JPH11330186A5 - - Google Patents
Info
- Publication number
- JPH11330186A5 JPH11330186A5 JP1998127467A JP12746798A JPH11330186A5 JP H11330186 A5 JPH11330186 A5 JP H11330186A5 JP 1998127467 A JP1998127467 A JP 1998127467A JP 12746798 A JP12746798 A JP 12746798A JP H11330186 A5 JPH11330186 A5 JP H11330186A5
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- stage
- electron
- inspection device
- position information
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12746798A JP4090567B2 (ja) | 1998-05-11 | 1998-05-11 | ウエハ検査加工装置およびウエハ検査加工方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12746798A JP4090567B2 (ja) | 1998-05-11 | 1998-05-11 | ウエハ検査加工装置およびウエハ検査加工方法 |
Related Child Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005134893A Division JP4091060B2 (ja) | 2005-05-06 | 2005-05-06 | ウエハ検査加工装置およびウエハ検査加工方法 |
| JP2006277460A Division JP4303276B2 (ja) | 2006-10-11 | 2006-10-11 | 電子線及びイオンビーム照射装置並びに試料作成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11330186A JPH11330186A (ja) | 1999-11-30 |
| JPH11330186A5 true JPH11330186A5 (enrdf_load_html_response) | 2005-09-29 |
| JP4090567B2 JP4090567B2 (ja) | 2008-05-28 |
Family
ID=14960661
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12746798A Expired - Lifetime JP4090567B2 (ja) | 1998-05-11 | 1998-05-11 | ウエハ検査加工装置およびウエハ検査加工方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4090567B2 (enrdf_load_html_response) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002090312A (ja) * | 2000-09-21 | 2002-03-27 | Hitachi Ltd | 欠陥分析システム |
| CN100373573C (zh) * | 2005-01-06 | 2008-03-05 | 中芯国际集成电路制造(上海)有限公司 | 深次微米半导体器件中致命缺陷的确认方法 |
| KR20080043768A (ko) * | 2005-07-30 | 2008-05-19 | 전자빔기술센터 주식회사 | 마이크로칼럼을 이용한 미세 패턴 및 형상 검사장치 |
| KR101051730B1 (ko) * | 2006-08-01 | 2011-07-25 | 가부시키가이샤 시마쓰세사쿠쇼 | 기판 검사 및 수정 장치와 기판 평가 시스템 |
| US8357913B2 (en) | 2006-10-20 | 2013-01-22 | Fei Company | Method and apparatus for sample extraction and handling |
| US8134124B2 (en) * | 2006-10-20 | 2012-03-13 | Fei Company | Method for creating S/tem sample and sample structure |
| JP5321490B2 (ja) * | 2010-02-08 | 2013-10-23 | 新日鐵住金株式会社 | 微粒子分析方法 |
| JP2011233249A (ja) * | 2010-04-23 | 2011-11-17 | Tokyo Institute Of Technology | イオンビーム照射位置決め装置 |
| CN103965914B (zh) * | 2013-01-25 | 2016-06-08 | 上海华虹宏力半导体制造有限公司 | 蚀刻npn掺杂区域形貌以进行失效检验的组合物及检验方法 |
| CN109411396B (zh) * | 2018-11-29 | 2024-06-04 | 天津中环领先材料技术有限公司 | 一种六轴机器人辅助目检硅片装置及辅助检测方法 |
| CN110006937A (zh) * | 2019-04-02 | 2019-07-12 | 深圳鸿鹏新能源科技有限公司 | 利用扫描电镜在极限分辨率下测试样品的方法 |
-
1998
- 1998-05-11 JP JP12746798A patent/JP4090567B2/ja not_active Expired - Lifetime