JPH11354387A - Manufacture of electrode foil for aluminum electrolytic capacitor - Google Patents
Manufacture of electrode foil for aluminum electrolytic capacitorInfo
- Publication number
- JPH11354387A JPH11354387A JP17206398A JP17206398A JPH11354387A JP H11354387 A JPH11354387 A JP H11354387A JP 17206398 A JP17206398 A JP 17206398A JP 17206398 A JP17206398 A JP 17206398A JP H11354387 A JPH11354387 A JP H11354387A
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Abstract
Description
【0001】[0001]
【発明の属する技術分野】本願発明は、アルミニウム電
解コンデンサ用電極箔、特に陰極用アルミニウム箔及び
低圧の陽極用アルミニウム箔の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an electrode foil for an aluminum electrolytic capacitor, in particular, an aluminum foil for a cathode and a low-pressure aluminum foil for an anode.
【0002】[0002]
【従来の技術】従来、アルミニウム電解コンデンサ用電
極箔は、塩化物を含む水溶液中で化学的又は電気化学的
エッチングによって粗面化されたエッチド箔を、これに
残存する塩素イオンを脱塩素イオン処理した後に、陰極
用アルミニウム箔の場合にはそのエッチド箔表面に安定
化皮膜を形成させる処理を、また陽極用アルミニウム箔
の場合には化成処理で酸化皮膜を形成させる処理を行う
ことによって製造されており、脱塩素イオン処理として
は、りん酸、硫酸、硝酸などの酸水溶液による化学処理
で行う方法または特公昭63−16480号公報で示さ
れるように、硝酸水溶液中で電気化学的に塩素イオンを
除去する方法が知られている。2. Description of the Related Art Conventionally, an electrode foil for an aluminum electrolytic capacitor has been obtained by removing an etched foil which has been roughened by chemical or electrochemical etching in an aqueous solution containing a chloride and removing chlorine ions remaining on the etched foil. After that, in the case of aluminum foil for the cathode, it is manufactured by performing a process of forming a stabilized film on the surface of the etched foil, and in the case of an aluminum foil for the anode, a process of forming an oxide film by a chemical conversion process. As the dechlorinating ion treatment, a method of performing chemical treatment with an aqueous acid solution of phosphoric acid, sulfuric acid, nitric acid, or the like, or as described in JP-B-63-16480, electrochemically converts chloride ions into an aqueous nitric acid solution. Methods of removing are known.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、近年ア
ルミニウム電解コンデンサの小型化にともない単位面積
当りの静電容量を増大させる必要があり、そのためエッ
チド箔はより一層粗面化され微細なエッチピット構造を
有するに至っている。このように微細に粗面化されたア
ルミニウム箔から従来の方法で残留塩素イオンを除去す
るには、脱塩素イオン処理を強く行なわなければなら
ず、その結果、微細なエッチピットを溶解してしまい、
かえって静電容量の減少をもたらすという不都合があっ
た。However, in recent years, it has been necessary to increase the capacitance per unit area in accordance with the miniaturization of aluminum electrolytic capacitors. Therefore, the etched foil has been further roughened to form a fine etch pit structure. I have. In order to remove residual chlorine ions from such a finely roughened aluminum foil by a conventional method, dechlorination ion treatment must be performed strongly, and as a result, fine etch pits are dissolved. ,
On the contrary, there is a disadvantage that the capacitance is reduced.
【0004】[0004]
【課題を解決するための手段】そこで本願発明は上記し
た従来の不都合を解消するために、アルミニウム箔を塩
化物を含む水溶液中で化学的又は電気化学的エッチング
により粗面化した後、脱塩素イオン処理を行う際、脱塩
素イオン処理工程を前段と後段との2段階に分け、その
前段においては、りん酸、硫酸、硝酸などの無機酸の水
溶液中に浸せきして行い、後段においては、しゅう酸、
くえん酸、酒石酸などの有機酸の水溶液中に浸せきして
行うことを特徴としたものである。SUMMARY OF THE INVENTION In order to solve the above-mentioned disadvantages, the present invention provides a method in which an aluminum foil is roughened by chemical or electrochemical etching in an aqueous solution containing chloride and then dechlorinated. When performing the ion treatment, the dechlorination ion treatment process is divided into two stages, a former stage and a latter stage, and in the former stage, the process is immersed in an aqueous solution of an inorganic acid such as phosphoric acid, sulfuric acid, and nitric acid. Oxalic acid,
It is characterized by being immersed in an aqueous solution of an organic acid such as citric acid or tartaric acid.
【0005】上記において、前段で使用するりん酸、硫
酸又は硝酸の場合の水溶液の濃度は好ましくは0.5w
t%から30wt%の範囲で、かつ水溶液の温度が20
℃から80℃の範囲であり、濃度及び温度が上記の範囲
を超えて低いと塩素イオンの除去効果は得られず、逆に
高いとアルミニウムの溶解反応が強くなり拡面倍率が低
下して静電容量の減少をもたらす。In the above, in the case of phosphoric acid, sulfuric acid or nitric acid used in the preceding step, the concentration of the aqueous solution is preferably 0.5 W
t% to 30 wt% and the temperature of the aqueous solution is 20%.
If the concentration and the temperature are lower than the above ranges, the effect of removing chloride ions cannot be obtained. This results in a decrease in capacitance.
【0006】また後段で使用するしゅう酸、くえん酸又
は酒石酸の場合の水溶液中の濃度は好ましくは0.2w
t%から10wt%の範囲で、かつ水溶液の温度は30
℃から90℃の範囲であり、濃度及び温度がこの範囲を
超えて低いと塩素イオンの除去効果が得られず、逆に高
いとアルミニウムの溶解反応が強くなり拡面倍率が低下
して静電容量の減少をもたらす。The concentration of oxalic acid, citric acid or tartaric acid used in the latter stage in the aqueous solution is preferably 0.2 watts.
t% to 10 wt%, and the temperature of the aqueous solution is 30%.
If the concentration and temperature are lower than this range, the effect of removing chloride ions cannot be obtained. This results in reduced capacity.
【0007】[0007]
【作用】上記したように本願発明によれば、脱塩素イオ
ン処理を、酸の種類を変えて2段階で行なうものである
から、一定の無機酸水溶液中で1段階で行なう従来の脱
塩素イオン処理に比し、その無機酸水溶液による脱塩素
イオン処理で除去されなかった塩素イオンは、後段の有
機酸水溶液処理によって効果的に除去され、しかもアル
ミニウムの溶解が少ないので、静電容量の低下も少なく
することができる。As described above, according to the present invention, since the dechlorination ion treatment is performed in two stages by changing the kind of acid, the conventional dechlorination ion treatment in one stage in a fixed inorganic acid aqueous solution is performed. Compared to the treatment, chlorine ions that were not removed by the dechlorination ion treatment with the inorganic acid aqueous solution are effectively removed by the subsequent organic acid aqueous solution treatment, and the dissolution of aluminum is less, so the capacitance is also reduced. Can be reduced.
【0008】[0008]
【実施例】以下本願発明の実施例を詳述する。 実施例1 (1)エッチング工程 純度99.9%、厚さ90μmのアルミニウム箔を、
5.5wt%の塩素と1.5wt%のりん酸と0.5w
t%の硝酸と2.0wt%の塩化アルミニウムとを含む
水溶液から成る18℃の電解液中で10Hz、電流密度
120mA/cm2 の三角波交流電流で18分間エッチ
ングを行ない、イオン交換水で洗浄した。 (2)脱塩素イオン処理工程 60℃の5.0wt%の硫酸水溶液中で2分間前段の脱
塩素イオン処理を行なった後、50℃の1.0wt%の
しゅう酸水溶液に1分30秒間浸せきして後段の脱塩素
イオン処理を行ない、イオン交換水で洗浄した。Embodiments of the present invention will be described below in detail. Example 1 (1) Etching Step An aluminum foil having a purity of 99.9% and a thickness of 90 μm was
5.5 wt% chlorine, 1.5 wt% phosphoric acid and 0.5 w
Etching was performed for 18 minutes with a triangular wave alternating current of 10 Hz and a current density of 120 mA / cm 2 in an electrolytic solution at 18 ° C. consisting of an aqueous solution containing t% nitric acid and 2.0 wt% aluminum chloride, and washed with ion-exchanged water. (2) Dechlorination Ion Treatment Step After performing the pre-dechlorination ion treatment in a 5.0 wt% sulfuric acid aqueous solution at 60 ° C. for 2 minutes, it was immersed in a 1.0 wt% oxalic acid aqueous solution at 50 ° C. for 1 minute and 30 seconds. Then, a subsequent dechlorination ion treatment was performed, and the resultant was washed with ion-exchanged water.
【0009】実施例2 (1)エッチング工程 実施例1と同じ (2)脱塩素イオン処理工程 40℃の5.0wt%のりん酸水溶液中で2分間前段の
脱塩素イオン処理を行なった後、75℃の2.0wt%
のくえん酸水溶液中に5分間浸せきして後段の脱塩素イ
オン処理を行ない、イオン交換水で洗浄した。Example 2 (1) Etching step Same as in Example 1 (2) Dechlorination ion treatment step After performing the predechlorination ion treatment in a 5.0 wt% aqueous phosphoric acid solution at 40 ° C. for 2 minutes, 2.0wt% at 75 ℃
Then, the substrate was immersed in a citric acid aqueous solution for 5 minutes to perform a subsequent dechlorination ion treatment, and washed with ion-exchanged water.
【0010】実施例3 (1)エッチング工程 実施例1と同じ (2)脱塩素イオン処理工程 60℃の5.0wt%の硝酸水溶液中で1分30秒間前
段の脱塩素イオン処理を行なった後、85℃の2.0w
t%の酒石酸水溶液中に5分間浸せきして後段の脱塩素
イオン処理を行ない、イオン交換水で洗浄した。Example 3 (1) Etching step Same as in Example 1 (2) Dechlorination ion treatment step After performing the pre-dechlorination ion treatment in a 5.0 wt% nitric acid aqueous solution at 60 ° C. for 1 minute and 30 seconds. , 85w, 2.0w
It was immersed in a t% aqueous solution of tartaric acid for 5 minutes to perform a subsequent dechlorination ion treatment, and washed with ion-exchanged water.
【0011】比較例1 (1)エッチング工程 実施例1と同じ (2)脱塩素イオン処理工程 60℃の5.0wt%の硫酸水溶液中に2分間及び3分
間浸せきした後、イオン交換水で洗浄した。Comparative Example 1 (1) Etching step Same as in Example 1 (2) Dechlorinating ion treatment step After immersion in a 5.0 wt% sulfuric acid aqueous solution at 60 ° C. for 2 minutes and 3 minutes, washing with ion exchange water did.
【0012】比較例2 (1)エッチング工程 実施例1と同じ (2)脱塩素イオン処理工程 40℃の5.0wt%のりん酸水溶液中に2分間及び3
分間浸せきした後、イオン交換水で洗浄した。Comparative Example 2 (1) Etching step Same as in Example 1 (2) Dechlorinating ion treatment step 2 minutes in a 5.0 wt% phosphoric acid aqueous solution at 40 ° C.
After immersion for a minute, it was washed with ion-exchanged water.
【0013】比較例3 (1)エッチング工程 実施例1と同じ (2)脱塩素イオン処理工程 60℃の5.0wt%の硝酸水溶液中に1分30秒間及
び2分間浸せきした後、イオン交換水で洗浄した。Comparative Example 3 (1) Etching step Same as in Example 1 (2) Dechlorinating ion treatment step After immersing in a 5.0 wt% nitric acid aqueous solution at 60 ° C. for 1 minute 30 seconds and 2 minutes, ion-exchanged water And washed.
【0014】しかして、上記実施例1から3及び比較例
1から3によってそれぞれ得られたエッチド箔の表面に
残留する塩素イオン量を硝酸銀比濁法にて測定した。ま
た同一箔を一般的に行なわれているアジピン酸アンモニ
ウム水溶液中で20V化成を行ない、その静電容量を測
定し、その結果を表で示した。The amount of chloride ions remaining on the surfaces of the etched foils obtained in Examples 1 to 3 and Comparative Examples 1 to 3 was measured by a silver nitrate turbidimetric method. The same foil was subjected to 20 V chemical conversion in a commonly used aqueous solution of ammonium adipate, and its capacitance was measured. The results are shown in the table.
【0015】[0015]
【表1】 [Table 1]
【0016】表1から明らかなように、実施例1から3
で得られたエッチド箔の残留イオン量は、それぞれ1.
0mg/m2 、1.2mg/m2 及び1.0mg/m2
であり、そのいづれも比較例1から3で得られたエッチ
ド箔の残留塩素イオン量に比し大幅な減少を示した。As apparent from Table 1, Examples 1 to 3
The amount of residual ions in the etched foil obtained in 1. was 1.
0 mg / m2, 1.2 mg / m2 and 1.0 mg / m2
In each case, the amount significantly decreased as compared with the amount of residual chlorine ions in the etched foils obtained in Comparative Examples 1 to 3.
【0017】また比較例1から3に示す1段階の脱塩素
イオン処理を行なった場合、酸水溶液中への浸せき時間
を長くすると残留塩素イオン量は低下するが静電容量も
減少し、しかも残留塩素イオン量の低下は僅少で依然と
して高い値を示している。In the case where the one-stage dechlorination treatment shown in Comparative Examples 1 to 3 is performed, if the immersion time in an acid aqueous solution is lengthened, the amount of residual chloride ions decreases, but the capacitance also decreases. The decrease in the amount of chloride ions is slight and still shows a high value.
【0018】[0018]
【発明の効果】以上のように本願発明によれば、エッチ
ド箔に残存する塩素イオンを効果的に減少できて、容量
が同一であるにも拘らず残留塩素イオン量の少ない電極
箔を製造することができる。また脱塩素イオン処理に特
別な設備を必要とせず容易に達成することができる。As described above, according to the present invention, it is possible to effectively reduce the chlorine ions remaining in the etched foil, and to manufacture an electrode foil having a small residual chlorine ion amount despite the same capacity. be able to. Further, the dechlorination treatment can be easily achieved without requiring any special equipment.
【0019】また本願発明は後段で有機酸水溶液中に浸
せきして脱塩素イオン処理を行なっているので、前段で
使用したりん酸、硫酸または硝酸などの無機酸イオンが
エッチド箔表面から除去され、また後段で使用するしゅ
う酸、くえん酸または酒石酸は、250℃以下の比較的
低い温度の加熱処理で容易に分解されるので、エッチド
箔表面から不要な酸イオンを容易に除去することができ
る等の利点を有する。Further, in the present invention, since the dechlorination ion treatment is carried out by immersing in an organic acid aqueous solution in the latter stage, the inorganic acid ions such as phosphoric acid, sulfuric acid or nitric acid used in the former stage are removed from the etched foil surface, Oxalic acid, citric acid, or tartaric acid used in the subsequent stage can be easily decomposed by heat treatment at a relatively low temperature of 250 ° C. or less, so that unnecessary acid ions can be easily removed from the etched foil surface. Has the advantage of
Claims (3)
で化学的又は電気化学的エッチングにより粗面化した
後、脱塩素イオン処理を行う際、脱塩素イオン処理工程
を前段と後段との2段階に分け、その前段においては、
りん酸、硫酸、硝酸などの無機酸の水溶液中に浸せきし
て行い、後段においては、しゅう酸、くえん酸、酒石酸
などの有機酸の水溶液中に浸せきして行うことを特徴と
したアルミニウム電解コンデンサ用電極箔の製造方法。1. When performing dechlorination ion treatment after roughening an aluminum foil in an aqueous solution containing chloride by chemical or electrochemical etching, a dechlorination ion treatment step is performed in two stages, a first stage and a second stage. And in the first stage,
An aluminum electrolytic capacitor characterized by being immersed in an aqueous solution of an inorganic acid such as phosphoric acid, sulfuric acid, nitric acid, etc. Of manufacturing electrode foil for use.
のりん酸、硫酸又は硝酸の濃度が0.5wt%から30
wt%の範囲であり、その水溶液温度が20℃から80
℃の範囲である請求項1記載のアルミニウム電解コンデ
ンサ用電極箔の製造方法。2. The concentration of phosphoric acid, sulfuric acid or nitric acid in an aqueous solution comprising phosphoric acid, sulfuric acid or nitric acid is 0.5 wt% to 30 wt.
wt%, and the temperature of the aqueous solution is from 20 ° C to 80 ° C.
The method for producing an electrode foil for an aluminum electrolytic capacitor according to claim 1, wherein the temperature is in the range of ° C.
水溶液中のしゅう酸、くえん酸又は酒石酸の濃度が0.
2wt%から10wt%であり、その水溶液温度が30
℃から90℃の範囲である請求項1または2記載のアル
ミニウム電解コンデンサ用電極箔の製造方法。3. An aqueous solution comprising oxalic acid, citric acid or tartaric acid having a concentration of oxalic acid, citric acid or tartaric acid of 0.3.
2 wt% to 10 wt%, and the aqueous solution temperature is 30 wt%.
The method for producing an electrode foil for an aluminum electrolytic capacitor according to claim 1 or 2, wherein the temperature is in a range of from 0C to 90C.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17206398A JP3371362B2 (en) | 1998-06-05 | 1998-06-05 | Method for producing electrode foil for aluminum electrolytic capacitor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17206398A JP3371362B2 (en) | 1998-06-05 | 1998-06-05 | Method for producing electrode foil for aluminum electrolytic capacitor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH11354387A true JPH11354387A (en) | 1999-12-24 |
JP3371362B2 JP3371362B2 (en) | 2003-01-27 |
Family
ID=15934855
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17206398A Expired - Fee Related JP3371362B2 (en) | 1998-06-05 | 1998-06-05 | Method for producing electrode foil for aluminum electrolytic capacitor |
Country Status (1)
Country | Link |
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JP (1) | JP3371362B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009177174A (en) * | 2008-01-22 | 2009-08-06 | Avx Corp | Sintered anode pellet etched with organic acid to be used for electrolytic capacitor |
KR101539860B1 (en) * | 2013-10-30 | 2015-07-27 | 인하대학교 산학협력단 | Method of manufacturing capacitor |
-
1998
- 1998-06-05 JP JP17206398A patent/JP3371362B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009177174A (en) * | 2008-01-22 | 2009-08-06 | Avx Corp | Sintered anode pellet etched with organic acid to be used for electrolytic capacitor |
KR101539860B1 (en) * | 2013-10-30 | 2015-07-27 | 인하대학교 산학협력단 | Method of manufacturing capacitor |
Also Published As
Publication number | Publication date |
---|---|
JP3371362B2 (en) | 2003-01-27 |
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