JPS4952186A - - Google Patents

Info

Publication number
JPS4952186A
JPS4952186A JP48067000A JP6700073A JPS4952186A JP S4952186 A JPS4952186 A JP S4952186A JP 48067000 A JP48067000 A JP 48067000A JP 6700073 A JP6700073 A JP 6700073A JP S4952186 A JPS4952186 A JP S4952186A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP48067000A
Other languages
Japanese (ja)
Other versions
JPS5148463B2 (enExample
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4952186A publication Critical patent/JPS4952186A/ja
Publication of JPS5148463B2 publication Critical patent/JPS5148463B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
JP48067000A 1972-06-16 1973-06-15 Expired JPS5148463B2 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26370872A 1972-06-16 1972-06-16

Publications (2)

Publication Number Publication Date
JPS4952186A true JPS4952186A (enExample) 1974-05-21
JPS5148463B2 JPS5148463B2 (enExample) 1976-12-21

Family

ID=23002928

Family Applications (1)

Application Number Title Priority Date Filing Date
JP48067000A Expired JPS5148463B2 (enExample) 1972-06-16 1973-06-15

Country Status (4)

Country Link
US (1) US3791852A (enExample)
JP (1) JPS5148463B2 (enExample)
DE (1) DE2330545B2 (enExample)
GB (1) GB1392583A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036381A (enExample) * 1973-08-04 1975-04-05
JPS51107287A (ja) * 1975-03-18 1976-09-22 Fujikoshi Kk Koshitsuhimakukeiseisochi
JPS5223579A (en) * 1975-08-19 1977-02-22 Ulvac Corp Activation reaction evaporating apparatus
JPS57161058A (en) * 1981-03-30 1982-10-04 Agency Of Ind Science & Technol Production of hard film

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3916052A (en) * 1973-05-16 1975-10-28 Airco Inc Coating of carbon-containing substrates with titanium carbide
GB1579999A (en) * 1977-09-12 1980-11-26 Gen Electric Annular metal cutting die of titanium carbide coating tool steel and method of shaving metal rods
ES494779A0 (es) * 1979-08-09 1981-03-16 Mitsubishi Metal Corp Procedimiento para la fabricacion de cuchillas dotadas de recubrimiento,para herramientas de corte
US4416912A (en) * 1979-10-13 1983-11-22 The Gillette Company Formation of coatings on cutting edges
US4297387A (en) * 1980-06-04 1981-10-27 Battelle Development Corporation Cubic boron nitride preparation
US4336277A (en) * 1980-09-29 1982-06-22 The Regents Of The University Of California Transparent electrical conducting films by activated reactive evaporation
US4609564C2 (en) * 1981-02-24 2001-10-09 Masco Vt Inc Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase
US4537794A (en) * 1981-02-24 1985-08-27 Wedtech Corp. Method of coating ceramics
US4596719A (en) * 1981-02-24 1986-06-24 Wedtech Corp. Multilayer coating method and apparatus
GB8324779D0 (en) * 1982-09-29 1983-10-19 Nat Res Dev Depositing film onto substrate
US4656052A (en) * 1984-02-13 1987-04-07 Kyocera Corporation Process for production of high-hardness boron nitride film
DK148784D0 (da) * 1984-02-29 1984-02-29 Nexus Aps Pulverprodukt
JPS60234965A (ja) * 1984-05-04 1985-11-21 Diesel Kiki Co Ltd 薄膜製造方法
GB8508699D0 (en) * 1985-04-03 1985-05-09 Barr & Stroud Ltd Chemical vapour deposition of products
JPS6222314A (ja) * 1985-07-22 1987-01-30 株式会社ボッシュオートモーティブ　システム 薄膜製造方法
US4781989A (en) * 1986-03-07 1988-11-01 Mitsubishi Kinzoku Kabushiki Kaisha Surface-coated cutting member
US4816293A (en) * 1986-03-27 1989-03-28 Mitsubishi Denki Kabushiki Kaisha Process for coating a workpiece with a ceramic material
DE3627151A1 (de) * 1986-08-11 1988-02-18 Leybold Heraeus Gmbh & Co Kg Verfahren und vorrichtung zum reaktiven aufdampfen von metallverbindungen
US4816291A (en) * 1987-08-19 1989-03-28 The Regents Of The University Of California Process for making diamond, doped diamond, diamond-cubic boron nitride composite films
US4957773A (en) * 1989-02-13 1990-09-18 Syracuse University Deposition of boron-containing films from decaborane
JPH0620464B2 (ja) * 1989-04-03 1994-03-23 信越化学工業株式会社 医療用切開、圧入器具およびその製造方法
DE4006457C2 (de) * 1990-03-01 1993-09-30 Balzers Hochvakuum Verfahren zum Verdampfen von Material in einer Vakuumaufdampfanlage sowie Anlage derselben
EP0470777A3 (en) * 1990-08-07 1993-06-02 The Boc Group, Inc. Thin gas barrier films and rapid deposition method therefor
CH683776A5 (de) * 1991-12-05 1994-05-13 Alusuisse Lonza Services Ag Beschichten einer Substratfläche mit einer Permeationssperre.
DE4336681C2 (de) * 1993-10-27 1996-10-02 Fraunhofer Ges Forschung Verfahren und Einrichtung zum plasmaaktivierten Elektronenstrahlverdampfen
DE4336680C2 (de) * 1993-10-27 1998-05-14 Fraunhofer Ges Forschung Verfahren zum Elektronenstrahlverdampfen
ES2166873T3 (es) * 1996-01-10 2002-05-01 Alcan Tech & Man Ag Procedimiento y dispositivo para revestir la superficie de un substrato.
DE19724996C1 (de) * 1997-06-13 1998-09-03 Fraunhofer Ges Forschung Verfahren zum plasmaaktivierten Elektronenstrahlverdampfen und Einrichtung zur Durchführung des Verfahrens
US6827828B2 (en) * 2001-03-29 2004-12-07 Honeywell International Inc. Mixed metal materials
WO2003082482A1 (en) * 2002-03-25 2003-10-09 Penn State Research Foundation Method for producing boride thin films
JP4181332B2 (ja) * 2002-03-26 2008-11-12 松下電器産業株式会社 薄膜の製造方法及び製造装置
WO2005010953A2 (en) * 2003-02-28 2005-02-03 Penn State Research Foundation Boride thin films on silicon
US8122600B2 (en) * 2003-03-03 2012-02-28 United Technologies Corporation Fan and compressor blade dovetail restoration process
GB0307745D0 (en) * 2003-04-03 2003-05-07 Microemissive Displays Ltd Method and apparatus for depositing material on a substrate
WO2004102634A2 (en) 2003-04-16 2004-11-25 The Regents Of The University Of California Metal mems devices and methods of making same
JP5139002B2 (ja) * 2007-08-10 2013-02-06 株式会社東芝 微粒子担持方法および微粒子担持装置
US8526137B2 (en) 2010-04-16 2013-09-03 International Business Machines Corporation Head comprising a crystalline alumina layer
US9023422B1 (en) * 2011-08-31 2015-05-05 Maxim Integrated Products, Inc. High rate deposition method of magnetic nanocomposites
US11499230B2 (en) 2014-08-18 2022-11-15 Dynetics, Inc. Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors
US10167555B2 (en) 2014-08-18 2019-01-01 Dynetics, Inc. Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors
CN106676480B (zh) * 2017-03-10 2019-11-08 南京大学 一种蒸发速率可控的电子束蒸发源

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3230110A (en) * 1962-01-22 1966-01-18 Temescal Metallurgical Corp Method of forming carbon vapor barrier
US3373050A (en) * 1964-12-30 1968-03-12 Sperry Rand Corp Deflecting particles in vacuum coating process
US3419487A (en) * 1966-01-24 1968-12-31 Dow Corning Method of growing thin film semiconductors using an electron beam
US3695910A (en) * 1969-01-21 1972-10-03 Anthony W Louderback Method of applying a multilayer antireflection coating to a substrate
US3677795A (en) * 1969-05-01 1972-07-18 Gulf Oil Corp Method of making a prosthetic device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036381A (enExample) * 1973-08-04 1975-04-05
JPS51107287A (ja) * 1975-03-18 1976-09-22 Fujikoshi Kk Koshitsuhimakukeiseisochi
JPS5223579A (en) * 1975-08-19 1977-02-22 Ulvac Corp Activation reaction evaporating apparatus
JPS57161058A (en) * 1981-03-30 1982-10-04 Agency Of Ind Science & Technol Production of hard film

Also Published As

Publication number Publication date
GB1392583A (en) 1975-04-30
DE2330545B2 (de) 1977-06-08
DE2330545A1 (de) 1974-01-03
JPS5148463B2 (enExample) 1976-12-21
US3791852A (en) 1974-02-12

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