JPH11501755A - 多層磁気記録媒体と磁気抵抗型駆動システム - Google Patents
多層磁気記録媒体と磁気抵抗型駆動システムInfo
- Publication number
- JPH11501755A JPH11501755A JP8524323A JP52432396A JPH11501755A JP H11501755 A JPH11501755 A JP H11501755A JP 8524323 A JP8524323 A JP 8524323A JP 52432396 A JP52432396 A JP 52432396A JP H11501755 A JPH11501755 A JP H11501755A
- Authority
- JP
- Japan
- Prior art keywords
- medium
- thickness
- layer
- magnetic
- media
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims abstract description 113
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 85
- 230000006911 nucleation Effects 0.000 claims abstract description 56
- 238000010899 nucleation Methods 0.000 claims abstract description 56
- 229910052763 palladium Inorganic materials 0.000 claims abstract description 51
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 46
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 45
- 239000010941 cobalt Substances 0.000 claims abstract description 45
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 42
- 239000000758 substrate Substances 0.000 claims abstract description 37
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 35
- 239000000956 alloy Substances 0.000 claims abstract description 35
- 238000000034 method Methods 0.000 claims abstract description 26
- 230000008569 process Effects 0.000 claims abstract description 17
- 238000003860 storage Methods 0.000 claims abstract description 17
- 230000006872 improvement Effects 0.000 claims abstract description 6
- 230000004907 flux Effects 0.000 claims description 42
- 238000000137 annealing Methods 0.000 claims description 39
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 27
- 229910052751 metal Inorganic materials 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 27
- 239000001301 oxygen Substances 0.000 claims description 27
- 229910052760 oxygen Inorganic materials 0.000 claims description 27
- 238000000151 deposition Methods 0.000 claims description 18
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 230000002452 interceptive effect Effects 0.000 claims description 2
- 239000010410 layer Substances 0.000 abstract description 206
- 229910000531 Co alloy Inorganic materials 0.000 abstract description 8
- 229910000510 noble metal Inorganic materials 0.000 abstract description 7
- 239000011241 protective layer Substances 0.000 abstract description 7
- 229910052782 aluminium Inorganic materials 0.000 abstract description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 4
- 239000013078 crystal Substances 0.000 description 29
- 230000000694 effects Effects 0.000 description 27
- 238000001228 spectrum Methods 0.000 description 24
- 238000004544 sputter deposition Methods 0.000 description 24
- 230000002829 reductive effect Effects 0.000 description 22
- 239000011651 chromium Substances 0.000 description 18
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 17
- 229910052804 chromium Inorganic materials 0.000 description 17
- 239000000696 magnetic material Substances 0.000 description 15
- 239000010952 cobalt-chrome Substances 0.000 description 14
- 230000005415 magnetization Effects 0.000 description 13
- 230000008859 change Effects 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 230000007704 transition Effects 0.000 description 9
- 239000002245 particle Substances 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- 238000002474 experimental method Methods 0.000 description 7
- 238000003199 nucleic acid amplification method Methods 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- 230000003321 amplification Effects 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- 229910000889 permalloy Inorganic materials 0.000 description 6
- 238000013461 design Methods 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- 230000009467 reduction Effects 0.000 description 5
- 229910000684 Cobalt-chrome Inorganic materials 0.000 description 4
- 238000013459 approach Methods 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000010970 precious metal Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 229910000645 Hg alloy Inorganic materials 0.000 description 2
- -1 Lamic Chemical compound 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- TZVJRPRFJIXRGV-UHFFFAOYSA-N [Cr].[Co].[Ta] Chemical compound [Cr].[Co].[Ta] TZVJRPRFJIXRGV-UHFFFAOYSA-N 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 2
- 229910052793 cadmium Inorganic materials 0.000 description 2
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000004069 differentiation Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000001552 radio frequency sputter deposition Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000010183 spectrum analysis Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- 241000257465 Echinoidea Species 0.000 description 1
- 229910015372 FeAl Inorganic materials 0.000 description 1
- 229910015183 FeNx Inorganic materials 0.000 description 1
- 229910005347 FeSi Inorganic materials 0.000 description 1
- 229910005438 FeTi Inorganic materials 0.000 description 1
- 241001676573 Minium Species 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910001362 Ta alloys Inorganic materials 0.000 description 1
- XKMAKWPZGDBONG-UHFFFAOYSA-N [Co].[Cd] Chemical compound [Co].[Cd] XKMAKWPZGDBONG-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- 235000012255 calcium oxide Nutrition 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000012864 cross contamination Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000005347 demagnetization Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000010365 information processing Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 238000005325 percolation Methods 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920003055 poly(ester-imide) Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000131 polyvinylidene Polymers 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052705 radium Inorganic materials 0.000 description 1
- HCWPIIXVSYCSAN-UHFFFAOYSA-N radium atom Chemical compound [Ra] HCWPIIXVSYCSAN-UHFFFAOYSA-N 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 238000010079 rubber tapping Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
- G11B5/3967—Composite structural arrangements of transducers, e.g. inductive write and magnetoresistive read
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/676—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers having magnetic layers separated by a nonmagnetic layer, e.g. antiferromagnetic layer, Cu layer or coupling layer
- G11B5/678—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers having magnetic layers separated by a nonmagnetic layer, e.g. antiferromagnetic layer, Cu layer or coupling layer having three or more magnetic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B2005/0002—Special dispositions or recording techniques
- G11B2005/0005—Arrangements, methods or circuits
- G11B2005/001—Controlling recording characteristics of record carriers or transducing characteristics of transducers by means not being part of their structure
- G11B2005/0013—Controlling recording characteristics of record carriers or transducing characteristics of transducers by means not being part of their structure of transducers, e.g. linearisation, equalisation
- G11B2005/0016—Controlling recording characteristics of record carriers or transducing characteristics of transducers by means not being part of their structure of transducers, e.g. linearisation, equalisation of magnetoresistive transducers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B2005/0002—Special dispositions or recording techniques
- G11B2005/0026—Pulse recording
- G11B2005/0029—Pulse recording using magnetisation components of the recording layer disposed mainly perpendicularly to the record carrier surface
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/90—Magnetic feature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/9265—Special properties
- Y10S428/928—Magnetic property
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12465—All metal or with adjacent metals having magnetic properties, or preformed fiber orientation coordinate with shape
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12632—Four or more distinct components with alternate recurrence of each type component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12875—Platinum group metal-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.磁気記録媒体において、 厚さが50Åより厚いパラジウムまたはプラチナの群から選択された非磁性体金 属の核形成層が蒸着された基板と、垂直の磁気異方性を有し、第1の厚さを有す る磁性体金属またはその合金と、第2の厚さを有するパラジウムまたはプラチナ の群から選択された非磁性体金属との複数の複層とからなる記録層、とから構成 されたことを特徴とする磁気記録媒体。 2.第1の厚さが約1.5Åと10Åとの間であることを特徴とする請求の範囲第1 項に記載の媒体。 3.第1の厚さが約2Åと7Åとの間であることを特徴とする請求の範囲第1項 に記載の媒体。 4.第1の厚さが約3Åと5Åとの間であることを特徴とする請求の範囲第1項 に記載の媒体。 5.磁性体層がコバルトからなることを特徴とする請求の範囲第1項に記載の媒 体。 6.第1の厚さが約1.5Åと10Åとの間であることを特徴とする請求の範囲第5 項に記載の媒体。 7.第1の厚さが約2Åと7Åとの間であることを特徴とする請求の範囲第5項 に記載の媒体。 8.第1の厚さが約3Åと5Åとの間であることを特徴とする請求の範囲第5項 に記載の媒体。 9.第2の厚さが約5Åと15Åとの間であることを特徴とする請求の範囲第1項 に記載の媒体。 10.第2の厚さが約7Åと12Åとの間であることを特徴とする請求の範囲第1項 に記載の媒体。 11.第2の厚さが約8Åと11Åとの間であることを特徴とする請求の範囲第1項 に記載の媒体。 12.核形成層の厚さが約 200Åと約 600Åとの間であることを特徴とする請求の 範囲第1項に記載の媒体。 13.複層の数が約10と30との間であることを特徴とする請求の範囲第1項に記載 の媒体。 14.複層の数が約15と25との間であることを特徴とする請求の範囲第1項に記載 の媒体。 15.核形成層と記録媒体との厚さ全体が1500Åを超えないことを特徴とする請求 の範囲第1項に記載の媒体。 16.媒体の保磁力が約2500エルステッドを超えることを特徴とする請求の範囲第 1項に記載の媒体。 17.核形成層と基板との間に配置されたキーパー層を更に設けたことを特徴とす る請求の範囲第1項に記載の媒体。 18.キーパー層をNiFe合金から形成したことを特徴とする請求の範囲第17項に記 載の媒体。 19.キーパー層の厚さが約2μm から約6μm の間であることを特徴とする請求 の範囲第17項に記載の媒体。 20.厚さが50Åより厚いパラジウムまたはプラチナの群から選択された非磁性体 金属の核形成層が蒸着された基板と、第1の厚さを有するコバルトまたはその合 金と、第2の厚さを有するパラジウムまたはプラチナの群から選択された非磁性 体金属との複数の2重層とからなる記録層、とから構成された磁気記録媒体にお いて、 第1の厚さが約1.5Åと10Åとの間であり、第2の厚さが約5Åと15Åとの間 であり、2重層の数が約10と30との間であり、核形成層と記録媒体との厚さ全体 が1500Åを超えず、媒体の保磁力が約2500エールステッドを超えることを特徴と する媒体。 21.第1の厚さが約2Åと7Åとの間であることを特徴とする請求の範囲第20項 に記載の媒体。 22.第1の厚さが約3Åと5Åとの間であることを特徴とする請求の範囲第20項 に記載の媒体。 23.第2の厚さが約7Åと12Åとの間であることを特徴とする請求の範囲第20項 に記載の媒体。 24.第2の厚さが約8Åと11Åとの間であることを特徴とする請求の範囲第20項 に記載の媒体。 25.核形成層の厚さが約 200Åと約 600Åとの間であることを特徴とする請求の 範囲第20項に記載の媒体。 26.2重層の数が約1約15と25との間であることを特徴とする請求の範囲第20項 に記載の媒体。 27.核形成層と基板との間に配置されたキーパー層を更に設けたことを特徴とす る請求の範囲第20項に記載の媒体。 28.キーパー層をNiFe合金から形成したことを特徴とする請求の範囲第27項に記 載の媒体。 29.キーパー層の厚さが約2μm から約6μm の間であることを特徴とする請求 の範囲第27項に記載の媒体。 30.磁気記録媒体を製造する工程において、 基板を備え、 基板上に厚さが約50Åより厚いパラジウムとプラチナの群から選択された核形 成層を真空蒸着し、 核形成層上に、第1の厚さを有するコバルトまたはその合金と、第2の厚さを 有するパラジウムまたはプラチナの群から選択された非磁性体金属との複数の複 層からなる記録層を真空蒸着する、各ステップからなることを特徴とする工程。 31.核形成層の蒸着ステップの後に酸素を介在させて媒体を焼なましするステッ プを更に含むことを特徴とする請求の範囲第30項に記載の工程。 32.核形成層を蒸着する前に基板上にキーパー層を真空蒸着するステップを更に 含むことを特徴とする請求の範囲第30項に記載の工程。 33.核形成層を蒸着する前に酸素を介在させてキーパー層とともに媒体を焼なま しするステップを更にに含むことを特徴とする請求の範囲第32項に記載の工程。 34.核形成層を蒸着するステップを酸素を介在させて実施することを特徴とする 請求の範囲第30項に記載の工程。 35.記録層を蒸着するステップを酸素を介在させて実施することを特徴とする請 求の範囲第30項に記載の工程。 36.情報記憶装置において、 情報を磁束の形式で受信し、記憶し、かつ読取るために2×106erg /ccか、 それ以上である垂直の磁気異方性kuを有する平坦な磁気記録媒体と、 環状の書込み素子と、磁気抵抗(MR)読取りヘッドとからなり、媒体に磁束の 形式で情報を書込み、媒体から磁束の形式で情報を読取るための読取り/書込み ヘッドと、からなることを特徴とする情報記憶装置。 37.磁気記録媒体が更に、 厚さが50Åより厚いパラジウムまたはプラチナの群から選択された非磁性体金 属の核形成層が蒸着された基板と、第1の厚さを有するコバルトまたはその合金 と、第2の厚さを有するパラジウムまたはプラチナの群から選択された非磁性体 金属との複数の2重層とからなる記録層、とを更に備えていて、 第1の厚さが約1.5Åと10Åとの間であり、第2の厚さが約5Åと15Åとの間 であり、2重層の数が約10と30との間であり、核形成層と記録媒体との厚さ全体 が1500Åを超えないことを特徴とする請求の範囲第36項に記載の装置。 38.MR素子が媒体の平面に対して垂直に延びる線に対して約−10°から10°の角 度で物理的に偏倚されたことを特徴とする請求の範囲第36項に記載の装置。 39.磁気情報を磁気記録媒体に書込むための環状ヘッドと、磁気情報を磁気記録 媒体から読取るための磁気抵抗(MR)ヘッドとからなる種類の磁気書込み−読取 りヘッドにおいて、MRヘッドが磁気記録媒体に対して垂直の方向にヘッド内に配 置されたMR素子からなり、 MR素子が磁気記録媒体に対して約−10°から10°の角度で物理的に偏倚される ようにMR層に物理的な偏倚を加えたことに改良点があることを特徴とする磁気書 込み−読取りヘッド。 40.情報記憶装置において、 ハウジングと、記憶媒体と、記憶媒体を回転させる手段と、情報を記憶媒体に 対して読取り、書込みするために記憶媒体の近傍に配置した少なくとも1個の相 互作用素子を含むアクチュエアタ・アセンブリとを備え、 記憶媒体が、 厚さが50Åより厚いパラジウムまたはプラチナの群から選択された非磁性体金 属の核形成層が蒸着された基板と、垂直の磁気異方性を有し、第1の厚さを有す る磁性体金属またはその合金と、第2の厚さを有するパラジウムまたはプラチナ の群から選択された非磁性体金属との複数の複層とからなる記録層、とから構成 されたことを特徴とする情報記憶装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US08/385,107 | 1995-02-07 | ||
US08/385,107 US5750270A (en) | 1995-02-07 | 1995-02-07 | Multi-layer magnetic recording media |
PCT/US1996/001364 WO1996024927A1 (en) | 1995-02-07 | 1996-02-01 | Multi-layer magnetic recording media and magnetoresistive drive systems |
Publications (2)
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JPH11501755A true JPH11501755A (ja) | 1999-02-09 |
JP3846900B2 JP3846900B2 (ja) | 2006-11-15 |
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Application Number | Title | Priority Date | Filing Date |
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JP52432396A Expired - Fee Related JP3846900B2 (ja) | 1995-02-07 | 1996-02-01 | 多層磁気記録媒体と磁気抵抗型駆動システム |
Country Status (7)
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US (1) | US5750270A (ja) |
EP (1) | EP0808497B1 (ja) |
JP (1) | JP3846900B2 (ja) |
KR (1) | KR100412256B1 (ja) |
CN (1) | CN1129894C (ja) |
DE (1) | DE69603013T2 (ja) |
WO (1) | WO1996024927A1 (ja) |
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US5106703A (en) * | 1989-11-27 | 1992-04-21 | Carcia Peter F | Platinum/cobalt multilayer film for magneto-optical recording |
EP0459413B1 (en) * | 1990-05-29 | 1996-02-28 | Oki Electric Industry Company, Limited | Method for fabricating a magnetic recording medium |
EP0459411B1 (en) * | 1990-05-29 | 1996-01-17 | Oki Electric Industry Company, Limited | Magnetic recording medium |
-
1995
- 1995-02-07 US US08/385,107 patent/US5750270A/en not_active Expired - Lifetime
-
1996
- 1996-02-01 JP JP52432396A patent/JP3846900B2/ja not_active Expired - Fee Related
- 1996-02-01 KR KR1019970705405A patent/KR100412256B1/ko not_active IP Right Cessation
- 1996-02-01 CN CN96193117A patent/CN1129894C/zh not_active Expired - Fee Related
- 1996-02-01 WO PCT/US1996/001364 patent/WO1996024927A1/en active IP Right Grant
- 1996-02-01 EP EP96906253A patent/EP0808497B1/en not_active Expired - Lifetime
- 1996-02-01 DE DE69603013T patent/DE69603013T2/de not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002157730A (ja) * | 2000-09-11 | 2002-05-31 | Univ Waseda | 磁気記録媒体、その製造方法、および磁気記録再生装置 |
JP4578737B2 (ja) * | 2000-09-11 | 2010-11-10 | 学校法人早稲田大学 | 磁気記録媒体および磁気記録再生装置 |
US6815083B2 (en) | 2002-02-26 | 2004-11-09 | Hitachi, Ltd. | Perpendicular magnetic recording medium and process of production thereof |
Also Published As
Publication number | Publication date |
---|---|
DE69603013D1 (de) | 1999-07-29 |
CN1129894C (zh) | 2003-12-03 |
WO1996024927A1 (en) | 1996-08-15 |
DE69603013T2 (de) | 1999-11-11 |
JP3846900B2 (ja) | 2006-11-15 |
KR100412256B1 (ko) | 2004-06-04 |
EP0808497A1 (en) | 1997-11-26 |
US5750270A (en) | 1998-05-12 |
EP0808497B1 (en) | 1999-06-23 |
CN1181152A (zh) | 1998-05-06 |
KR19980702010A (ko) | 1998-07-15 |
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