IT1002232B - Contatti a barriera schottky e metodi per fare i medesimi - Google Patents
Contatti a barriera schottky e metodi per fare i medesimiInfo
- Publication number
- IT1002232B IT1002232B IT3207973A IT3207973A IT1002232B IT 1002232 B IT1002232 B IT 1002232B IT 3207973 A IT3207973 A IT 3207973A IT 3207973 A IT3207973 A IT 3207973A IT 1002232 B IT1002232 B IT 1002232B
- Authority
- IT
- Italy
- Prior art keywords
- methods
- same
- schottky barrier
- barrier contacts
- contacts
- Prior art date
Links
- 230000004888 barrier function Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/872—Schottky diodes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US31839472A | 1972-12-26 | 1972-12-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IT1002232B true IT1002232B (it) | 1976-05-20 |
Family
ID=23238005
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT3207973A IT1002232B (it) | 1972-12-26 | 1973-12-10 | Contatti a barriera schottky e metodi per fare i medesimi |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5714029B2 (it) |
| DE (1) | DE2363061A1 (it) |
| FR (1) | FR2211756A1 (it) |
| GB (1) | GB1444000A (it) |
| IT (1) | IT1002232B (it) |
| NL (1) | NL7317158A (it) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4206540A (en) * | 1978-06-02 | 1980-06-10 | International Rectifier Corporation | Schottky device and method of manufacture using palladium and platinum intermetallic alloys and titanium barrier |
| JPS5638869A (en) * | 1979-09-07 | 1981-04-14 | Seiko Epson Corp | Manufacture of mos-type semiconductor device |
| GB2137412B (en) * | 1983-03-15 | 1987-03-04 | Standard Telephones Cables Ltd | Semiconductor device |
| GB2265636B (en) * | 1989-09-21 | 1994-05-18 | Int Rectifier Corp | Platinum diffusion process |
-
1973
- 1973-12-10 IT IT3207973A patent/IT1002232B/it active
- 1973-12-14 NL NL7317158A patent/NL7317158A/xx unknown
- 1973-12-19 DE DE19732363061 patent/DE2363061A1/de active Pending
- 1973-12-24 JP JP14368773A patent/JPS5714029B2/ja not_active Expired
- 1973-12-26 FR FR7346209A patent/FR2211756A1/fr not_active Withdrawn
- 1973-12-27 GB GB5980973A patent/GB1444000A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5714029B2 (it) | 1982-03-20 |
| DE2363061A1 (de) | 1974-07-04 |
| FR2211756A1 (it) | 1974-07-19 |
| NL7317158A (it) | 1974-06-28 |
| JPS4998179A (it) | 1974-09-17 |
| GB1444000A (en) | 1976-07-28 |
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