JPS4998179A - - Google Patents

Info

Publication number
JPS4998179A
JPS4998179A JP48143687A JP14368773A JPS4998179A JP S4998179 A JPS4998179 A JP S4998179A JP 48143687 A JP48143687 A JP 48143687A JP 14368773 A JP14368773 A JP 14368773A JP S4998179 A JPS4998179 A JP S4998179A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48143687A
Other languages
Japanese (ja)
Other versions
JPS5714029B2 (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4998179A publication Critical patent/JPS4998179A/ja
Publication of JPS5714029B2 publication Critical patent/JPS5714029B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • H10D8/60Schottky-barrier diodes 
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/541Heating or cooling of the substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP14368773A 1972-12-26 1973-12-24 Expired JPS5714029B2 (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31839472A 1972-12-26 1972-12-26

Publications (2)

Publication Number Publication Date
JPS4998179A true JPS4998179A (enrdf_load_stackoverflow) 1974-09-17
JPS5714029B2 JPS5714029B2 (enrdf_load_stackoverflow) 1982-03-20

Family

ID=23238005

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14368773A Expired JPS5714029B2 (enrdf_load_stackoverflow) 1972-12-26 1973-12-24

Country Status (6)

Country Link
JP (1) JPS5714029B2 (enrdf_load_stackoverflow)
DE (1) DE2363061A1 (enrdf_load_stackoverflow)
FR (1) FR2211756A1 (enrdf_load_stackoverflow)
GB (1) GB1444000A (enrdf_load_stackoverflow)
IT (1) IT1002232B (enrdf_load_stackoverflow)
NL (1) NL7317158A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5638869A (en) * 1979-09-07 1981-04-14 Seiko Epson Corp Manufacture of mos-type semiconductor device

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4206540A (en) * 1978-06-02 1980-06-10 International Rectifier Corporation Schottky device and method of manufacture using palladium and platinum intermetallic alloys and titanium barrier
GB2137412B (en) * 1983-03-15 1987-03-04 Standard Telephones Cables Ltd Semiconductor device
GB2265636B (en) * 1989-09-21 1994-05-18 Int Rectifier Corp Platinum diffusion process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5638869A (en) * 1979-09-07 1981-04-14 Seiko Epson Corp Manufacture of mos-type semiconductor device

Also Published As

Publication number Publication date
FR2211756A1 (enrdf_load_stackoverflow) 1974-07-19
NL7317158A (enrdf_load_stackoverflow) 1974-06-28
IT1002232B (it) 1976-05-20
GB1444000A (en) 1976-07-28
DE2363061A1 (de) 1974-07-04
JPS5714029B2 (enrdf_load_stackoverflow) 1982-03-20

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