JPH11500132A - テトラフルオロエチレンの合成法 - Google Patents
テトラフルオロエチレンの合成法Info
- Publication number
- JPH11500132A JPH11500132A JP8525200A JP52520096A JPH11500132A JP H11500132 A JPH11500132 A JP H11500132A JP 8525200 A JP8525200 A JP 8525200A JP 52520096 A JP52520096 A JP 52520096A JP H11500132 A JPH11500132 A JP H11500132A
- Authority
- JP
- Japan
- Prior art keywords
- hcl
- concentration
- tfe
- amount
- feed stream
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 title claims abstract description 40
- 230000015572 biosynthetic process Effects 0.000 title claims description 8
- 238000003786 synthesis reaction Methods 0.000 title description 3
- 238000000034 method Methods 0.000 claims abstract description 35
- 238000000197 pyrolysis Methods 0.000 claims abstract description 19
- 238000006243 chemical reaction Methods 0.000 claims description 25
- 239000007795 chemical reaction product Substances 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical group O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 239000003085 diluting agent Substances 0.000 claims description 5
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims 1
- 239000005977 Ethylene Substances 0.000 claims 1
- 239000003701 inert diluent Substances 0.000 claims 1
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 abstract description 3
- BCCOBQSFUDVTJQ-UHFFFAOYSA-N octafluorocyclobutane Chemical compound FC1(F)C(F)(F)C(F)(F)C1(F)F BCCOBQSFUDVTJQ-UHFFFAOYSA-N 0.000 abstract description 3
- 235000019407 octafluorocyclobutane Nutrition 0.000 abstract description 3
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 23
- 239000000047 product Substances 0.000 description 16
- 230000007423 decrease Effects 0.000 description 9
- 239000007789 gas Substances 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 238000005979 thermal decomposition reaction Methods 0.000 description 9
- 239000006227 byproduct Substances 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000010790 dilution Methods 0.000 description 6
- 239000012895 dilution Substances 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- -1 For example Inorganic materials 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- KYKAJFCTULSVSH-UHFFFAOYSA-N chloro(fluoro)methane Chemical class F[C]Cl KYKAJFCTULSVSH-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical group FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229910001055 inconels 600 Inorganic materials 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C17/00—Preparation of halogenated hydrocarbons
- C07C17/26—Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton
- C07C17/263—Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton by condensation reactions
- C07C17/269—Preparation of halogenated hydrocarbons by reactions involving an increase in the number of carbon atoms in the skeleton by condensation reactions of only halogenated hydrocarbons
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.CF2HClを熱分解し所望の反応生成物としてのテトラフルオロエチ レンおよび望ましくない反応生成物としてのC4F8が得られる方法であって、熱 分解反応においてC4F8を実質的に消費することなく該望ましくない反応生成物 としてのC4F8の生成を減少させるのに有効な量のC4F8を該CF2HCl一緒 に該熱分解反応に供給し、これによって該テトラフルオロエチレン反応生成物の 収率を増加させることを特徴とする方法。 2.一緒に供給する供給流中のC4F8濃度はC4F8とCF2HClとを一緒 にした量に関し約1〜約18重量%であることを特徴とする請求項1記載の方法 。 3.不活性希釈剤を使用しないことを特徴とする請求項1記載の方法。 4.全圧が0.8〜1.2気圧であり、変化率が10〜50%であることを 特徴とする請求項3記載の方法。 5.該C4F8濃度はC4F8とCF2HClとを一緒にした量に関し約5〜約 10重量%であることを特徴とする請求項4記載の方法。 6.該C4F8濃度は約8〜約10重量%であることを特徴とする請求項5記 載の方法。 7.希釈剤として水蒸気を使用することを特徴とする請求項1記載の方法。 8.該水蒸気は全圧の25〜95%をなしていることを特徴とする請求項7 記載の方法。 9.全圧が0.8〜1.2気圧であり、変化率が30〜90%であ ることを特徴とする請求項8記載の方怯。 10.該C4F8濃度はC4F8とCF2HClとを一緒にした量に関し約4〜約 16重量%であることを特徴とする請求項9記載の方法。 11.変化したCF2HClからのテトラフルオロエチレンの該収率は少なく とも88%であることを特徴とする請求項1記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US39001795A | 1995-02-17 | 1995-02-17 | |
US08/390,017 | 1995-02-17 | ||
PCT/US1996/002261 WO1996025378A1 (en) | 1995-02-17 | 1996-02-14 | Synthesis of tetrafluoroethylene |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH11500132A true JPH11500132A (ja) | 1999-01-06 |
JP3946764B2 JP3946764B2 (ja) | 2007-07-18 |
Family
ID=23540705
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52520096A Expired - Lifetime JP3946764B2 (ja) | 1995-02-17 | 1996-02-14 | テトラフルオロエチレンの合成法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US5672784A (ja) |
EP (1) | EP0809621B2 (ja) |
JP (1) | JP3946764B2 (ja) |
DE (1) | DE69603578T2 (ja) |
WO (1) | WO1996025378A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011236227A (ja) * | 2004-04-29 | 2011-11-24 | Honeywell Internatl Inc | 1,3,3,3−テトラフルオロプロペンの合成法 |
KR101299054B1 (ko) * | 2011-03-08 | 2013-08-21 | 니카코리아 (주) | 고주파 가열로를 이용한 연속 폴리테트라플루오로에틸렌 열분해 반응장치 |
WO2024062827A1 (ja) * | 2022-09-22 | 2024-03-28 | Agc株式会社 | クロロトリフルオロエチレン及びトリフルオロエチレンの製造方法 |
WO2024195350A1 (ja) * | 2023-03-17 | 2024-09-26 | Agc株式会社 | 1,1,2,2-テトラフルオロシクロブタンの製造方法、及びフッ化ビニリデンの製造方法 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6333440B1 (en) | 2000-04-07 | 2001-12-25 | E. I. Du Pont De Nemours And Company | Process for perfluorocyclobutane purification |
US6919015B2 (en) | 2002-12-16 | 2005-07-19 | 3M Innovative Properties Company | Process for manufacturing fluoroolefins |
US20080008858A1 (en) * | 2006-07-08 | 2008-01-10 | Hong Keith C | Roofing Products Containing Phase Change Materials |
CN103896726B (zh) * | 2014-03-11 | 2015-11-18 | 中昊晨光化工研究院有限公司 | 一种用于四氟乙烯生产中控制水含量的方法和装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA723699A (en) † | 1965-12-14 | Passler Fritz | Process for preparing tetrafluoroethylene | |
NL269647A (ja) * | 1960-09-28 | |||
DE1207370B (de) † | 1963-11-23 | 1965-12-23 | Hoechst Ag | Verfahren zur Herstellung von Tetrafluoraethylen |
-
1996
- 1996-02-14 JP JP52520096A patent/JP3946764B2/ja not_active Expired - Lifetime
- 1996-02-14 WO PCT/US1996/002261 patent/WO1996025378A1/en active IP Right Grant
- 1996-02-14 EP EP96906548A patent/EP0809621B2/en not_active Expired - Lifetime
- 1996-02-14 DE DE69603578T patent/DE69603578T2/de not_active Expired - Lifetime
- 1996-05-06 US US08/643,687 patent/US5672784A/en not_active Expired - Lifetime
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011236227A (ja) * | 2004-04-29 | 2011-11-24 | Honeywell Internatl Inc | 1,3,3,3−テトラフルオロプロペンの合成法 |
KR101299054B1 (ko) * | 2011-03-08 | 2013-08-21 | 니카코리아 (주) | 고주파 가열로를 이용한 연속 폴리테트라플루오로에틸렌 열분해 반응장치 |
WO2024062827A1 (ja) * | 2022-09-22 | 2024-03-28 | Agc株式会社 | クロロトリフルオロエチレン及びトリフルオロエチレンの製造方法 |
WO2024195350A1 (ja) * | 2023-03-17 | 2024-09-26 | Agc株式会社 | 1,1,2,2-テトラフルオロシクロブタンの製造方法、及びフッ化ビニリデンの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
DE69603578T2 (de) | 2000-02-24 |
US5672784A (en) | 1997-09-30 |
DE69603578D1 (de) | 1999-09-09 |
EP0809621B2 (en) | 2008-04-16 |
EP0809621B1 (en) | 1999-08-04 |
JP3946764B2 (ja) | 2007-07-18 |
WO1996025378A1 (en) | 1996-08-22 |
EP0809621A1 (en) | 1997-12-03 |
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