JPH11513999A - 再分配反応を実施するオルガノシランの改良製造法 - Google Patents
再分配反応を実施するオルガノシランの改良製造法Info
- Publication number
- JPH11513999A JPH11513999A JP10501298A JP50129898A JPH11513999A JP H11513999 A JPH11513999 A JP H11513999A JP 10501298 A JP10501298 A JP 10501298A JP 50129898 A JP50129898 A JP 50129898A JP H11513999 A JPH11513999 A JP H11513999A
- Authority
- JP
- Japan
- Prior art keywords
- redistribution
- formula
- chlorinated
- catalyst
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 40
- 150000001282 organosilanes Chemical class 0.000 title description 7
- 238000004821 distillation Methods 0.000 claims abstract description 42
- 239000003054 catalyst Substances 0.000 claims abstract description 40
- 150000001875 compounds Chemical class 0.000 claims abstract description 39
- 239000003112 inhibitor Substances 0.000 claims abstract description 32
- 238000006243 chemical reaction Methods 0.000 claims abstract description 26
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000004519 manufacturing process Methods 0.000 claims abstract description 8
- 229910000077 silane Inorganic materials 0.000 claims abstract description 8
- 239000012530 fluid Substances 0.000 claims abstract description 6
- 125000005375 organosiloxane group Chemical group 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims abstract description 5
- 239000002184 metal Substances 0.000 claims abstract description 5
- 239000002841 Lewis acid Substances 0.000 claims abstract description 4
- 125000003118 aryl group Chemical group 0.000 claims abstract description 4
- 229910052738 indium Inorganic materials 0.000 claims abstract description 4
- 150000007517 lewis acids Chemical class 0.000 claims abstract description 4
- 229910052787 antimony Inorganic materials 0.000 claims abstract description 3
- 229910052796 boron Inorganic materials 0.000 claims abstract description 3
- 229910052793 cadmium Inorganic materials 0.000 claims abstract description 3
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 3
- 125000005843 halogen group Chemical group 0.000 claims abstract description 3
- 229910052742 iron Inorganic materials 0.000 claims abstract description 3
- 229910052745 lead Inorganic materials 0.000 claims abstract description 3
- 229910052718 tin Inorganic materials 0.000 claims abstract description 3
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 3
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 3
- 125000004429 atom Chemical group 0.000 claims abstract 3
- 239000011541 reaction mixture Substances 0.000 claims description 21
- 150000004756 silanes Chemical class 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 16
- 229920001296 polysiloxane Polymers 0.000 claims description 16
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 7
- 125000004122 cyclic group Chemical group 0.000 claims description 5
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 150000002367 halogens Chemical class 0.000 claims description 4
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 claims description 2
- 229910021591 Copper(I) chloride Inorganic materials 0.000 claims description 2
- 229910021607 Silver chloride Inorganic materials 0.000 claims description 2
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 229920005862 polyol Polymers 0.000 claims description 2
- 150000003077 polyols Chemical class 0.000 claims description 2
- 238000000926 separation method Methods 0.000 claims description 2
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 claims description 2
- 239000003513 alkali Substances 0.000 claims 1
- 150000001805 chlorine compounds Chemical group 0.000 claims 1
- 239000000460 chlorine Substances 0.000 abstract description 3
- 229910052802 copper Inorganic materials 0.000 abstract description 3
- 229910052801 chlorine Inorganic materials 0.000 abstract description 2
- 229910052709 silver Inorganic materials 0.000 abstract description 2
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 abstract 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 239000001301 oxygen Substances 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 32
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 18
- 229910052757 nitrogen Inorganic materials 0.000 description 16
- 238000003756 stirring Methods 0.000 description 16
- 239000007789 gas Substances 0.000 description 14
- -1 3,3,3-trifluoropropyl Chemical group 0.000 description 11
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 8
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 8
- 238000004587 chromatography analysis Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 229910001220 stainless steel Inorganic materials 0.000 description 8
- 239000010935 stainless steel Substances 0.000 description 8
- 238000007323 disproportionation reaction Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000006227 byproduct Substances 0.000 description 6
- 239000003921 oil Substances 0.000 description 6
- 230000009286 beneficial effect Effects 0.000 description 5
- 238000007872 degassing Methods 0.000 description 5
- 239000004205 dimethyl polysiloxane Substances 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 5
- 238000007086 side reaction Methods 0.000 description 5
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 229910019250 POS3 Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 125000004430 oxygen atom Chemical group O* 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 241000894007 species Species 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000008030 elimination Effects 0.000 description 2
- 238000003379 elimination reaction Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 239000005051 trimethylchlorosilane Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 239000005046 Chlorosilane Substances 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 241000233855 Orchidaceae Species 0.000 description 1
- 229910020487 SiO3/2 Inorganic materials 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- 229910052770 Uranium Inorganic materials 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 150000001348 alkyl chlorides Chemical class 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 125000005418 aryl aryl group Chemical group 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000003889 chemical engineering Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000000068 chlorophenyl group Chemical group 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
- 125000004188 dichlorophenyl group Chemical group 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/20—Purification, separation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
- C07F7/125—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving both Si-C and Si-halogen linkages, the Si-C and Si-halogen linkages can be to the same or to different Si atoms, e.g. redistribution reactions
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Silicon Compounds (AREA)
- Silicon Polymers (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. ・式(1)(R)a(H)bSiCl4-a-bの塩素化オルガノヒドロシラ ンと、式(2)(R’)cSiCl4-cの有機置換されそして随意に塩素化された シランとの間の再分配反応(前記式において、a=1又は2、b=1又は2、a +b=3、c=1、2、3又は4、そして記号R及びR’は同種又は異種であっ て、それぞれ、線状若しくは分岐状C1〜C6アルキル基又はC2〜C12アリール 基を表す)を、式(3)M(X)dのルイス酸(ここで、MはTi、Fe、Cu 、Ag、Zn、Cd、Hg、Al、Ga、In、B、Sn、Pb、Sb及びBi から選択される金属を表し、Xはハロゲン原子を表し、そしてdは金属Mの原子 価である)よりなる触媒の有効量の存在下に行ない、そして ・再分配によって生成された塩素化オルガノヒドロシランを蒸留によって分離す る、 ことを含むオルガノシロキサンの製造法において、 再分配後に、再分配触媒を抑制する少なくとも1種の化合物を導入し、この化 合物は、次の規定、 ・それは、25℃においてせいぜい5000mPa.s の粘度を有する流体ポリオル ガノシロキサン(略語POS)から選択されること、 ・それは、比率r が0.9以下になるような割合で使用されること、 を満たすことを特徴とするオルガノシロキサンの改良製造法。 2. 抑制剤シリコーン化合物は、比率rが0.6〜0.9の範囲内にあるよ うな割合で使用されることを特徴とする請求項1記載の方法。 3. 抑制剤シリコーン化合物が、 (i)下記の式(4)の単位よりなる線状又は実質上線状のPOSであって、 鎖の一端が式(5)の単位によってそして他端が式(6)の単位によって停止さ れたPOS、 (2i)式(4)の単位よりなる環状POS、 (3i)幾つかの種(i)又は(2i)の互いの混合物 (4i)1種以上の種(i)と1種以上の種(2i)との混合物 であってよく、そして上記式において、 ・記号R1は同種又は異種であって、それぞれ、1個又はそれ以上のハロゲンに よって随意に置換される線状若しくは分岐状C1〜C8アルキル基、C5〜C8アル キル基、又は、C6〜C12アリール部分及びC1〜C4アルキル部分を有しそして 芳香族部分で1個又はそれ以上のハロゲン、C1〜C3アルキル及び/又はC1〜 C3アルコキシによって随意に置換されるC6〜C12アリール基若しくはアルカリ ール基を表し、 ・記号Yは同種又は異種であって、それぞれ、R1基又はOR2基(ここで、R2 は水素原子又は線状若しくは分岐状C1〜C3アルキル基である)のどちらかを表 す、 であってよいことを特徴とする請求項1又は2記載の方法。 4. 抑制剤シリコーン化合物が、せいぜい1000 mPa.sの25℃での粘度 を有しそしてその記号R1の数の少なくとも60%がメチル基を表すところのタ イプ(i)、(2i)、(3i)又は(4i)の流体よりなることを特徴とする 請求項3記載の方法。 5. 触媒として使用されるルイス酸が塩化物及び臭化物であることを特徴と する請求項1〜4のいずれか一項記載の方法。 6. 触媒が、TiCl4、FeCl3、CuCl、AgCl、ZnCl2、A lCl3、SnCl2、BiCl3及びそれらの種々の混合物によって形成される 群 から選択されることを特徴とする請求項5記載の方法。 7. 触媒が、出発時に仕込まれる式(1)及び(2)のシランの総重量に対 して0.1〜10重量%の範囲内の重量割合で使用されることを特徴とする請求 項1〜6のいずれか一項記載の方法。 8. ・再分配反応が50〜200℃の温度においてそして有益下には自然圧 下に実施され、 ・続いて、反応混合物が40℃未満の温度に冷却され、 ・次いで、抑制剤シリコーン化合物が導入され、そして ・最後に、再分配によって生成された目的とする塩素化オルガノヒドロシロキサ ンが蒸留によって分離される、 ことを特徴とする請求項1〜7のいずれか一項記載の方法。 9.・再分配反応が50〜200℃の温度においてそして有益下には自然圧下 に実施され、 ・抑制剤シリコーン化合物が導入されて再分配が停止され、 ・続いて、反応混合物が40℃未満の温度に冷却され、そして ・最後に、目的とする塩素化オルガノヒドロシロキサンが蒸留によって分離され る、 ことを特徴とする請求項1〜7のいずれか一項記載の方法。 10. 反応させられる2種のシラン、即ち、式(1)の塩素化オルガノヒド ロシラン及び式(2)の随意に塩素化されたシランに関して、記号R及びR’は 同種又は異種であって、それぞれ、線状若しくは分岐状C1〜C3アルキル基又は フェニル基を表すことを特徴とする請求項1〜9のいずれか一項記載の方法。 11. 再分配反応が、式RHSiCl2の塩素化オルガノヒドロシラン(1 )と式 R’3SiClの有機置換塩素化シラン(2)(この場合に、a=1、b =1及びc=3)との間で実施されることを特徴とする請求項1〜10のいずれ か一項記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9607569A FR2749848B1 (fr) | 1996-06-12 | 1996-06-12 | Procede ameliore d'obtention d'organosilanes mettant en oeuvre une reaction de redistribution |
FR96/07569 | 1996-06-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH11513999A true JPH11513999A (ja) | 1999-11-30 |
JP3182154B2 JP3182154B2 (ja) | 2001-07-03 |
Family
ID=9493165
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50129898A Expired - Lifetime JP3182154B2 (ja) | 1996-06-12 | 1997-06-11 | 再分配反応を実施するオルガノシランの改良製造法 |
Country Status (13)
Country | Link |
---|---|
US (1) | US6140526A (ja) |
EP (1) | EP0906320B1 (ja) |
JP (1) | JP3182154B2 (ja) |
CN (1) | CN1085670C (ja) |
AT (1) | ATE215544T1 (ja) |
AU (1) | AU3266397A (ja) |
DE (1) | DE69711625T2 (ja) |
DK (1) | DK0906320T3 (ja) |
EA (1) | EA001709B1 (ja) |
ES (1) | ES2171953T3 (ja) |
FR (1) | FR2749848B1 (ja) |
PT (1) | PT906320E (ja) |
WO (1) | WO1997047629A1 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2761360B1 (fr) * | 1997-03-27 | 1999-05-21 | Rhodia Chimie Sa | Procede ameliore d'obtention d'organosilanes mettant en oeuvre une reaction de redistribution |
DE10157198C2 (de) * | 2001-11-22 | 2002-11-14 | Wacker Chemie Gmbh | Ligandentausch an Organochlorsilanen in ionischen Flüssigkeiten |
DE102013200675A1 (de) * | 2013-01-17 | 2014-07-17 | Wacker Chemie Ag | Verfahren zur Herstellung von Alkylchlorsilanen durch Umlagerungsreaktionen |
CN113651844B (zh) * | 2021-08-20 | 2023-09-12 | 唐山偶联硅业有限公司 | 连续法制备二甲基氢氯硅烷的工艺 |
CN113480567B (zh) * | 2021-08-20 | 2022-11-22 | 唐山偶联硅业有限公司 | 均相歧化反应制备二甲基氢氯硅烷的方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA977769A (en) * | 1970-12-21 | 1975-11-11 | General Electric Company | Redistribution of alkylhydrosilanes |
FR2279755A1 (fr) * | 1974-07-26 | 1976-02-20 | Rhone Poulenc Ind | Procede de preparation de chlorosilanes et emploi des chlorosilanes ainsi obtenus |
FR2552436B1 (fr) * | 1983-09-28 | 1985-10-25 | Rhone Poulenc Spec Chim | Nouveau procede de fabrication d'hydrogeno-silanes par reaction de redistribution |
DE19520737C2 (de) * | 1995-06-07 | 2003-04-24 | Degussa | Verfahren zur Herstellung von Alkylhydrogenchlorsilanen |
DE19718470A1 (de) * | 1997-04-30 | 1998-11-05 | Wacker Chemie Gmbh | Verfahren zur Herstellung von Si-gebundene Wasserstoffatome aufweisenden Organosiliciumverbindungen |
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1996
- 1996-06-12 FR FR9607569A patent/FR2749848B1/fr not_active Expired - Fee Related
-
1997
- 1997-06-11 WO PCT/FR1997/001034 patent/WO1997047629A1/fr active IP Right Grant
- 1997-06-11 JP JP50129898A patent/JP3182154B2/ja not_active Expired - Lifetime
- 1997-06-11 DK DK97928325T patent/DK0906320T3/da active
- 1997-06-11 AT AT97928325T patent/ATE215544T1/de not_active IP Right Cessation
- 1997-06-11 DE DE69711625T patent/DE69711625T2/de not_active Expired - Lifetime
- 1997-06-11 US US09/202,100 patent/US6140526A/en not_active Expired - Lifetime
- 1997-06-11 PT PT97928325T patent/PT906320E/pt unknown
- 1997-06-11 AU AU32663/97A patent/AU3266397A/en not_active Abandoned
- 1997-06-11 CN CN97195464A patent/CN1085670C/zh not_active Expired - Lifetime
- 1997-06-11 EA EA199900018A patent/EA001709B1/ru not_active IP Right Cessation
- 1997-06-11 ES ES97928325T patent/ES2171953T3/es not_active Expired - Lifetime
- 1997-06-11 EP EP97928325A patent/EP0906320B1/fr not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP3182154B2 (ja) | 2001-07-03 |
FR2749848B1 (fr) | 1998-08-21 |
CN1222156A (zh) | 1999-07-07 |
FR2749848A1 (fr) | 1997-12-19 |
CN1085670C (zh) | 2002-05-29 |
EA199900018A1 (ru) | 1999-06-24 |
DK0906320T3 (da) | 2002-07-01 |
AU3266397A (en) | 1998-01-07 |
EP0906320A1 (fr) | 1999-04-07 |
EP0906320B1 (fr) | 2002-04-03 |
DE69711625T2 (de) | 2002-09-12 |
PT906320E (pt) | 2002-08-30 |
ATE215544T1 (de) | 2002-04-15 |
WO1997047629A1 (fr) | 1997-12-18 |
EA001709B1 (ru) | 2001-06-25 |
US6140526A (en) | 2000-10-31 |
ES2171953T3 (es) | 2002-09-16 |
DE69711625D1 (de) | 2002-05-08 |
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