JPH11354431A - 投影露光装置及び半導体デバイスの製造方法 - Google Patents

投影露光装置及び半導体デバイスの製造方法

Info

Publication number
JPH11354431A
JPH11354431A JP10179587A JP17958798A JPH11354431A JP H11354431 A JPH11354431 A JP H11354431A JP 10179587 A JP10179587 A JP 10179587A JP 17958798 A JP17958798 A JP 17958798A JP H11354431 A JPH11354431 A JP H11354431A
Authority
JP
Japan
Prior art keywords
exposure apparatus
temperature
projection
projection exposure
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10179587A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11354431A5 (enExample
Inventor
Masato Hatazawa
正人 畑沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP10179587A priority Critical patent/JPH11354431A/ja
Publication of JPH11354431A publication Critical patent/JPH11354431A/ja
Publication of JPH11354431A5 publication Critical patent/JPH11354431A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP10179587A 1998-06-11 1998-06-11 投影露光装置及び半導体デバイスの製造方法 Pending JPH11354431A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10179587A JPH11354431A (ja) 1998-06-11 1998-06-11 投影露光装置及び半導体デバイスの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10179587A JPH11354431A (ja) 1998-06-11 1998-06-11 投影露光装置及び半導体デバイスの製造方法

Publications (2)

Publication Number Publication Date
JPH11354431A true JPH11354431A (ja) 1999-12-24
JPH11354431A5 JPH11354431A5 (enExample) 2005-11-04

Family

ID=16068347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10179587A Pending JPH11354431A (ja) 1998-06-11 1998-06-11 投影露光装置及び半導体デバイスの製造方法

Country Status (1)

Country Link
JP (1) JPH11354431A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006156632A (ja) * 2004-11-29 2006-06-15 Nikon Corp ガス温度調整装置、鏡筒、露光装置並びにデバイスの製造方法、ガス温度調整方法
US7545478B2 (en) 2004-05-05 2009-06-09 Asml Netherlands B.V. Lithographic apparatus, thermal conditioning system, and method for manufacturing a device
JP2012028797A (ja) * 2003-11-13 2012-02-09 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012028797A (ja) * 2003-11-13 2012-02-09 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
US7545478B2 (en) 2004-05-05 2009-06-09 Asml Netherlands B.V. Lithographic apparatus, thermal conditioning system, and method for manufacturing a device
JP2006156632A (ja) * 2004-11-29 2006-06-15 Nikon Corp ガス温度調整装置、鏡筒、露光装置並びにデバイスの製造方法、ガス温度調整方法

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