JPH11323000A - スポンジまたは多孔性ポリマ―製品のマイクロクリ―ニング方法 - Google Patents

スポンジまたは多孔性ポリマ―製品のマイクロクリ―ニング方法

Info

Publication number
JPH11323000A
JPH11323000A JP8713699A JP8713699A JPH11323000A JP H11323000 A JPH11323000 A JP H11323000A JP 8713699 A JP8713699 A JP 8713699A JP 8713699 A JP8713699 A JP 8713699A JP H11323000 A JPH11323000 A JP H11323000A
Authority
JP
Japan
Prior art keywords
porous polymer
product
polymer member
brush
cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8713699A
Other languages
English (en)
Japanese (ja)
Inventor
Kristan G Bahten
クリスタン・ジイ・バーテン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rippey Corp
Original Assignee
Rippey Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/193,054 external-priority patent/US6158448A/en
Priority claimed from US09/192,878 external-priority patent/US6182323B1/en
Priority claimed from US09/193,009 external-priority patent/US6120616A/en
Application filed by Rippey Corp filed Critical Rippey Corp
Publication of JPH11323000A publication Critical patent/JPH11323000A/ja
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacture Of Porous Articles, And Recovery And Treatment Of Waste Products (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP8713699A 1998-03-27 1999-03-29 スポンジまたは多孔性ポリマ―製品のマイクロクリ―ニング方法 Pending JPH11323000A (ja)

Applications Claiming Priority (14)

Application Number Priority Date Filing Date Title
US7975398P 1998-03-27 1998-03-27
US7966198P 1998-03-27 1998-03-27
US7969598P 1998-03-27 1998-03-27
US7976798P 1998-03-27 1998-03-27
US09/193009 1998-11-16
US09/193,054 US6158448A (en) 1998-03-27 1998-11-16 System for cleaning sponge or porous polymeric products
US60/079753 1998-11-16
US09/193054 1998-11-16
US09/192,878 US6182323B1 (en) 1998-03-27 1998-11-16 Ultraclean surface treatment device
US60/079695 1998-11-16
US09/193,009 US6120616A (en) 1998-03-27 1998-11-16 Microcleaning process for sponge or porous polymeric products
US60/079767 1998-11-16
US09/192878 1998-11-16
US60/079661 1998-11-16

Publications (1)

Publication Number Publication Date
JPH11323000A true JPH11323000A (ja) 1999-11-26

Family

ID=27568386

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8713699A Pending JPH11323000A (ja) 1998-03-27 1999-03-29 スポンジまたは多孔性ポリマ―製品のマイクロクリ―ニング方法

Country Status (2)

Country Link
JP (1) JPH11323000A (fr)
WO (1) WO1999049995A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013508969A (ja) * 2009-10-22 2013-03-07 アプライド マテリアルズ インコーポレイテッド ブラシコンディショニングおよびパッドコンディショニングのための装置および方法
WO2019059683A1 (fr) * 2017-09-21 2019-03-28 가부시키가이샤 에바라 세이사꾸쇼 Procédé et appareil de nettoyage de brosse en pva

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4795497A (en) * 1985-08-13 1989-01-03 Mcconnell Christopher F Method and system for fluid treatment of semiconductor wafers
US5639311A (en) * 1995-06-07 1997-06-17 International Business Machines Corporation Method of cleaning brushes used in post CMP semiconductor wafer cleaning operations
WO1997013590A1 (fr) * 1995-10-13 1997-04-17 Ontrak Systems, Inc. Procede et appareil de distribution de produits chimiques a travers une brosse

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013508969A (ja) * 2009-10-22 2013-03-07 アプライド マテリアルズ インコーポレイテッド ブラシコンディショニングおよびパッドコンディショニングのための装置および方法
WO2019059683A1 (fr) * 2017-09-21 2019-03-28 가부시키가이샤 에바라 세이사꾸쇼 Procédé et appareil de nettoyage de brosse en pva
KR20190033339A (ko) * 2017-09-21 2019-03-29 한양대학교 에리카산학협력단 Pva 브러쉬 세정 방법 및 장치
CN111132577A (zh) * 2017-09-21 2020-05-08 株式会社荏原制作所 Pva刷子的清洗方法及清洗装置
JP2020534690A (ja) * 2017-09-21 2020-11-26 株式会社荏原製作所 Ｐｖａブラシの洗浄方法及び装置
US11382412B2 (en) 2017-09-21 2022-07-12 Ebara Corporation Method and apparatus for cleaning PVA brush
TWI816697B (zh) * 2017-09-21 2023-10-01 漢陽大學 Ｅｒｉｃａ 產學協力團 Pva刷子的清洗方法及清洗裝置

Also Published As

Publication number Publication date
WO1999049995A1 (fr) 1999-10-07

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