JPH1172919A5 - - Google Patents

Info

Publication number
JPH1172919A5
JPH1172919A5 JP1998191520A JP19152098A JPH1172919A5 JP H1172919 A5 JPH1172919 A5 JP H1172919A5 JP 1998191520 A JP1998191520 A JP 1998191520A JP 19152098 A JP19152098 A JP 19152098A JP H1172919 A5 JPH1172919 A5 JP H1172919A5
Authority
JP
Japan
Prior art keywords
recording material
acid
group
material according
hydrophilic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998191520A
Other languages
English (en)
Japanese (ja)
Other versions
JPH1172919A (ja
Filing date
Publication date
Priority claimed from DE19729067A external-priority patent/DE19729067A1/de
Application filed filed Critical
Publication of JPH1172919A publication Critical patent/JPH1172919A/ja
Publication of JPH1172919A5 publication Critical patent/JPH1172919A5/ja
Pending legal-status Critical Current

Links

JP10191520A 1997-07-08 1998-07-07 赤外線で画像形成し得る記録材料およびそこから製造されるオフセット印刷板 Pending JPH1172919A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19729067.1 1997-07-08
DE19729067A DE19729067A1 (de) 1997-07-08 1997-07-08 Infrarot-bebilderbares Aufzeichnungsmaterial und daraus hergestellte Offsetdruckplatte

Publications (2)

Publication Number Publication Date
JPH1172919A JPH1172919A (ja) 1999-03-16
JPH1172919A5 true JPH1172919A5 (enExample) 2005-09-15

Family

ID=7834964

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10191520A Pending JPH1172919A (ja) 1997-07-08 1998-07-07 赤外線で画像形成し得る記録材料およびそこから製造されるオフセット印刷板

Country Status (4)

Country Link
US (1) US6537722B2 (enExample)
EP (1) EP0890879B1 (enExample)
JP (1) JPH1172919A (enExample)
DE (2) DE19729067A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6489078B1 (en) * 1996-07-19 2002-12-03 Agfa-Gevaert IR radiation-sensitive imaging element and a method for producing lithographic plates therewith
DE19850181C2 (de) * 1998-10-30 2003-12-04 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Zusammensetzung und deren Verwendung für thermisch bebilderbare Druckplatten
US6455230B1 (en) 1999-06-04 2002-09-24 Agfa-Gevaert Method for preparing a lithographic printing plate by ablation of a heat sensitive ablatable imaging element
DE69917004T2 (de) * 1999-06-04 2004-10-28 Agfa-Gevaert Verfahren zur Herstellung einer Flachdruckplatte durch Laserablation eines wärmempfindlichen Elements
JP4137345B2 (ja) * 2000-06-05 2008-08-20 富士フイルム株式会社 平版印刷版原版
US20020182877A1 (en) * 2001-04-09 2002-12-05 Marc Nantel Photo-processing of materials in the presence of reactive fluid

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0366590B2 (en) 1988-10-28 2001-03-21 International Business Machines Corporation Highly sensitive positive photoresist compositions
ATE149429T1 (de) 1989-03-30 1997-03-15 Rexham Graphics Inc Im nahen uv-bereich arbeitenden laser absorbierende beschichtung sowie gebrauch derselben in der herstellung von farbbildern und prüffolien
US5248760A (en) * 1991-01-25 1993-09-28 Unc At Charlotte Chemically cured low temperature polyimides
DE4125258A1 (de) * 1991-07-31 1993-02-04 Hoechst Ag Verbindungen mit saeurelabilen schutzgruppen und damit hergestelltes positiv arbeitendes strahlungsempfindliches gemisch
DE4217495A1 (de) 1992-05-27 1993-12-02 Hoechst Ag Photopolymerisierbares Gemisch und daraus hergestelltes Aufzeichnungsmaterial
US5340699A (en) 1993-05-19 1994-08-23 Eastman Kodak Company Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates
US5576449A (en) * 1993-09-30 1996-11-19 Basf Aktiengesellschaft Preparation of 2-substituted but-2-ene-1,4-dial-4-acetals and novel hemiacetals of glyoxal monoacetals
GB9322705D0 (en) * 1993-11-04 1993-12-22 Minnesota Mining & Mfg Lithographic printing plates
EP0672954B1 (en) 1994-03-14 1999-09-15 Kodak Polychrome Graphics LLC Radiation-sensitive composition containing a resole resin, a novolac resin, an infrared absorber and a triazine and use thereof in lithographic printing plates
JP3461377B2 (ja) * 1994-04-18 2003-10-27 富士写真フイルム株式会社 画像記録材料
DE4414896A1 (de) 1994-04-28 1995-11-02 Hoechst Ag Positiv arbeitendes strahlungempfindliches Gemisch
US5558971A (en) * 1994-09-02 1996-09-24 Wako Pure Chemical Industries, Ltd. Resist material
US5738974A (en) 1994-09-05 1998-04-14 Mitsubishi Chemical Corporation Photopolymerizable composition and photosensitive lithographic printing plate
US5491046A (en) * 1995-02-10 1996-02-13 Eastman Kodak Company Method of imaging a lithographic printing plate
JPH0962005A (ja) * 1995-06-14 1997-03-07 Fuji Photo Film Co Ltd ネガ型感光性組成物
US5641608A (en) * 1995-10-23 1997-06-24 Macdermid, Incorporated Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates
JP3589365B2 (ja) * 1996-02-02 2004-11-17 富士写真フイルム株式会社 ポジ画像形成組成物
WO1997033198A1 (en) * 1996-03-07 1997-09-12 The B.F. Goodrich Company Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
EP0819986B1 (en) * 1996-07-19 2002-03-27 Agfa-Gevaert Imaging element for making lithographic printing plates
JPH1087733A (ja) * 1996-09-13 1998-04-07 Konica Corp 感光性組成物、感光性平版印刷版材料及び画像形成方法
DE69804876T2 (de) * 1997-01-24 2002-11-14 Fuji Photo Film Co., Ltd. Flachdruckplatte
DE19739299A1 (de) * 1997-09-08 1999-03-11 Agfa Gevaert Ag Weißlicht-unempfindliches, thermisch bebilderbares Material und Verfahren zur Herstellung von Druckformen für den Offsetdruck
TWI250379B (en) * 1998-08-07 2006-03-01 Az Electronic Materials Japan Chemical amplified radiation-sensitive composition which contains onium salt and generator
SG78412A1 (en) * 1999-03-31 2001-02-20 Ciba Sc Holding Ag Oxime derivatives and the use thereof as latent acids

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