JPH1144950A5 - - Google Patents

Info

Publication number
JPH1144950A5
JPH1144950A5 JP1998134343A JP13434398A JPH1144950A5 JP H1144950 A5 JPH1144950 A5 JP H1144950A5 JP 1998134343 A JP1998134343 A JP 1998134343A JP 13434398 A JP13434398 A JP 13434398A JP H1144950 A5 JPH1144950 A5 JP H1144950A5
Authority
JP
Japan
Prior art keywords
compound
substrate
resist composition
acid
atom
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998134343A
Other languages
English (en)
Japanese (ja)
Other versions
JP4048600B2 (ja
JPH1144950A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP13434398A priority Critical patent/JP4048600B2/ja
Priority claimed from JP13434398A external-priority patent/JP4048600B2/ja
Publication of JPH1144950A publication Critical patent/JPH1144950A/ja
Publication of JPH1144950A5 publication Critical patent/JPH1144950A5/ja
Application granted granted Critical
Publication of JP4048600B2 publication Critical patent/JP4048600B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP13434398A 1997-04-30 1998-04-28 レジストの基板依存性改善剤 Expired - Lifetime JP4048600B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13434398A JP4048600B2 (ja) 1997-04-30 1998-04-28 レジストの基板依存性改善剤

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP9-126283 1997-04-30
JP12628397 1997-04-30
JP15157097 1997-05-26
JP9-151570 1997-05-26
JP13434398A JP4048600B2 (ja) 1997-04-30 1998-04-28 レジストの基板依存性改善剤

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007232489A Division JP2007334370A (ja) 1997-04-30 2007-09-07 レジスト組成物及びこれを用いたパターン形成方法

Publications (3)

Publication Number Publication Date
JPH1144950A JPH1144950A (ja) 1999-02-16
JPH1144950A5 true JPH1144950A5 (cg-RX-API-DMAC10.html) 2005-07-07
JP4048600B2 JP4048600B2 (ja) 2008-02-20

Family

ID=27315299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13434398A Expired - Lifetime JP4048600B2 (ja) 1997-04-30 1998-04-28 レジストの基板依存性改善剤

Country Status (1)

Country Link
JP (1) JP4048600B2 (cg-RX-API-DMAC10.html)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3931484B2 (ja) * 1999-06-03 2007-06-13 住友化学株式会社 ポジ型フォトレジスト組成物
TW502133B (en) 1999-06-10 2002-09-11 Wako Pure Chem Ind Ltd Resist composition, agent and method for reducing substrate dependence thereof
JP4710193B2 (ja) * 2001-08-01 2011-06-29 Ｊｓｒ株式会社 感放射線性樹脂組成物
US7521168B2 (en) 2002-02-13 2009-04-21 Fujifilm Corporation Resist composition for electron beam, EUV or X-ray
JP4857138B2 (ja) 2006-03-23 2012-01-18 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
JP4703674B2 (ja) 2008-03-14 2011-06-15 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
JP5047030B2 (ja) 2008-03-26 2012-10-10 富士フイルム株式会社 レジスト組成物及びそれを用いたパターン形成方法
JP5617505B2 (ja) * 2010-10-01 2014-11-05 住友ベークライト株式会社 ポジ型感光性樹脂組成物、硬化膜、保護膜、絶縁膜、半導体装置、および表示体装置

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