JPS5014273A - - Google Patents

Info

Publication number
JPS5014273A
JPS5014273A JP49045152A JP4515274A JPS5014273A JP S5014273 A JPS5014273 A JP S5014273A JP 49045152 A JP49045152 A JP 49045152A JP 4515274 A JP4515274 A JP 4515274A JP S5014273 A JPS5014273 A JP S5014273A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP49045152A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5014273A publication Critical patent/JPS5014273A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16—Measuring radiation intensity
    • G01T1/20—Measuring radiation intensity with scintillation detectors
    • G01T1/202—Measuring radiation intensity with scintillation detectors the detector being a crystal
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2443—Scintillation detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Measurement Of Radiation (AREA)
JP49045152A 1973-04-24 1974-04-23 Pending JPS5014273A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00354039A US3842271A (en) 1973-04-24 1973-04-24 Scanning electron microscope

Publications (1)

Publication Number Publication Date
JPS5014273A true JPS5014273A (ja) 1975-02-14

Family

ID=23391641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49045152A Pending JPS5014273A (ja) 1973-04-24 1974-04-23

Country Status (11)

Country Link
US (1) US3842271A (ja)
JP (1) JPS5014273A (ja)
AU (1) AU474023B2 (ja)
CA (1) CA1006990A (ja)
DD (1) DD113660A5 (ja)
DE (1) DE2417319A1 (ja)
FR (1) FR2227632B1 (ja)
GB (1) GB1436278A (ja)
IT (1) IT1004276B (ja)
NL (1) NL7405307A (ja)
SE (1) SE388721B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018531859A (ja) * 2015-07-19 2018-11-01 エーエフオー リサーチ，インク 耐フッ素性、耐放射線性、および放射線検出のガラスシステム

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7902963A (nl) * 1979-04-13 1980-10-15 Philips Nv Detektor voor elektronenmikroskoop.
JPH0687410B2 (ja) * 1986-08-01 1994-11-02 エレクトロ‐スキャン コーポレーション 走査電子顕微鏡及び試料の表面を電子顕微鏡的に像形成する方法
JPH0766766B2 (ja) * 1989-03-30 1995-07-19 株式会社日立製作所 電子顕微鏡
DE69104082T2 (de) * 1990-02-23 1995-03-30 Ibm Mehrdetektoren-System zur Probenuntersuchung mittels hochenergetischer Rückstreuelektronen.
WO2000079565A1 (en) * 1999-06-22 2000-12-28 Philips Electron Optics B.V. Particle-optical apparatus including a particle source that can be switched between high brightness and large beam current
CN1307432C (zh) * 2001-01-31 2007-03-28 滨松光子学株式会社 电子束检测器、扫描型电子显微镜、质量分析装置及离子检测器
EP2088614B1 (en) * 2008-02-08 2010-12-15 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Beam current calibration system
US9190241B2 (en) 2013-03-25 2015-11-17 Hermes-Microvision, Inc. Charged particle beam apparatus
US10236156B2 (en) 2015-03-25 2019-03-19 Hermes Microvision Inc. Apparatus of plural charged-particle beams

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3052637A (en) * 1961-06-05 1962-09-04 Adli M Bishay Glass composition and process of making
US3472997A (en) * 1966-08-26 1969-10-14 Us Navy Secondary electron collection system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018531859A (ja) * 2015-07-19 2018-11-01 エーエフオー リサーチ，インク 耐フッ素性、耐放射線性、および放射線検出のガラスシステム
US10393887B2 (en) 2015-07-19 2019-08-27 Afo Research, Inc. Fluorine resistant, radiation resistant, and radiation detection glass systems

Also Published As

Publication number Publication date
CA1006990A (en) 1977-03-15
IT1004276B (it) 1976-07-10
US3842271A (en) 1974-10-15
DE2417319A1 (de) 1974-11-07
AU474023B2 (en) 1976-07-08
FR2227632A1 (ja) 1974-11-22
SE388721B (sv) 1976-10-11
GB1436278A (en) 1976-05-19
AU6763374A (en) 1975-10-09
DD113660A5 (ja) 1975-06-12
NL7405307A (ja) 1974-10-28
FR2227632B1 (ja) 1978-03-31

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