Electric | Photocurable composition and curing method |
JPS55164204A (en) * | 1977-08-05 | 1980-12-20 | Gen Electric | Photoinitiator |
JPS5453181A (en) * | 1977-09-14 | 1979-04-26 | Gen Electric | Photoopolymerization initiator |
JP2006008823A (ja) * | 2004-06-25 | 2006-01-12 | Toyo Ink Mfg Co Ltd | 硬化型粘接着材料 |
JP4645075B2 (ja) * | 2004-06-25 | 2011-03-09 | 東洋インキ製造株式会社 | 硬化型粘接着材料 |
WO2011040531A1 (ja) | 2009-10-01 | 2011-04-07 | 日立化成工業株式会社 | 有機エレクトロニクス用材料、有機エレクトロニクス素子、有機エレクトロルミネセンス素子、及びそれを用いた表示素子、照明装置、表示装置 |
WO2011132702A1 (ja) | 2010-04-22 | 2011-10-27 | 日立化成工業株式会社 | 有機エレクトロニクス材料、重合開始剤及び熱重合開始剤、インク組成物、有機薄膜及びその製造方法、有機エレクトロニクス素子、有機エレクトロルミネセンス素子、照明装置、表示素子、並びに表示装置 |
WO2014136900A1 (ja) | 2013-03-08 | 2014-09-12 | 日立化成株式会社 | イオン性化合物を含有する処理液、有機エレクトロニクス素子、及び有機エレクトロニクス素子の製造方法 |
WO2022168632A1 (ja) * | 2021-02-03 | 2022-08-11 | サンアプロ株式会社 | 光酸発生剤及びフォトリソグラフィー用樹脂組成物 |
Also Published As
Publication number | Publication date |
---|---|
FR2269538B1 (ja) | 1978-06-30 |
DE2518749A1 (de) | 1975-11-06 |
JPS53124590A (en) | 1978-10-31 |
FR2269538A1 (ja) | 1975-11-28 |
DE2518749C2 (de) | 1982-10-21 |
DE2559492A1 (de) | 1977-01-20 |
DE2559492C2 (de) | 1983-05-11 |
JPS5332831B2 (ja) | 1978-09-11 |
GB1518141A (en) | 1978-07-19 |
US4161405A (en) | 1979-07-17 |
JPS53124416A (en) | 1978-10-30 |