JPS50147323A - - Google Patents

Info

Publication number
JPS50147323A
JPS50147323A JP50048750A JP4875075A JPS50147323A JP S50147323 A JPS50147323 A JP S50147323A JP 50048750 A JP50048750 A JP 50048750A JP 4875075 A JP4875075 A JP 4875075A JP S50147323 A JPS50147323 A JP S50147323A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP50048750A
Other languages
Japanese (ja)
Other versions
JPS556210B2 (de
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS50147323A publication Critical patent/JPS50147323A/ja
Publication of JPS556210B2 publication Critical patent/JPS556210B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Adhesives Or Adhesive Processes (AREA)
JP4875075A 1974-04-23 1975-04-23 Expired JPS556210B2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US46331074A 1974-04-23 1974-04-23

Publications (2)

Publication Number Publication Date
JPS50147323A true JPS50147323A (de) 1975-11-26
JPS556210B2 JPS556210B2 (de) 1980-02-14

Family

ID=23839658

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4875075A Expired JPS556210B2 (de) 1974-04-23 1975-04-23

Country Status (6)

Country Link
JP (1) JPS556210B2 (de)
BE (1) BE828237A (de)
CA (1) CA1056189A (de)
DE (1) DE2517656B2 (de)
FR (1) FR2269108B1 (de)
GB (1) GB1507704A (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2361680A1 (fr) * 1976-08-11 1978-03-10 Du Pont Plaques d'impression planographiques et leur preparation
US4176028A (en) * 1977-03-22 1979-11-27 E. I. Du Pont De Nemours And Company Plastisols made with polyelectrolyte binders
DE2812015C3 (de) * 1977-03-22 1984-05-24 E.I. Du Pont De Nemours And Co., Wilmington, Del. Thermisch verschmelzbare Acrylharzorganosoldispersionen und ihre Verwendung
DE2812016A1 (de) * 1977-03-22 1978-09-28 Du Pont Thermisch verschmelzbare acrylplastisol- oder organosoldispersionen
CA1127340A (en) * 1977-12-30 1982-07-06 Kohtaro Nagasawa Photocurable light-sensitive composition and material
US4247623A (en) 1979-06-18 1981-01-27 Eastman Kodak Company Blank beam leads for IC chip bonding
US4342151A (en) 1979-06-18 1982-08-03 Eastman Kodak Company Blank and process for the formation of beam leads for IC chip bonding
US4341860A (en) 1981-06-08 1982-07-27 E. I. Du Pont De Nemours And Company Photoimaging compositions containing substituted cyclohexadienone compounds
DD250593A1 (de) * 1984-04-03 1987-10-14 Wolfen Filmfab Veb Fotopolymerisierbares material
DE3621477A1 (de) * 1985-06-26 1987-01-08 Canon Kk Durch strahlen mit wirksamer energie haertbare harzmischung
US5182187A (en) * 1988-02-24 1993-01-26 Hoechst Aktiengesellschaft Radiation-polymerizable composition and recording material prepared from this composition
DE3814566C1 (de) * 1988-04-29 1989-11-16 Du Pont De Nemours (Deutschland) Gmbh, 4000 Duesseldorf, De
JP2756623B2 (ja) * 1992-02-26 1998-05-25 富士写真フイルム株式会社 光重合性組成物
EP1783548B1 (de) 2005-11-08 2017-03-08 Rohm and Haas Electronic Materials LLC Verfahren zur Bildung einer gemusterten Schicht auf einem Substrat
US10211409B2 (en) 2014-02-02 2019-02-19 Molecular Glasses, Inc. Noncrystallizable sensitized layers for OLED and OEDs

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4845227A (de) * 1970-12-28 1973-06-28

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL218803A (de) * 1956-07-09
DE1296975B (de) * 1967-11-09 1969-06-04 Kalle Ag Lichtempfindliches Gemisch
BE772251A (fr) * 1970-09-07 Kalle Ag Composes photopolymerisables
DE2053363C3 (de) * 1970-10-30 1980-09-18 Hoechst Ag, 6000 Frankfurt Lichtempfindliches Gemisch
ZA72345B (en) * 1971-02-04 1973-03-28 Dynachem Corp Polymerization compositions and processes
DE2123702B2 (de) * 1971-05-13 1979-11-08 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung eines Reliefbildes
GB1425423A (en) * 1972-04-26 1976-02-18 Eastman Kodak Co Photopolymerisable compositions

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4845227A (de) * 1970-12-28 1973-06-28

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate
JPH033212B2 (de) * 1979-07-27 1991-01-18 Hitachi Chemical Co Ltd

Also Published As

Publication number Publication date
FR2269108B1 (de) 1981-10-30
BE828237A (fr) 1975-10-22
DE2517656B2 (de) 1980-11-13
FR2269108A1 (de) 1975-11-21
GB1507704A (en) 1978-04-19
CA1056189A (en) 1979-06-12
DE2517656A1 (de) 1975-10-30
JPS556210B2 (de) 1980-02-14

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