JPH11510314A5 - - Google Patents

Info

Publication number
JPH11510314A5
JPH11510314A5 JP1997507367A JP50736797A JPH11510314A5 JP H11510314 A5 JPH11510314 A5 JP H11510314A5 JP 1997507367 A JP1997507367 A JP 1997507367A JP 50736797 A JP50736797 A JP 50736797A JP H11510314 A5 JPH11510314 A5 JP H11510314A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP1997507367A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11510314A (ja
Filing date
Publication date
Priority claimed from GBGB9515439.9A external-priority patent/GB9515439D0/en
Application filed filed Critical
Publication of JPH11510314A publication Critical patent/JPH11510314A/ja
Publication of JPH11510314A5 publication Critical patent/JPH11510314A5/ja
Ceased legal-status Critical Current

Links

JP9507367A 1995-07-27 1996-07-29 金属量子ドットの製造法 Ceased JPH11510314A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB9515439.9 1995-07-27
GBGB9515439.9A GB9515439D0 (en) 1995-07-27 1995-07-27 Method of producing metal quantum dots
PCT/GB1996/001853 WO1997004906A1 (en) 1995-07-27 1996-07-29 Method of producing metal quantum dots

Publications (2)

Publication Number Publication Date
JPH11510314A JPH11510314A (ja) 1999-09-07
JPH11510314A5 true JPH11510314A5 (enExample) 2004-08-26

Family

ID=10778372

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9507367A Ceased JPH11510314A (ja) 1995-07-27 1996-07-29 金属量子ドットの製造法

Country Status (7)

Country Link
US (1) US5965212A (enExample)
EP (1) EP0871557B1 (enExample)
JP (1) JPH11510314A (enExample)
DE (1) DE69604089T2 (enExample)
ES (1) ES2137720T3 (enExample)
GB (1) GB9515439D0 (enExample)
WO (1) WO1997004906A1 (enExample)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3012547B2 (ja) * 1997-02-25 2000-02-21 日本ビクター株式会社 光記録媒体及びその製造方法
US7045015B2 (en) 1998-09-30 2006-05-16 Optomec Design Company Apparatuses and method for maskless mesoscale material deposition
US20050156991A1 (en) * 1998-09-30 2005-07-21 Optomec Design Company Maskless direct write of copper using an annular aerosol jet
US8110247B2 (en) 1998-09-30 2012-02-07 Optomec Design Company Laser processing for heat-sensitive mesoscale deposition of oxygen-sensitive materials
US7294366B2 (en) * 1998-09-30 2007-11-13 Optomec Design Company Laser processing for heat-sensitive mesoscale deposition
US7108894B2 (en) 1998-09-30 2006-09-19 Optomec Design Company Direct Write™ System
US7938079B2 (en) 1998-09-30 2011-05-10 Optomec Design Company Annular aerosol jet deposition using an extended nozzle
US20040197493A1 (en) * 1998-09-30 2004-10-07 Optomec Design Company Apparatus, methods and precision spray processes for direct write and maskless mesoscale material deposition
US6179912B1 (en) * 1999-12-20 2001-01-30 Biocrystal Ltd. Continuous flow process for production of semiconductor nanocrystals
US20030106488A1 (en) * 2001-12-10 2003-06-12 Wen-Chiang Huang Manufacturing method for semiconductor quantum particles
KR100682886B1 (ko) 2003-12-18 2007-02-15 삼성전자주식회사 나노입자의 제조방법
US7405002B2 (en) 2004-08-04 2008-07-29 Agency For Science, Technology And Research Coated water-soluble nanoparticles comprising semiconductor core and silica coating
US7534489B2 (en) * 2004-09-24 2009-05-19 Agency For Science, Technology And Research Coated composites of magnetic material and quantum dots
US20060280866A1 (en) * 2004-10-13 2006-12-14 Optomec Design Company Method and apparatus for mesoscale deposition of biological materials and biomaterials
TWI287255B (en) 2004-10-21 2007-09-21 Hoya Corp Apparatus and method for depositing fine particles, and manufacturing method of light-emitting element
US20060127931A1 (en) * 2004-11-15 2006-06-15 Bradley Schmidt Particle detector with waveguide light confinement
US7674671B2 (en) 2004-12-13 2010-03-09 Optomec Design Company Aerodynamic jetting of aerosolized fluids for fabrication of passive structures
US7938341B2 (en) 2004-12-13 2011-05-10 Optomec Design Company Miniature aerosol jet and aerosol jet array
US7309642B2 (en) * 2005-11-09 2007-12-18 Hewlett-Packard Development Company, L.P. Metallic quantum dots fabricated by a superlattice structure
US8167972B2 (en) * 2006-06-30 2012-05-01 N.E. Chemcat Corporation Process for producing metal nanoparticle and metal nanoparticle produced by the process
DE102006033037A1 (de) * 2006-07-14 2008-01-24 Universität Bielefeld Einstufiges Verfahren zur Aufbringung einer Metallschicht auf ein Substrat
US7829162B2 (en) 2006-08-29 2010-11-09 international imagining materials, inc Thermal transfer ribbon
WO2008063653A1 (en) 2006-11-21 2008-05-29 Qd Vision, Inc. Semiconductor nanocrystals and compositions and devices including same
WO2008063652A1 (en) 2006-11-21 2008-05-29 Qd Vision, Inc. Blue emitting semiconductor nanocrystals and compositions and devices including same
WO2008063658A2 (en) 2006-11-21 2008-05-29 Qd Vision, Inc. Semiconductor nanocrystals and compositions and devices including same
DE102006060366B8 (de) * 2006-12-16 2013-08-01 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh Verfahren zur Herstellung von von einer Matrix abgedeckten Quantenpunkten
TWI482662B (zh) 2007-08-30 2015-05-01 Optomec Inc 機械上一體式及緊密式耦合之列印頭以及噴霧源
TWI538737B (zh) 2007-08-31 2016-06-21 阿普托麥克股份有限公司 材料沉積總成
US8887658B2 (en) 2007-10-09 2014-11-18 Optomec, Inc. Multiple sheath multiple capillary aerosol jet
KR100981309B1 (ko) 2007-12-06 2010-09-10 한국세라믹기술원 양자점 재료 증착박막 형성방법 및 그 생성물
CN101279373B (zh) * 2007-12-28 2010-05-19 天津大学 一种二次库仑分裂制备纳米颗粒的装置
KR101995371B1 (ko) 2008-04-03 2019-07-02 삼성 리서치 아메리카 인코포레이티드 양자점들을 포함하는 발광 소자
US9525148B2 (en) 2008-04-03 2016-12-20 Qd Vision, Inc. Device including quantum dots
WO2009153669A2 (en) 2008-06-17 2009-12-23 National Research Council Of Canada Atomistic quantum dots
US8064059B2 (en) * 2008-11-04 2011-11-22 Alipasha Vaziri Optical pulse duration measurement
WO2016130709A1 (en) 2015-02-10 2016-08-18 Optomec, Inc. Fabrication of three-dimensional structures by in-flight curing of aerosols
WO2019094979A1 (en) 2017-11-13 2019-05-16 Optomec, Inc. Shuttering of aerosol streams
CN111826636B (zh) * 2020-08-21 2022-12-13 南京工程学院 一种同腔制造氧化锌、氧化钛或氧化镍量子点的方法及设备
TW202247905A (zh) 2021-04-29 2022-12-16 美商阿普托麥克股份有限公司 用於氣溶膠噴射裝置之高可靠性鞘護輸送路徑
AU2023277010A1 (en) * 2022-05-26 2025-01-16 Katsuya Nishizawa Conductive line, transfer device, and space solar beam energy transportation method
CN116510756B (zh) * 2023-04-28 2023-10-03 广东工业大学 一种高熵氟化物量子点纳米酶、制备方法及其生化检测应用

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4844736A (en) * 1986-11-04 1989-07-04 Idemitsu Kosan Co., Ltd. Method for the preparation of finely divided metal particles
GB2215122A (en) * 1988-02-12 1989-09-13 Philips Electronic Associated A method of forming a quantum dot structure

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