JPS4947631B1 - - Google Patents
Info
- Publication number
- JPS4947631B1 JPS4947631B1 JP45051456A JP5145670A JPS4947631B1 JP S4947631 B1 JPS4947631 B1 JP S4947631B1 JP 45051456 A JP45051456 A JP 45051456A JP 5145670 A JP5145670 A JP 5145670A JP S4947631 B1 JPS4947631 B1 JP S4947631B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| SE8403/69A SE345881B (hr) | 1969-06-13 | 1969-06-13 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS4947631B1 true JPS4947631B1 (hr) | 1974-12-17 |
Family
ID=20273979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP45051456A Pending JPS4947631B1 (hr) | 1969-06-13 | 1970-06-13 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3695217A (hr) |
| JP (1) | JPS4947631B1 (hr) |
| CH (1) | CH553258A (hr) |
| DE (1) | DE2029014C3 (hr) |
| FR (1) | FR2052572A5 (hr) |
| GB (1) | GB1318046A (hr) |
| SE (1) | SE345881B (hr) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3996469A (en) * | 1975-01-06 | 1976-12-07 | Jersey Nuclear-Avco Isotopes, Inc. | Floating convection barrier for evaporation source |
| US4048462A (en) * | 1975-01-17 | 1977-09-13 | Airco, Inc. | Compact rotary evaporation source |
| US4091257A (en) * | 1975-02-24 | 1978-05-23 | General Electric Company | Deep diode devices and method and apparatus |
| DE3316554C1 (de) * | 1983-05-06 | 1984-07-12 | Dr. Johannes Heidenhain Gmbh, 8225 Traunreut | Verdampfervorrichtung mit Strahlheizung zum Aufdampfen mehrerer Materialien |
| JP2913745B2 (ja) * | 1990-04-10 | 1999-06-28 | 松下電器産業株式会社 | 真空蒸着装置 |
| JP2003113466A (ja) * | 2001-07-31 | 2003-04-18 | Fuji Photo Film Co Ltd | 真空蒸着装置 |
| DE102012207159A1 (de) * | 2012-04-30 | 2013-10-31 | Von Ardenne Anlagentechnik Gmbh | Vorrichtung zum Beschichten von Substraten |
-
1969
- 1969-06-13 SE SE8403/69A patent/SE345881B/xx unknown
-
1970
- 1970-06-11 GB GB2834670A patent/GB1318046A/en not_active Expired
- 1970-06-11 US US45496A patent/US3695217A/en not_active Expired - Lifetime
- 1970-06-12 DE DE2029014A patent/DE2029014C3/de not_active Expired
- 1970-06-13 JP JP45051456A patent/JPS4947631B1/ja active Pending
- 1970-06-15 CH CH900970A patent/CH553258A/xx not_active IP Right Cessation
- 1970-06-15 FR FR7021879A patent/FR2052572A5/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB1318046A (en) | 1973-05-23 |
| DE2029014A1 (de) | 1971-01-07 |
| DE2029014C3 (de) | 1979-10-04 |
| DE2029014B2 (de) | 1972-12-07 |
| FR2052572A5 (hr) | 1971-04-09 |
| SE345881B (hr) | 1972-06-12 |
| US3695217A (en) | 1972-10-03 |
| CH553258A (de) | 1974-08-30 |