JPS5714029B2 - - Google Patents
Info
- Publication number
- JPS5714029B2 JPS5714029B2 JP14368773A JP14368773A JPS5714029B2 JP S5714029 B2 JPS5714029 B2 JP S5714029B2 JP 14368773 A JP14368773 A JP 14368773A JP 14368773 A JP14368773 A JP 14368773A JP S5714029 B2 JPS5714029 B2 JP S5714029B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/872—Schottky diodes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US31839472A | 1972-12-26 | 1972-12-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4998179A JPS4998179A (ja) | 1974-09-17 |
| JPS5714029B2 true JPS5714029B2 (ja) | 1982-03-20 |
Family
ID=23238005
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14368773A Expired JPS5714029B2 (ja) | 1972-12-26 | 1973-12-24 |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS5714029B2 (ja) |
| DE (1) | DE2363061A1 (ja) |
| FR (1) | FR2211756A1 (ja) |
| GB (1) | GB1444000A (ja) |
| IT (1) | IT1002232B (ja) |
| NL (1) | NL7317158A (ja) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4206540A (en) * | 1978-06-02 | 1980-06-10 | International Rectifier Corporation | Schottky device and method of manufacture using palladium and platinum intermetallic alloys and titanium barrier |
| JPS5638869A (en) * | 1979-09-07 | 1981-04-14 | Seiko Epson Corp | Manufacture of mos-type semiconductor device |
| GB2137412B (en) * | 1983-03-15 | 1987-03-04 | Standard Telephones Cables Ltd | Semiconductor device |
| GB2265636B (en) * | 1989-09-21 | 1994-05-18 | Int Rectifier Corp | Platinum diffusion process |
-
1973
- 1973-12-10 IT IT3207973A patent/IT1002232B/it active
- 1973-12-14 NL NL7317158A patent/NL7317158A/xx unknown
- 1973-12-19 DE DE19732363061 patent/DE2363061A1/de active Pending
- 1973-12-24 JP JP14368773A patent/JPS5714029B2/ja not_active Expired
- 1973-12-26 FR FR7346209A patent/FR2211756A1/fr not_active Withdrawn
- 1973-12-27 GB GB5980973A patent/GB1444000A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| IT1002232B (it) | 1976-05-20 |
| DE2363061A1 (de) | 1974-07-04 |
| FR2211756A1 (ja) | 1974-07-19 |
| NL7317158A (ja) | 1974-06-28 |
| JPS4998179A (ja) | 1974-09-17 |
| GB1444000A (en) | 1976-07-28 |