JPS50107877A - - Google Patents

Info

Publication number
JPS50107877A
JPS50107877A JP1244474A JP1244474A JPS50107877A JP S50107877 A JPS50107877 A JP S50107877A JP 1244474 A JP1244474 A JP 1244474A JP 1244474 A JP1244474 A JP 1244474A JP S50107877 A JPS50107877 A JP S50107877A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1244474A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1244474A priority Critical patent/JPS50107877A/ja
Publication of JPS50107877A publication Critical patent/JPS50107877A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Electrodes Of Semiconductors (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Drying Of Semiconductors (AREA)
  • Element Separation (AREA)
JP1244474A 1974-01-30 1974-01-30 Pending JPS50107877A (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1244474A JPS50107877A (enrdf_load_stackoverflow) 1974-01-30 1974-01-30

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1244474A JPS50107877A (enrdf_load_stackoverflow) 1974-01-30 1974-01-30

Publications (1)

Publication Number Publication Date
JPS50107877A true JPS50107877A (enrdf_load_stackoverflow) 1975-08-25

Family

ID=11805473

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1244474A Pending JPS50107877A (enrdf_load_stackoverflow) 1974-01-30 1974-01-30

Country Status (1)

Country Link
JP (1) JPS50107877A (enrdf_load_stackoverflow)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5373971A (en) * 1976-12-14 1978-06-30 Matsushita Electric Ind Co Ltd Manufacture for semiconductor device
JPS53148988A (en) * 1977-05-31 1978-12-26 Matsushita Electric Ind Co Ltd Manufacture of semiconductor substrate
JPS5541715A (en) * 1978-09-19 1980-03-24 Oki Electric Ind Co Ltd Production of semiconductor device
JPS5562773A (en) * 1978-11-06 1980-05-12 Seiko Epson Corp Preparation of semiconductor device
JPS5595341A (en) * 1979-01-11 1980-07-19 Sony Corp Preparation of semiconductor device
JPS5618426A (en) * 1979-07-24 1981-02-21 Fujitsu Ltd Manufacture of semiconductor device
JPS5750436A (en) * 1980-09-12 1982-03-24 Fujitsu Ltd Manufacture of semiconductor device
JPS57180123A (en) * 1981-04-29 1982-11-06 Fujitsu Ltd Manufacture of semiconductor device
JPS57204150A (en) * 1981-06-10 1982-12-14 Fujitsu Ltd Manufacture of semiconductor device
JPS5958837A (ja) * 1982-09-29 1984-04-04 Fujitsu Ltd 半導体装置の製造方法
JPS59124723A (ja) * 1982-12-29 1984-07-18 Fujitsu Ltd 半導体装置の製造方法
JPS60242623A (ja) * 1984-05-16 1985-12-02 Mitsubishi Electric Corp 半導体装置の製造方法
JPH0653189A (ja) * 1992-07-31 1994-02-25 Oki Electric Ind Co Ltd 成膜層の平坦化方法

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5373971A (en) * 1976-12-14 1978-06-30 Matsushita Electric Ind Co Ltd Manufacture for semiconductor device
JPS53148988A (en) * 1977-05-31 1978-12-26 Matsushita Electric Ind Co Ltd Manufacture of semiconductor substrate
JPS5541715A (en) * 1978-09-19 1980-03-24 Oki Electric Ind Co Ltd Production of semiconductor device
JPS5562773A (en) * 1978-11-06 1980-05-12 Seiko Epson Corp Preparation of semiconductor device
JPS5595341A (en) * 1979-01-11 1980-07-19 Sony Corp Preparation of semiconductor device
JPS5618426A (en) * 1979-07-24 1981-02-21 Fujitsu Ltd Manufacture of semiconductor device
JPS5750436A (en) * 1980-09-12 1982-03-24 Fujitsu Ltd Manufacture of semiconductor device
JPS57180123A (en) * 1981-04-29 1982-11-06 Fujitsu Ltd Manufacture of semiconductor device
JPS57204150A (en) * 1981-06-10 1982-12-14 Fujitsu Ltd Manufacture of semiconductor device
JPS5958837A (ja) * 1982-09-29 1984-04-04 Fujitsu Ltd 半導体装置の製造方法
JPS59124723A (ja) * 1982-12-29 1984-07-18 Fujitsu Ltd 半導体装置の製造方法
JPS60242623A (ja) * 1984-05-16 1985-12-02 Mitsubishi Electric Corp 半導体装置の製造方法
JPH0653189A (ja) * 1992-07-31 1994-02-25 Oki Electric Ind Co Ltd 成膜層の平坦化方法

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