FR2227632B1 - - Google Patents

Info

Publication number
FR2227632B1
FR2227632B1 FR7415642A FR7415642A FR2227632B1 FR 2227632 B1 FR2227632 B1 FR 2227632B1 FR 7415642 A FR7415642 A FR 7415642A FR 7415642 A FR7415642 A FR 7415642A FR 2227632 B1 FR2227632 B1 FR 2227632B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7415642A
Other versions
FR2227632A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
American Optical Corp
Original Assignee
American Optical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Optical Corp filed Critical American Optical Corp
Publication of FR2227632A1 publication Critical patent/FR2227632A1/fr
Application granted granted Critical
Publication of FR2227632B1 publication Critical patent/FR2227632B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16—Measuring radiation intensity
    • G01T1/20—Measuring radiation intensity with scintillation detectors
    • G01T1/202—Measuring radiation intensity with scintillation detectors the detector being a crystal
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2443—Scintillation detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Measurement Of Radiation (AREA)
FR7415642A 1973-04-24 1974-04-22 Expired FR2227632B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00354039A US3842271A (en) 1973-04-24 1973-04-24 Scanning electron microscope

Publications (2)

Publication Number Publication Date
FR2227632A1 FR2227632A1 (fr) 1974-11-22
FR2227632B1 true FR2227632B1 (fr) 1978-03-31

Family

ID=23391641

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7415642A Expired FR2227632B1 (fr) 1973-04-24 1974-04-22

Country Status (11)

Country Link
US (1) US3842271A (fr)
JP (1) JPS5014273A (fr)
AU (1) AU474023B2 (fr)
CA (1) CA1006990A (fr)
DD (1) DD113660A5 (fr)
DE (1) DE2417319A1 (fr)
FR (1) FR2227632B1 (fr)
GB (1) GB1436278A (fr)
IT (1) IT1004276B (fr)
NL (1) NL7405307A (fr)
SE (1) SE388721B (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7902963A (nl) * 1979-04-13 1980-10-15 Philips Nv Detektor voor elektronenmikroskoop.
JPH0687410B2 (ja) * 1986-08-01 1994-11-02 エレクトロ‐スキャン コーポレーション 走査電子顕微鏡及び試料の表面を電子顕微鏡的に像形成する方法
JPH0766766B2 (ja) * 1989-03-30 1995-07-19 株式会社日立製作所 電子顕微鏡
DE69104082T2 (de) * 1990-02-23 1995-03-30 Ibm Mehrdetektoren-System zur Probenuntersuchung mittels hochenergetischer Rückstreuelektronen.
WO2000079565A1 (fr) * 1999-06-22 2000-12-28 Philips Electron Optics B.V. Appareil optique a particules renfermant une source de particules pouvant basculer d'une condition de brillance elevee a un fort courant de faisceau
KR100917387B1 (ko) * 2001-01-31 2009-09-17 하마마츠 포토닉스 가부시키가이샤 전자선 검출기, 주사형 전자 현미경, 질량 분석 장치, 및,이온 검출기
EP2088614B1 (fr) * 2008-02-08 2010-12-15 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Système d'étalonnage de courant de faisceau
US9190241B2 (en) 2013-03-25 2015-11-17 Hermes-Microvision, Inc. Charged particle beam apparatus
US10236156B2 (en) 2015-03-25 2019-03-19 Hermes Microvision Inc. Apparatus of plural charged-particle beams
US10393887B2 (en) * 2015-07-19 2019-08-27 Afo Research, Inc. Fluorine resistant, radiation resistant, and radiation detection glass systems

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3052637A (en) * 1961-06-05 1962-09-04 Adli M Bishay Glass composition and process of making
US3472997A (en) * 1966-08-26 1969-10-14 Us Navy Secondary electron collection system

Also Published As

Publication number Publication date
SE388721B (sv) 1976-10-11
AU474023B2 (en) 1976-07-08
US3842271A (en) 1974-10-15
AU6763374A (en) 1975-10-09
CA1006990A (en) 1977-03-15
DD113660A5 (fr) 1975-06-12
JPS5014273A (fr) 1975-02-14
IT1004276B (it) 1976-07-10
FR2227632A1 (fr) 1974-11-22
NL7405307A (fr) 1974-10-28
GB1436278A (en) 1976-05-19
DE2417319A1 (de) 1974-11-07

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Legal Events

Date Code Title Description
TP Transmission of property
ST Notification of lapse