JPH11327147A5 - - Google Patents
Info
- Publication number
- JPH11327147A5 JPH11327147A5 JP1998136918A JP13691898A JPH11327147A5 JP H11327147 A5 JPH11327147 A5 JP H11327147A5 JP 1998136918 A JP1998136918 A JP 1998136918A JP 13691898 A JP13691898 A JP 13691898A JP H11327147 A5 JPH11327147 A5 JP H11327147A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- substituent
- positive photoresist
- alkyl group
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13691898A JP3847454B2 (ja) | 1998-03-20 | 1998-05-19 | 遠紫外線露光用ポジ型フォトレジスト組成物及びパターン形成方法 |
| US09/264,036 US6159655A (en) | 1998-03-20 | 1999-03-08 | Positive photoresist composition for exposure to far ultraviolet light |
| KR1019990009385A KR100558190B1 (ko) | 1998-03-20 | 1999-03-19 | 원자외선 노광용 포지티브 포토레지스트 조성물 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7247898 | 1998-03-20 | ||
| JP10-72478 | 1998-03-20 | ||
| JP13691898A JP3847454B2 (ja) | 1998-03-20 | 1998-05-19 | 遠紫外線露光用ポジ型フォトレジスト組成物及びパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11327147A JPH11327147A (ja) | 1999-11-26 |
| JPH11327147A5 true JPH11327147A5 (OSRAM) | 2005-02-24 |
| JP3847454B2 JP3847454B2 (ja) | 2006-11-22 |
Family
ID=26413607
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13691898A Expired - Fee Related JP3847454B2 (ja) | 1998-03-20 | 1998-05-19 | 遠紫外線露光用ポジ型フォトレジスト組成物及びパターン形成方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US6159655A (OSRAM) |
| JP (1) | JP3847454B2 (OSRAM) |
| KR (1) | KR100558190B1 (OSRAM) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW457277B (en) * | 1998-05-11 | 2001-10-01 | Shinetsu Chemical Co | Ester compounds, polymers, resist composition and patterning process |
| JP3844322B2 (ja) * | 1998-07-02 | 2006-11-08 | 富士写真フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| KR20000015014A (ko) * | 1998-08-26 | 2000-03-15 | 김영환 | 신규의 포토레지스트용 단량체, 중합체 및 이를 이용한 포토레지스트 조성물 |
| US6790587B1 (en) * | 1999-05-04 | 2004-09-14 | E. I. Du Pont De Nemours And Company | Fluorinated polymers, photoresists and processes for microlithography |
| US6787283B1 (en) * | 1999-07-22 | 2004-09-07 | Fuji Photo Film Co., Ltd. | Positive photoresist composition for far ultraviolet exposure |
| KR100682169B1 (ko) * | 1999-07-30 | 2007-02-12 | 주식회사 하이닉스반도체 | 신규의 포토레지스트용 공중합체 및 이를 이용한 포토레지스트조성물 |
| JP3955419B2 (ja) * | 1999-10-20 | 2007-08-08 | 富士フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| KR20010040187A (ko) * | 1999-10-28 | 2001-05-15 | 무네유키 가코우 | 포지티브 포토레지스트 조성물 |
| KR100546105B1 (ko) * | 1999-11-03 | 2006-01-24 | 주식회사 하이닉스반도체 | 신규의 포토레지스트용 중합체 및 이를 함유하는포토레지스트 조성물 |
| JP4529245B2 (ja) * | 1999-12-03 | 2010-08-25 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物 |
| KR20010054851A (ko) * | 1999-12-08 | 2001-07-02 | 윤종용 | 지환식 감광성 폴리머 및 이를 포함하는 레지스트조성물과 그 제조방법 |
| JP2001235865A (ja) * | 2000-02-23 | 2001-08-31 | Fuji Photo Film Co Ltd | ポジ型フォトレジスト組成物 |
| JP4166402B2 (ja) * | 2000-02-28 | 2008-10-15 | 富士フイルム株式会社 | 遠紫外線露光用ポジ型フォトレジスト組成物 |
| AU2001244719A1 (en) * | 2000-04-04 | 2001-10-15 | Daikin Industries Ltd. | Novel fluoropolymer having acid-reactive group and chemical amplification type photoresist composition containing the same |
| KR100527533B1 (ko) * | 2000-06-21 | 2005-11-09 | 주식회사 하이닉스반도체 | Ｔｉｐｓ 공정용 포토레지스트 중합체 및 이를 함유하는포토레지스트 조성물 |
| JP4469080B2 (ja) * | 2000-12-13 | 2010-05-26 | 信越化学工業株式会社 | 脂環構造を有する新規第三級アルコール化合物 |
| JP4255100B2 (ja) * | 2001-04-06 | 2009-04-15 | 富士フイルム株式会社 | ＡｒＦエキシマレ−ザ−露光用ポジ型フォトレジスト組成物及びそれを用いたパタ−ン形成方法 |
| TW591329B (en) * | 2001-04-21 | 2004-06-11 | Samsung Electronics Co Ltd | Acetal group containing norbornene copolymer for photoresist, method for producing the same and photoresist composition containing the same |
| US6737215B2 (en) | 2001-05-11 | 2004-05-18 | Clariant Finance (Bvi) Ltd | Photoresist composition for deep ultraviolet lithography |
| US20030171773A1 (en) | 2002-03-06 | 2003-09-11 | Carrison Harold F. | Methods for aneurysm repair |
| US6756180B2 (en) | 2002-10-22 | 2004-06-29 | International Business Machines Corporation | Cyclic olefin-based resist compositions having improved image stability |
| JP5117484B2 (ja) * | 2009-12-28 | 2013-01-16 | 東京応化工業株式会社 | 新規な化合物、及びその製造方法 |
| KR101496976B1 (ko) * | 2011-07-14 | 2015-03-02 | 스미토모 베이클리트 컴퍼니 리미티드 | 화학 방사선에 대한 이미지-와이즈 노광 후에 패턴화된 층을 형성하는 중합체 및 이의 조성물 |
| JP6414237B2 (ja) * | 2017-01-12 | 2018-10-31 | 住友ベークライト株式会社 | ポリマー、ポリマーの製造方法、感光性樹脂組成物および電子装置 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01140143A (ja) * | 1987-11-27 | 1989-06-01 | Tosoh Corp | パターン形成材料 |
| JP3200824B2 (ja) * | 1991-09-06 | 2001-08-20 | ジェイエスアール株式会社 | 感放射線性組成物 |
| JP3000745B2 (ja) * | 1991-09-19 | 2000-01-17 | 富士通株式会社 | レジスト組成物とレジストパターンの形成方法 |
| JPH08202039A (ja) * | 1995-01-30 | 1996-08-09 | Japan Synthetic Rubber Co Ltd | 感放射線性樹脂組成物 |
| US6013416A (en) * | 1995-06-28 | 2000-01-11 | Fujitsu Limited | Chemically amplified resist compositions and process for the formation of resist patterns |
| JP3804138B2 (ja) * | 1996-02-09 | 2006-08-02 | Ｊｓｒ株式会社 | ＡｒＦエキシマレーザー照射用感放射線性樹脂組成物 |
| KR100253575B1 (ko) * | 1996-06-24 | 2000-04-15 | 김영환 | 포토레지스트 |
| EP0878738B1 (en) * | 1997-05-12 | 2002-01-09 | Fuji Photo Film Co., Ltd. | Positive resist composition |
-
1998
- 1998-05-19 JP JP13691898A patent/JP3847454B2/ja not_active Expired - Fee Related
-
1999
- 1999-03-08 US US09/264,036 patent/US6159655A/en not_active Expired - Fee Related
- 1999-03-19 KR KR1019990009385A patent/KR100558190B1/ko not_active Expired - Fee Related